|
|
Taiwan Academic Institutional Repository >
Browse by Author
|
"wang ying lang"
Showing items 106-115 of 121 (13 Page(s) Totally) << < 4 5 6 7 8 9 10 11 12 13 > >> View [10|25|50] records per page
| 國立成功大學 |
2006-02-28 |
Characterization of sputter-induced temperature effect in fluorine doped SiO2 film deposition by high-density plasma chemical vapor deposition
|
Hsiao, Wen-Chu; Liu, Chuan-Pu; Wang, Ying-Lang |
| 國立成功大學 |
2006-02-24 |
The study of diffusion and nucleation for COSi2 formation by oxide-mediated cobalt silicidation
|
Chang, Juin-Jie; Liu, Chuan-Pu; Hsieh, Tsung-Eong; Wang, Ying-Lang |
| 國立成功大學 |
2005-09 |
Influence of thermal budget on phosphosilicate glass prepared by high-density plasma chemical-vapor deposition
|
Hsiao, Wen-Chu; Liu, Chuan-Pu; Wang, Ying-Lang |
| 國立成功大學 |
2005 |
Study of diffusion and quality control for CoSi2 formation by oxide-mediated cobalt silicidation with Ti capping
|
Chang, Juin-Jie; Liu, Chuan-Pu; Hsieh, Tsung-Eong; Wang, Ying-Lang |
| 國立成功大學 |
2004-12-22 |
Thermal stability and bonding configuration of fluorine-modified low-k SiOC : H composite films
|
JangJian, Shiu-Ko; Liu, Chuan-Pu; Wang, Ying-Lang; Hwang, Weng-Sing; Tseng, Wei-Tsu |
| 國立成功大學 |
2004-11 |
Effects of wetting ability of plating electrolyte on Cu seed layer for electroplated copper film
|
Liu, Chi-Wen; Tsao, Jung-Chih; Tsai, Ming-Shih; Wang, Ying-Lang |
| 國立成功大學 |
2004-09 |
Direct COSi2 thin-film formation with homogeneous nanograin-size distribution by oxide-mediated silicidation
|
Chang, Juin-Jie; Liu, Chuan-Pu; Chen, Shih-Wei; Chang, Chih-Chia; Hsieh, Tsung-Eong; Wang, Ying-Lang |
| 國立成功大學 |
2004-01-30 |
Monitor and eliminate the circular defects in HDP-STI deposition through oxynitride/oxide composite liner
|
Lan, Jin-Kun; Wang, Ying-Lang; Liu, Chuan-Pu; Lee, Wen-His; Ay, Chyung; Cheng, Yi-Lung; Chang, Shih-Chieh |
| 國立成功大學 |
2004-01-30 |
Study on precipitations of fluorine-doped silicon oxide
|
Wu, Jun; Wang, Ying-Lang; Liu, Chuan-Pu; Chang, Shih-Chieh; Kuo, Cheng-Tzu; Ay, Chyung |
| 國立成功大學 |
2004-01-30 |
Fluorine-modified low-k a-SiOC : H composite films prepared by plasma enhanced chemical vapor deposition
|
JangJean, Shiuh-Ko; Liu, Chuan-Pu; Wang, Ying-Lang; Hwang, Weng-Sing; Tseng, Wei-Tsu; Chen, Sheng-Wen; Lo, Kuang-Yao |
Showing items 106-115 of 121 (13 Page(s) Totally) << < 4 5 6 7 8 9 10 11 12 13 > >> View [10|25|50] records per page
|