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Institution Date Title Author
國家衛生研究院 2017-08 Overexpression of phosphoprotein phosphatase 2A predicts worse prognosis in patients with breast cancer: A 15-year follow-up Chen, PM;Chu, PY;Tung, SL;Liu, CY;Tsai, YF;Lin, YS;Wang, WL;Wang, YL;Lien, PJ;Chao, TC;Tseng, LM
國家衛生研究院 2015-11 Doubly spliced RNA of hepatitis B Virus suppresses viral transcription via TATA-binding protein and induces stress granule assembly Tsai, KN;Chong, CL;Chou, YC;Huang, CC;Wang, YL;Wang, SW;Chen, ML;Chen, CH;Chang, C
國家衛生研究院 2015-06-29 Doxorubicin activates hepatitis B virus replication by elevation of p21 (Waf1/Cip1) and C/EBPalpha expression Chen, YF;Chong, CL;Wu, YC;Wang, YL;Tsai, KN;Kuo, TM;Hong, MH;Hu, CP;Chen, ML;Chou, YC;Chang, CM
國家衛生研究院 2015-03-18 The inhibitory effect of the hepatitis B virus singly-spliced RNA-encoded p21.5 protein on HBV nucleocapsid formation Wang, YL;Liou, GG;Lin, CH;Chen, ML;Kuo, TM;Tsai, KN;Huang, CC;Chen, YL;Huang, LR;Chou, YC;Chang, C
國家衛生研究院 2015-03 Electronic hydroxyl radical microsensors based on the conductivity change of polyaniline Fang, JY;Chu, CH;Sarang, I;Fang, KC;Hsu, CP;Huang, YF;Hsu, CH;Chen, CC;Li, SS;Yeh, AJ;Yao, DJ;Wang, YL
國立交通大學 2014-12-08T15:47:23Z A modified multi-chemical spray cleaning process for post shallow trench isolation chemical mechanical polishing cleaning application Wang, YL; Wang, TC; Wu, J; Tseng, WT; Lin, CF
國立交通大學 2014-12-08T15:46:28Z A ULSI shallow trench isolation process through the integration of multilayered dielectric process and chemical-mechanical planarization Lin, CF; Tseng, WT; Feng, MS; Wang, YL
國立交通大學 2014-12-08T15:44:34Z Study the impact of liner thickness on the 0.18 mu m devices using low dielectric constant hydrogen silsesquioxane as the interlayer dielectric Lan, JK; Wang, YL; Wu, YL; Liou, HC; Wang, JK; Chiu, SY; Cheng, YL; Feng, MS
國立交通大學 2014-12-08T15:43:22Z X-ray reflectivity and FTIR measurements of N-2 plasma effects on the density profile of hydrogen silsesquioxane thin films Lee, HJ; Lin, EK; Wu, WL; Fanconi, BM; Lan, JK; Cheng, YL; Liou, HC; Wang, YL; Feng, MS; Chao, CG
國立交通大學 2014-12-08T15:43:16Z Characterization and reliability of low dielectric constant fluorosilicate glass and silicon rich oxide process for deep sub-micron device application Cheng, YL; Wang, YL; Liu, CW; Wu, YL; Lo, KY; Liu, CP; Lan, JK

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