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Institution Date Title Author
國立成功大學 2024-12 Study on the fabrication of high-quality hafnium oxide thin films using spatial rotated atomic layer deposition and supercritical fluids treatment Lee;Wen-Hsi;Feng;Chien-Ching;Chen;Guan-Fu;Kuo;Tai-Chen
國立成功大學 2024-12 Air-sintered copper-nickel resistor with aluminum layer for oxidation prevention Lee;Wen-Hsi;Chang;S, W.;Puteri;Gharini, Narendra
國立成功大學 2024-09-2 Investigation of the activation and diffusion of ion-implanted p-type and n-type dopants in germanium using high-pressure annealing Kuo;Tai-Chen;Lee;Wen-Hsi;Current;Ira, Michael
國立成功大學 2024-08 Sub- μm Gate-All-Around-Like Amorphous-InGaZnO Transistors With Record-High fT of 2.09 GHz Chang;Shu-Wei;Hu;Hsin-Hui;Wu;Chen-Wei;Lu;Wen-Hsiang;Lee;Wen-Hsi;Lee;Yao-Jen
國立成功大學 2024-07 Characteristic of CuMn Alloy Films Prepared Using Electrochemical Deposition Lee;Wen-Hsi;Puteri;Gharini, Narendra;Kuo;C, R.
國立成功大學 2024-06-3 Temperature Dependent Anomalous Threshold Voltage Modulation of a-IGZO TFT by Incorporating Variant Gate Stresses Aslam;Muhammad;Chang;Shu-Wei;Chen;Yi-Ho;Lee;Yao-Jen;Li;Yiming;Lee;Wen-Hsi
國立成功大學 2024 Mechanism of Threshold Voltage Instability in Double Gate α-IGZO Nanosheet TFT Under Bias and Temperature Stress Aslam;Muhammad;Chang;Shu-Wei;Chen;Yi-Ho;Lee;Yao-Jen;Li;Yiming;Lee;Wen-Hsi
國立成功大學 2023-12 Studies on Ni termination of a multilayer ceramic capacitor with high capacitance by using DC electrodeposition Lee;Wen-Hsi;Puteri;Gharini, Narendra;Lee;Jason;Lee;C, T.
國立成功大學 2023-09-27 Fabrication of a Flexible RFID Antenna by Using the Novel Environmentally Friendly Additive Process Divya;Pandi;Lee;Wen-Hsi
國立成功大學 2023-06 Thick film of modified aluminum with conductivity similar to silver Lee;Wen-Hsi;Puteri;Gharini, Narendra;Kuo;C, R.

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