| 國立成功大學 |
2008-02 |
Controlling Ta phase in Ta/TaN bilayer by surface pre-treatment on TaN
|
Tsao, Jung-Chih; Liu, Chuan-Pu; Wang, Ying-Lang; Wang, Yu-Sheng; Chen, Ke-Wei |
| 國立成功大學 |
2008-01 |
Effect of bis-(3-sodiumsulfopropyl disulfide) byproducts on copper defects after chemical mechanical polishing
|
Hung, Chi-Cheng; Lee, Wen-Hsi; Hu, Shao-Yu; Chang, Shih-Chieh; Chen, Kei-Wei; Wang, Ying-Lang |
| 國立成功大學 |
2008-01 |
Study of pretreatment prior to silicon-oxycarbide deposition on Cu interconnect
|
Huang, Chun-Chieh; Huang, Jow-Lay; Wang, Ying-Lang; Lo, Kuang-Yao |
| 國立成功大學 |
2008 |
Suppression effect of low-concentration bis-(3-sodiumsulfopropyl disulfide) on copper electroplating
|
Hung, Chi-Cheng; Lee, Wen-Hsi; Chang, Shih-Chieh; Chen, Kei-Wei; Wang, Ying-Lang |
| 國立成功大學 |
2008 |
Investigation of bis-(3-sodiumsulfopropyl disulfide) (SPS) decomposition in a copper-electroplating bath using mass spectroscopy
|
Hung, Chi-Cheng; Lee, Wen-Hsi; Hu, Shao-Yu; Chang, Shih-Chieh; Chen, Kei-Wei; Wang, Ying-Lang |
| 國立成功大學 |
2008 |
Investigation of static corrosion between W metals and TiNx barriers in a W chemical-mechanical-polishing slurry
|
Hung, Chi-Cheng; Wang, Ying-Lang; Lee, Wen-Hsi; Chang, Shih-Chieh |
| 國立成功大學 |
2008 |
Competitive adsorption between bis(3-sodiumsulfopropyl disulfide) and polyalkylene glycols on copper electroplating
|
Hung, Chi-Cheng; Wang, Ying-Lang; Lee, Wen-Hsi; Chang, Shih-Chieh |
| 國立成功大學 |
2008 |
Investigation of slurry chemical corrosion on TaN barriers with plasma treatment
|
Hung, Chi-Cheng; Lee, Wen-Hsi; Wang, Ying-Lang |
| 國立成功大學 |
2007-05 |
Role of surface tension in copper electroplating
|
Chang, Shih-Chieh; Wang, Ying-Lang; Hung, Chi-Cheng; Lee, Wen-His; Hwang, Gwo-Jen |
| 國立成功大學 |
2007 |
Investigation of galvanic corrosion between TaNx barriers and copper seed by electrochemical impedance spectroscopy
|
Hung, Chi-Cheng; Lee, Wen-Hsi; Wang, Yu-Sheng; Chang, Shih-Chieh; Wang, Ying-Lang |
| 國立成功大學 |
2007 |
Galvanic corrosion between TaNx barriers and copper seed
|
Hung, Chi-Cheng; Wang, Yu-Sheng; Lee, Wen-Hsi; Chang, Shih-Chieh; Wang, Ying-Lang |
| 國立成功大學 |
2007 |
Influence of RF bias on hydrogenated amorphous silicon by high-density plasma chemical vapor deposition
|
Hsiao, Wen-Chu; Liu, Chuan-Pu; Wang, Ying-Lang |
| 國立成功大學 |
2006-11 |
Electrical properties of fluorine-doped silicon-oxycarbide dielectric barrier for copper interconnect
|
Huang, Chun-Chieh; Huang, Jow-Lay; Wang, Ying-Lang; Chang, Juin-Jie |
| 國立成功大學 |
2006-11 |
Characterization of fluorine-modified organosilicate glass
|
Liu, Chi-Wen; Wang, Ying-Lang; Juang, Yungder; JangJean, Shiuh-Ko; Lee, Wen-His |
| 國立成功大學 |
2006-09 |
Thermal stability study on nanoscale polysilicide resistors
|
Chen, Yen-Ming; Wang, Ying-Lang; Hwang, Gwo-Jen; Juang, Yungder; Lee, Wen-His |
| 國立成功大學 |
2006-05-22 |
Secondary emission of strain-induced dopant contrast in the source/drain regions of metal-oxide-semiconductor devices
|
Hsiao, Wen-Chu; Liu, Chuan-Pu; Wang, Ying-Lang |
| 國立成功大學 |
2006-03-01 |
High-selectivity damascene chemical mechanical polishing
|
Chiu, Shao-Yu; Wang, Ying-Lang; Liu, Chuan-Pu; Chang, Shih-Chieh; Hwang, Gwo-Jen; Feng, Ming-Shiann; Chen, Chia-Fu |
| 國立成功大學 |
2006-03-01 |
Characterization and thermal stability of fluorosilicate glass films deposited by high density plasma chemical vapor deposition with different bias power
|
Hsiao, Wen-Chu; Liu, Chuan-Pu; Wang, Ying-Lang; Cheng, Yi-Lung |
| 國立成功大學 |
2006-03-01 |
Uniform COSi2 nano-nucleus formation by oxide mediated silicidation with a Ti capping layer
|
Chang, Juin-Jie; Hsieh, Tsung-Eong; Liu, Chuan-Pu; Wang, Ying-Lang |
| 國立成功大學 |
2006-02-28 |
Phase transformation of tantalum on different dielectric films with plasma treatment
|
Huang, Chun-Chieh; Wang, Ying-Lang; Chang, Shih-Chieh; Hwang, Gwo-Jen; Huang, Jow-Lay |
| 國立成功大學 |
2006-02-28 |
Characterization of sputter-induced temperature effect in fluorine doped SiO2 film deposition by high-density plasma chemical vapor deposition
|
Hsiao, Wen-Chu; Liu, Chuan-Pu; Wang, Ying-Lang |
| 國立成功大學 |
2006-02-24 |
The study of diffusion and nucleation for COSi2 formation by oxide-mediated cobalt silicidation
|
Chang, Juin-Jie; Liu, Chuan-Pu; Hsieh, Tsung-Eong; Wang, Ying-Lang |
| 國立成功大學 |
2005-09 |
Influence of thermal budget on phosphosilicate glass prepared by high-density plasma chemical-vapor deposition
|
Hsiao, Wen-Chu; Liu, Chuan-Pu; Wang, Ying-Lang |
| 國立成功大學 |
2005 |
Study of diffusion and quality control for CoSi2 formation by oxide-mediated cobalt silicidation with Ti capping
|
Chang, Juin-Jie; Liu, Chuan-Pu; Hsieh, Tsung-Eong; Wang, Ying-Lang |
| 國立成功大學 |
2004-12-22 |
Thermal stability and bonding configuration of fluorine-modified low-k SiOC : H composite films
|
JangJian, Shiu-Ko; Liu, Chuan-Pu; Wang, Ying-Lang; Hwang, Weng-Sing; Tseng, Wei-Tsu |
