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机构 日期 题名 作者
國立交通大學 2014-12-08T15:26:47Z Novel strategies of FSG-CMP for within-wafer uniformity improvement and wafer edge yield enhancement beyond 0.18 micro technologies Chen, KW; Wang, YL; Chang, L; Liu, CW; Lin, YK; Wang, TC; Chang, ST; Lo, KY
國立交通大學 2014-12-08T15:19:22Z Formation of pyramid-like nanostructures during cobalt film growth by magnetron sputtering Liu, CP; Chang, JJ; Chen, SW; Chung, HC; Wang, YL
國立交通大學 2014-12-08T15:19:18Z Aplication of plasma immersion ion implantation on seeding copper electroplating for multilevel interconnection Chiu, SY; Wang, YL; Chang, SC; Feng, MS
國立交通大學 2014-12-08T15:18:36Z Study of diffusion and quality control for CoSi2 formation by oxide-mediated cobalt silicidation with Ti capping Chang, JJ; Liu, CP; Hsieh, TE; Wang, YL
國立交通大學 2014-12-08T15:17:41Z CoSix thermal stability on narrow-width polysilicon resistors Chen, YM; Tu, GC; Wang, YL; Hwang, GJ; Lo, CY
國立交通大學 2014-12-08T15:17:21Z Investigation of overpotential and seed thickness on damascene copper electroplating Chen, KW; Wang, YL; Chang, L; Li, FY; Chang, SC
國立交通大學 2014-12-08T15:17:21Z Heat, moisture and chemical resistance on low dielectric constant (low-k) film using diethoxymethylsilane (DEMS) prepared by plasma enhanced chemical vapor deposition Cheng, YL; Wang, YL; Lan, JK; Hwang, GJ; O'Neil, ML; Chen, CF
國立交通大學 2014-12-08T15:17:21Z Effect of deposition temperature and oxygen flow rate on properties of low dielectric constant SiCOH film prepared by plasma enhanced chemical vapor deposition using diethoxymethylsilane Cheng, YL; Wang, YL; Hwang, GJ; O'Neill, ML; Karwacki, EJ; Liu, PT; Chen, CF
國立交通大學 2014-12-08T15:17:21Z Precipitates formation and its impact on the structure of plasma-deposited fluorinated silicon oxide films Wu, J; Wang, YL; Kuo, CT
國立交通大學 2014-12-08T15:17:21Z The study of diffusion and nucleation for COSi2 formation by oxide-mediated cobalt silicidation Chang, JJ; Liu, CP; Hsieh, TE; Wang, YL

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