| 國立成功大學 |
2024-12 |
Study on the fabrication of high-quality hafnium oxide thin films using spatial rotated atomic layer deposition and supercritical fluids treatment
|
Lee;Wen-Hsi;Feng;Chien-Ching;Chen;Guan-Fu;Kuo;Tai-Chen |
| 國立成功大學 |
2024-12 |
Air-sintered copper-nickel resistor with aluminum layer for oxidation prevention
|
Lee;Wen-Hsi;Chang;S, W.;Puteri;Gharini, Narendra |
| 國立成功大學 |
2024-09-2 |
Investigation of the activation and diffusion of ion-implanted p-type and n-type dopants in germanium using high-pressure annealing
|
Kuo;Tai-Chen;Lee;Wen-Hsi;Current;Ira, Michael |
| 國立成功大學 |
2024-08 |
Sub- μm Gate-All-Around-Like Amorphous-InGaZnO Transistors With Record-High fT of 2.09 GHz
|
Chang;Shu-Wei;Hu;Hsin-Hui;Wu;Chen-Wei;Lu;Wen-Hsiang;Lee;Wen-Hsi;Lee;Yao-Jen |
| 國立成功大學 |
2024-07 |
Characteristic of CuMn Alloy Films Prepared Using Electrochemical Deposition
|
Lee;Wen-Hsi;Puteri;Gharini, Narendra;Kuo;C, R. |
| 國立成功大學 |
2024-06-3 |
Temperature Dependent Anomalous Threshold Voltage Modulation of a-IGZO TFT by Incorporating Variant Gate Stresses
|
Aslam;Muhammad;Chang;Shu-Wei;Chen;Yi-Ho;Lee;Yao-Jen;Li;Yiming;Lee;Wen-Hsi |
| 國立成功大學 |
2024 |
Mechanism of Threshold Voltage Instability in Double Gate α-IGZO Nanosheet TFT Under Bias and Temperature Stress
|
Aslam;Muhammad;Chang;Shu-Wei;Chen;Yi-Ho;Lee;Yao-Jen;Li;Yiming;Lee;Wen-Hsi |
| 國立成功大學 |
2023-12 |
Studies on Ni termination of a multilayer ceramic capacitor with high capacitance by using DC electrodeposition
|
Lee;Wen-Hsi;Puteri;Gharini, Narendra;Lee;Jason;Lee;C, T. |
| 國立成功大學 |
2023-09-27 |
Fabrication of a Flexible RFID Antenna by Using the Novel Environmentally Friendly Additive Process
|
Divya;Pandi;Lee;Wen-Hsi |
| 國立成功大學 |
2023-06 |
Thick film of modified aluminum with conductivity similar to silver
|
Lee;Wen-Hsi;Puteri;Gharini, Narendra;Kuo;C, R. |
| 國立成功大學 |
2023-03 |
TCAD-Based RF performance prediction and process optimization of 3D monolithically stacked complementary FET
|
Chang;Shu-Wei;Chou;Jia-Hon;Lee;Wen-Hsi;Lee;Yao-Jen;Lu;Darsen, Darsen D. |
| 國立成功大學 |
2023--AUG |
Characteristic of CuMn Alloy Films Prepared Using Electrochemical Deposition
|
Lee;Wen-Hsi;Puteri;Gharini, Narendra;Kuo;C, R. |
| 國立成功大學 |
2023 |
3-D Monolithic Stacking of Complementary-FET on CMOS for Next Generation Compute-In-Memory SRAM
|
Baig;Aftab, Md.;Yeh;Cheng-Jui;Chang;Shu-Wei;Qiu;Bo-Han;Huang;Xiao-Shan;Tsai;Cheng-Hsien;Chang;Yu-Ming;Sung;Po-Jung;Su;Chun-Jung;Cho;Ta-Chun;De;Sourav;Lu;Darsen;Lee;Yao-Jen;Lee;Wen-Hsi;Wu;Wen-Fa;Yeh;Wen-Kuan |
| 國立成功大學 |
2022-09-1 |
Nanosheet-Compatible Complementary-Field Effect Transistor Logic Non-Volatile Memory Device
|
Chang;Shu-Wei;Chang;Yu-Ming;Lee;Wen-Hsi;Lee;Yao-Jen;Lu;Darsen, Darsen D. |
| 國立成功大學 |
2022-05 |
Power Molding Inductors Prepared Using Amorphous FeSiCrB Alloy Powder, Carbonyl Iron Powder, and Silicone Resin
|
Hsiang;Hsing-;I;Wu;Liang-Chih;Chen;Chih-Cheng;Lee;Wen-Hsi |
| 國立成功大學 |
2021-12 |
Fabrication, simulation, and characterization of planar inductors
|
Hsiang;Hsing-;I;Fan;Shau-Guang;Lee;Wen-Hsi |
| 國立成功大學 |
2021-11 |
A Novel Fabricating a Thick Film Cu-Ni Alloy Resistor by Screen Printing an Al Electrode and Galvanic Replacement Reaction
|
Kuo;C, R.;Kuo;Tzu-Chiang;Lee;Wen-Hsi |
| 國立成功大學 |
2021-04 |
Magnetic Properties of Iron-Based Alloy Powder Coils Prepared with Screen Printing Using High-Solid-Content Magnetic Pastes
|
Hsiang;Hsing-;I;Chuang;Kai-Hsin;Lee;Wen-Hsi |
| 國立成功大學 |
2021-03 |
A Novel Method to Fabricate a Thick-Film Cu Electrode Fired in Air Through Printing Al Electrode and Reduction-Oxidation Substitution Reaction
|
Kuo;Tzu-Chiang;Kuo;C, R.;Lee;Wen-Hsi |
| 國立成功大學 |
2021-01 |
Titanate coupling agent surface modification effect on the magnetic properties of iron-based alloy powder coil prepared using screen printing
|
Hsiang;Hsing-;I;Chuang;Kai-Hsin;Lee;Wen-Hsi |
| 國立成功大學 |
2019-08-1 |
Effect of pretreatment on Al2O3 substrate by depositing Al2O3 film on the properties of Ni-Cr-Si based thin film resistor
|
Chung;K, C.;Lee;Wen-Hsi |
| 國立成功大學 |
2019-03 |
Characteristic of high frequency Fe-Si-Cr material for motor application by selective laser melting
|
Jhong;Kai-Jyun;Chang;Tsung-Wei;Lee;Wen-Hsi;Tsai;Mi-Ching;Jiang;I-Hua |
| 國立成功大學 |
2019-01 |
Effect of annealing conditions on dopants activation and stress conservation in silicon-germanium
|
Kuo;Tai-Chen;Jhong;Kai-Jyun;Lin;Chia-Wei;Lee;Wen-Hsi |
| 國立成功大學 |
2018-04 |
Investigation on Low Firing Copper for Front Electrode of Si-Based Solar Cell Applications
|
Chiang;Chen-Su;Wu;Yia-Ming;Lee;Wen-Hsi |
| 國立成功大學 |
2017-07-3 |
Effect of microwave annealing on electrical characteristics of TiN/Al/TiN/HfO2/Si MOS capacitors
|
Shih;Tzu-Lang;Su;Yin-Hsien;Kuo;Tai-Chen;Lee;Wen-Hsi;Current;Ira, Michael |
