| 國立臺灣大學 |
2005 |
The effect of radio-frequency glow discharge treatment of polystyrene on the behavior of porcine chondrocytes in vitro
|
Tsai, Wei-Bor; Wei, Ta-Chin; Lin, Mei-Chiao; Wang, Jie-Ying; Chen, Chun-Hong |
| 中原大學 |
2004-05 |
Surface Modificaion of PTFE Membranes Using NH3 and N2/H2 Plasmas
|
Wei, Ta-Chin;Wang, Jie-Ying;Lin, Pei-Ying;Fang, Pei-Shang;Lai,Juin-Yih |
| 中原大學 |
2003-12 |
The Effect of Monomer Inlet Position on the Fluorocarbon Film Deposited by RF Plasma
|
Wei, Ta-Chin;Liu, Chi-Hung |
| 中原大學 |
2003-09 |
Surface Modification of Expanded PTFE Membranes Using Ammonia Based Plasmas
|
魏大欽;王乾盈; Wei, Ta-Chin;Wang, Chieh-Ying |
| 中原大學 |
2003-09 |
Surface Modification of Expanded PTFE Membranes Using Ammonia Based Plasmas
|
魏大欽;王乾盈 ;Wei, Ta-Chin;Wang, Chieh-Ying |
| 中原大學 |
2002-11 |
探討電漿沉積氟碳膜成膜先驅物之鍵結型態對膜材熱穩定性質之影響
|
魏大欽;劉志宏;游清彥 ;Wei, Ta-Chin;Liu, Jy-Hong |
| 中原大學 |
2002-05 |
Plasma Modification of TPX Membrane for Oxygen/Nitrogen Separation
|
Wei, Ta-Chin;Yang, S. W. |
| 中原大學 |
2002-05 |
Effect of Plasma and Chemical Modification on the Surface Properties of Expended Poly(tetrafluoroethylene) Membrane
|
Tu, Chen-Yuan;Wei, Ta-Chin;Ruaan, Ruoh-Chyu;Lee, Kueir-Rarn;Huang, James;Lai, Juin-Yih |
| 中原大學 |
2001-04 |
Evaluation of Process Variables in Plasma Deposition of Low-k Dielectrics Using the Experimental Designs Methodology
|
Wei, Ta-Chin;Liu, Chi-Hung;Yang, Jung-Yen;Lin, Fu-Lin;Huang, Chun-Kai;Dai, Bau-Tong |
| 中原大學 |
2001-04 |
Gas Separation Properties of TPX Membranes Modified by Acetylene/Nitrogen Plasmas
|
Wei, Ta-Chin;Shih, Cheng-Yao;Lai, Juin-Yih;Ruaan, Ruoh-Chyu |
| 中原大學 |
2001-04 |
Platelet Compatibility at Different Membranes---Activation of Glycoprotein Ib/IX Complex of Platelets
|
Chung, Tze-Wen;Huang, Li-Tseng;Wei, Ta-Chin;Ruaan, Ruoh-Chyu Huang, James;Lai, Juin-Yih |
| 南台科技大學 |
2001 |
Reaction Mechanism of Ethylene Oxide at Various Oxygen/Ethylene Oxide Ratio in an RF Plasma Reactor
|
廖渭銅; Liao Wei-Tung; Lee Wen-Jhy ; Wei Ta-Chin ;Chen Chuh-Yung ;Tsai Cheng-Hsien; Shih Minliang |
| 國立成功大學 |
2000-09 |
Global model of plasma chemistry in a high density argon/hydrogen discharge
|
Wei, Ta-Chin; Yang, Chien-Hsin; Cheng, Wen-Cheng |
| 中原大學 |
1999-11 |
Modeling of ECR Argon/Hydrogen Plasma Used for Materials Processing
|
魏大欽;楊智超;Wei, Ta-Chin;Yang, Chih-Chao |
