English  |  正體中文  |  简体中文  |  總筆數 :0  
造訪人次 :  52580232    線上人數 :  731
教育部委託研究計畫      計畫執行:國立臺灣大學圖書館
 
臺灣學術機構典藏系統 (Taiwan Academic Institutional Repository, TAIR)
關於TAIR

瀏覽

消息

著作權

相關連結

"wang ying lang"的相關文件

回到依作者瀏覽
依題名排序 依日期排序

顯示項目 76-85 / 121 (共13頁)
<< < 3 4 5 6 7 8 9 10 11 12 > >>
每頁顯示[10|25|50]項目

機構 日期 題名 作者
國立成功大學 2008-06-30 Under-layer behavior study of low resistance Ta/TaNx barrier film Wang, Yu-Sheng; Hung, Chi-Cheng; Lee, Wen-Hsi; Chang, Shih-Chieh; Wang, Ying-Lang
國立成功大學 2008-05 The effects of oxygen content on bonding configurations and properties of low-k organosilicate glass dielectric films Chen, Sheng-Wen; Liu, Chuan-Pu; JangJian, Shiu-Ko; Wang, Ying-Lang
國立成功大學 2008-05 Direct alpha Ta formation on TaN by resputtering for low resistive diffusion barriers Tsao, Jung-Chih; Liu, Chuan-Pu; Wang, Ying-Lang; Chen, Kei-Wei
國立成功大學 2008-05 The integration solution of copper barrier deposition for nanometer interconnect process Chen, Kei-Wei; Wang, Ying-Lang; Tsao, Jung-Chih; Lo, Kuang-Yao
國立成功大學 2008-02 The electrical property of plasma-treated Ta/TaNx diffusion barrier Wang, Yu-Sheng; Lee, Wen-Hsi; Wang, Ying-Lang; Hung, Chi-Cheng; Chang, Shih-Chieh
國立成功大學 2008-02 Mechanism of the metal-insulator-metal capacitance drift for advanced mixed-signal copper process device JangJian, Shiu-Ko; Wang, Ying-Lang; Liao, Mlao-Cheng; Chang, Hung-Jui; Juang, Yungder
國立成功大學 2008-02 Interface integration defect of copper and low-K materials beyond nano-scale copper damascene process Chen, Kel-Wei; Wang, Ying-Lang; Tsao, Jung-Chih; Juang, Yungder; Lee, Feng-Yi
國立成功大學 2008-02 The effect of oxygen content on bonding configuration and properties of low-k organosilicate glass dielectric film Chen, Sheng-Wen; Liu, Chuan-Pu; JangJian, Shiu-Ko; Wang, Ying-Lang
國立成功大學 2008-02 Mechanism of over-etching defects during Ta/TaN barrier resputtering in micro-trench for Cu metallization Tsao, Jung-Chih; Liu, Chuan-Pu; Wang, Ying-Lang; Chen, Kel-Wel; Lo, Kuang-Yao
國立成功大學 2008-02 Thermal properties of hydrogenated amorphous silicon prepared by high-density plasma chemical vapor deposition Hsao, Wen-Chu; Liu, Chuan-Pu; Wang, Ying-Lang

顯示項目 76-85 / 121 (共13頁)
<< < 3 4 5 6 7 8 9 10 11 12 > >>
每頁顯示[10|25|50]項目