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Institution Date Title Author
國立交通大學 2015-07-21T08:28:43Z Investigation of Barrier Property of Copper Manganese Alloy on Ruthenium Su, Yin-Hsien; Wu, Sze-Ann; Wu, Chia-Yang; Wang, Ying-Lang; Lee, Wen-Hsi
國立成功大學 2015-03 Investigation of Barrier Property of Copper Manganese Alloy on Ruthenium Su, Yin-Hsien; Wu, Sze-Ann; Wu, Chia-Yang; Wang, Ying-Lang; Lee, Wen-Hsi
國立交通大學 2014-12-08T15:37:57Z Effect of Annealing on the Microstructure and Electrical Property of RuN Thin Films Wu, Chia-Yang; Lee, Wen-Hsi; Chang, Shih-Chieh; Cheng, Yi-Lung; Wang, Ying-Lang
國立交通大學 2014-12-08T15:31:06Z Investigation the Electroplating Behavior of Self Formed CuMn Barrier Wu, Chia-Yang; Lee, Wen-Hsi; Chang, Shih-Chieh; Wang, Ying-Lang
國立交通大學 2014-12-08T15:22:12Z Investigation of the Galvanic Effect between RuN Barriers and Cu Seed Layers Wu, Chia-Yang; Lee, Wen-Hsi; Chang, Shih-Chieh; Wang, Ying-Lang
國立成功大學 2014-03 A Study of Cu/CuMn Barrier for 22-nm Semiconductor Manufacturing Wu, Sze-Ann; Cheng, Yi-Lung; Wu, Chia-Yang; Lee, Wen-Hsi
國立成功大學 2013-08 Investigation the Electroplating Behavior of Self Formed CuMn Barrier Wu, Chia-Yang; Lee, Wen-Hsi; Chang, Shih-Chieh; Wang, Ying-Lang
國立成功大學 2012-11-25 A study on annealing mechanisms with different manganese contents in CuMn alloy Wu, Chia-Yang; Wu, Chi-Ting; Lee, Wen-Hsi; Chang, Shih-Chieh; Wang, Ying-Lang
國立成功大學 2012-11-14 提升應用於次30奈米金屬化製程無種晶阻障層之阻障特性以及熱穩定性 吳家揚; Wu, Chia-Yang
國立成功大學 2012 Copper Electrodeposition on Ru-N Barrier with Various Nitrogen Content for 22 nm Semiconductor Manufacturing Application Wu, Chia-Yang; Wang, Yu-Sheng; Lee, Wen-Hsi
國立成功大學 2011 Effect of Annealing on the Microstructure and Electrical Property of RuN Thin Films Wu, Chia-Yang; Lee, Wen-Hsi; Chang, Shih-Chieh; Cheng, Yi-Lung; Wang, Ying-Lang
國立暨南國際大學 2010 家族公司持股變化、機構投資人持股與公司價值關聯性之研究 吳家揚; Wu, Chia-Yang

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