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机构 日期 题名 作者
臺大學術典藏 2020-03-06T03:40:37Z Understanding and managing international product launch: A comparison between developed and emerging markets Lee Y.;Lin B.-W.;Wong Y.-Y.;Calantone R.J.; Lee Y.; Lin B.-W.; Wong Y.-Y.; Calantone R.J.; BOU-WEN LIN
國立交通大學 2019-04-03T06:47:54Z Study of the thermal property of copper oxide nanowires Dee, C. F.; Wong, Y. Y.; Lim, K. P.; Majlis, B. Y.
國立交通大學 2019-04-02T06:04:25Z Growth Parameters Optimization of GaN High Electron Mobility Transistor Structure on Silicon Carbide Substrate Wong, Y. Y.; Huang, S. C.; Huang, W. C.; Lumbantoruan, F.; Chiu, Y. S.; Wang, H. C.; Yu, H. W.; Chang, E. Y.
國立交通大學 2019-04-02T05:59:41Z Effect of substrate misorientation on the material properties of GaAs/Al0.3Ga0.7As tunnel diodes Yu, H. W.; Chang, E. Y.; Nguyen, H. Q.; Chang, J. T.; Chung, C. C.; Kuo, C. I.; Wong, Y. Y.; Wang, W. C.
國立交通大學 2019-04-02T05:58:46Z Electrical Characterization of Al2O3/n-InAs Metal-Oxide-Semiconductor Capacitors With Various Surface Treatments Trinh, H. D.; Brammertz, G.; Chang, E. Y.; Kuo, C. I.; Lu, C. Y.; Lin, Y. C.; Nguyen, H. Q.; Wong, Y. Y.; Tran, B. T.; Kakushima, K.; Iwai, H.
國立交通大學 2019-04-02T05:57:57Z The influences of surface treatment and gas annealing conditions on the inversion behaviors of the atomic-layer-deposition Al2O3/n-In0.53Ga0.47As metal-oxide-semiconductor capacitor Trinh, H. D.; Chang, E. Y.; Wu, P. W.; Wong, Y. Y.; Chang, C. T.; Hsieh, Y. F.; Yu, C. C.; Nguyen, H. Q.; Lin, Y. C.; Lin, K. L.; Hudait, M. K.
國立成功大學 2017 Performance improvement of highly mismatched GaSb layers on GaAs by interfacial-treatment-assisted chemical vapor deposition Hsiao, C.-J.;Ha, M.-T.-H.;Liu, C.-K.;Nguyen, H.-Q.;Yu, H.-W.;Chang, S.-P.;Wong, Y.-Y.;Maa, J.-S.;Chang, S.-J.;Chang, E.Y.
國立交通大學 2014-12-08T15:38:19Z Effect of substrate misorientation on the material properties of GaAs/Al(0.3)Ga(0.7)As tunnel diodes Yu, H. W.; Chang, E. Y.; Nguyen, H. Q.; Chang, J. T.; Chung, C. C.; Kuo, C. I.; Wong, Y. Y.; Wang, W. C.
國立交通大學 2014-12-08T15:36:26Z Low Current Collapse and Low Leakage GaN MIS-HEMT Using AlN/SiN as Gate Dielectric and Passivation Layer Liu, S. C.; Wong, Y. Y.; Lin, Y. C.; Chang, E. Y.
國立交通大學 2014-12-08T15:36:26Z Ti/Al/Ni/Cu Ohmic Contact with Low Contact Resistance and Smooth Surface Morphology for AlGaN/GaN HEMT Wong, Y. -Y.; Chang, E. Y.; Chen, Y. -K.; Liu, S. -C.; Lin, Y. -C.; Ma, J. -S.
國立交通大學 2014-12-08T15:33:42Z Electrical Characterization of Al(2)O(3)/n-InAs Metal-Oxide-Semiconductor Capacitors With Various Surface Treatments Trinh, H. D.; Brammertz, G.; Chang, E. Y.; Kuo, C. I.; Lu, C. Y.; Lin, Y. C.; Nguyen, H. Q.; Wong, Y. Y.; Tran, B. T.; Kakushima, K.; Iwai, H.
國立交通大學 2014-12-08T15:20:42Z Effect of graded-temperature arsenic prelayer on quality of GaAs on Ge/Si substrates by metalorganic vapor phase epitaxy Yu, H. W.; Chang, E. Y.; Yamamoto, Y.; Tillack, B.; Wang, W. C.; Kuo, C. I.; Wong, Y. Y.; Nguyen, H. Q.
國立交通大學 2014-12-08T15:06:33Z The influences of surface treatment and gas annealing conditions on the inversion behaviors of the atomic-layer-deposition Al(2)O(3)/n-In(0.53)Ga(0.47)As metal-oxide-semiconductor capacitor Trinh, H. D.; Chang, E. Y.; Wu, P. W.; Wong, Y. Y.; Chang, C. T.; Hsieh, Y. F.; Yu, C. C.; Nguyen, H. Q.; Lin, Y. C.; Lin, K. L.; Hudait, M. K.

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