|
English
|
正體中文
|
简体中文
|
總筆數 :0
|
|
造訪人次 :
51827880
線上人數 :
825
教育部委託研究計畫 計畫執行:國立臺灣大學圖書館
|
|
|
"wu cy"的相關文件
顯示項目 311-320 / 607 (共61頁)
<< < 27 28 29 30 31 32 33 34 35 36 > >>
每頁顯示[10|25|50]項目
| 國立交通大學 |
2014-12-08T15:06:09Z |
CORRELATIONS BETWEEN CMOS LATCH-UP CHARACTERISTICS AND SUBSTRATE STRUCTURE PARAMETERS
|
CHEN, MJ; WU, CY |
| 國立交通大學 |
2014-12-08T15:06:08Z |
A NEW OXIDATION-RESISTANT SELF-ALIGNED TISI2 PROCESS
|
TSENG, HH; WU, CY |
| 國立交通大學 |
2014-12-08T15:06:07Z |
A CHARACTERIZATION MODEL FOR CONSTANT CURRENT STRESSED VOLTAGE-TIME CHARACTERISTICS OF THIN THERMAL OXIDES GROWN ON SILICON SUBSTRATE
|
CHEN, CF; WU, CY |
| 國立交通大學 |
2014-12-08T15:06:06Z |
THE ANALYSIS AND DESIGN OF CMOS MULTIDRAIN LOGIC AND STACKED MULTIDRAIN LOGIC
|
WU, CY; WANG, JS; TSAI, MK |
| 國立交通大學 |
2014-12-08T15:06:06Z |
A SIMPLE TECHNIQUE FOR MEASURING THE INTERFACE-STATE DENSITY OF THE SCHOTTKY-BARRIER DIODES USING THE CURRENT-VOLTAGE CHARACTERISTICS
|
TSENG, HH; WU, CY |
| 國立交通大學 |
2014-12-08T15:06:05Z |
THE DISTORTION OF THE INTERFACE-STATE SPECTRUM DUE TO NONEQUILIBRIUM OCCUPANCY OF THE INTERFACE STATES AT THE METAL-SEMICONDUCTOR INTERFACE
|
TSENG, HH; WU, CY |
| 國立交通大學 |
2014-12-08T15:06:05Z |
THE EFFECTS OF THERMAL NITRIDATION CONDITIONS ON THE RELIABILITY OF THIN NITRIDED OXIDE-FILMS
|
TSAI, HH; WU, LC; WU, CY; HU, CM |
| 國立交通大學 |
2014-12-08T15:06:05Z |
A NEW STRUCTURE-ORIENTED MODEL FOR WELL RESISTANCE IN CMOS LATCHUP STRUCTURES
|
CHEN, MJ; SZE, SC; CHEN, HH; WU, CY |
| 國立交通大學 |
2014-12-08T15:06:05Z |
A SIMPLE INTERFACIAL-LAYER MODEL FOR THE NONIDEAL IV AND C-V CHARACTERISTICS OF THE SCHOTTKY-BARRIER DIODE
|
TSENG, HH; WU, CY |
| 國立交通大學 |
2014-12-08T15:06:04Z |
AN ANALYTIC IV MODEL FOR LIGHTLY DOPED DRAIN (LDD) MOSFET DEVICES
|
HUANG, GS; WU, CY |
顯示項目 311-320 / 607 (共61頁)
<< < 27 28 29 30 31 32 33 34 35 36 > >>
每頁顯示[10|25|50]項目
|
