| 國立成功大學 |
2023 |
How Fault-Tolerant Quantum Computing Benefits from Cryo-CMOS Technology
|
Chiang, H.-L.;Hadi, R.A.;Wang, J.-F.;Han, Han H.-C.;Wu, J.-J.;Hsieh, Hsieh H.-H.;Horng, J.-J.;Chou, W.-S.;Lien, B.-S.;Chang, Chang C.-H.;Chen, Y.-C.;Wang, Y.-H.;Chen, T.-C.;Liu, J.-C.;Liu, Y.-C.;Chiang, M.-H.;Kao, Kao K.-H.;Pulicherla, B.;Cai, J.;Chang, Chang C.-S.;Su, K.-W.;Cheng, K.-L.;Yeh, T.-J.;Peng, Y.-C.;Enz, C.;Chang, M.-C.F.;Chang, M.-F.;Wong, H.-S.P.;Radu, I.P. |
| 臺大學術典藏 |
2022-08-09T03:50:58Z |
The use of a biomolecular target for crystalline carbon nitride film deposition by Ar ion-beam sputtering without any other source of nitrogen
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Chen L.C.; Lu T.R.; Kuo C.T.; Bhusari D.M.; Wu J.J.; Chen K.H.; Chen T.M.; Chen L.C.; Lu T.R.; Kuo C.T.; Bhusari D.M.; Wu J.J.; Chen K.H.; Chen T.M.; LI-CHYONG CHEN |
| 臺大學術典藏 |
2022-08-09T03:50:55Z |
Wide band gap silicon carbon nitride films deposited by electron cyclotron resonance plasma chemical vapor deposition
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Chen K.H.; Wu J.-J.; Wen C.Y.; Chen L.C.; Fan C.W.; Kuo P.F.; Chen Y.F.; Huang Y.S.; Chen K.H.; Wu J.-J.; Wen C.Y.; Chen L.C.; Fan C.W.; Kuo P.F.; Chen Y.F.; Huang Y.S.; LI-CHYONG CHEN |
| 臺大學術典藏 |
2022-08-09T03:50:55Z |
Crystalline SiCN: A hard material rivals to cubic BN
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Chen L.C.; Chen K.H.; Wei S.L.; Kichambare P.D.; Wu J.J.; Lu T.R.; Kuo C.T.; Chen L.C.; Chen K.H.; Wei S.L.; Kichambare P.D.; Wu J.J.; Lu T.R.; Kuo C.T.; LI-CHYONG CHEN |
| 臺大學術典藏 |
2022-08-09T03:50:54Z |
Deposition of silicon carbon nitride films by ion beam sputtering
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Wu J.-J.; Wu C.-T.; Liao Y.-C.; Lu T.-R.; Chen L.C.; Chen K.H.; Hwa L.-G.; Kuo C.-T.; Ling K.-J.; Wu J.-J.; Wu C.-T.; Liao Y.-C.; Lu T.-R.; Chen L.C.; Chen K.H.; Hwa L.-G.; Kuo C.-T.; Ling K.-J.; LI-CHYONG CHEN |
| 臺大學術典藏 |
2022-08-09T03:50:54Z |
Nano-carbon nitride synthesis from a bio-molecular target for ion beam sputtering at low temperature
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Wu J.-J.; Lu T.-R.; Wu C.-T.; Wang T.-Y.; Chen L.-C.; Chen K.-H.; Kuo C.-T.; Chen T.-M.; Yu Y.-C.; Wang C.-W.; Lin E.-K.; Wu J.-J.; Wu C.-T.; Wang T.-Y.; Chen L.-C.; LI-CHYONG CHEN |
| 臺大學術典藏 |
2022-08-09T03:50:52Z |
Growth, characterization, and properties of carbon nitride with and without silicon addition
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Chen L.C.; Wu C.T.; Wu J.-J.; Chen K.H.; Chen L.C.; Wu C.T.; Wu J.-J.; Chen K.H.; LI-CHYONG CHEN |
| 臺大學術典藏 |
2022-08-09T03:50:52Z |
X-ray absorption of Si-C-N thin films: A comparison between crystalline and amorphous phases
|
Chang Y.K.; Hsieh H.H.; Pong W.F.; Tsai M.-H.; Dann T.E.; Chien F.Z.; Tseng P.K.; Chen L.C.; Wei S.L.; Chen K.H.; Wu J.-J.; Chen Y.F.; Chang Y.K.; Chen L.C.; Wei S.L.; Chen Y.F.; LI-CHYONG CHEN |
| 臺大學術典藏 |
2022-08-09T03:50:51Z |
Structural, optical and electrical characteristics of silicon carbon nitride
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Chen L.C.; Wu C.T.; Wen C.-Y.; Wu J.-J.; Liu W.T.; Liu C.W.; Chen L.C.; Wu C.T.; Wen C.-Y.; Wu J.-J.; Liu W.T.; Liu C.W.; LI-CHYONG CHEN |
| 臺大學術典藏 |
2022-08-09T03:50:50Z |
Effect of H2 addition on SiCN film growth in an electron cyclotron resonance plasma chemical vapor deposition reactor
|
Wu J.-J.; Chen K.-H.; Wen C.-Y.; Chen L.-C.; Wang J.-K.; Yu Y.-C.; Wang C.-W.; Lin E.-K.; Wu J.-J.; Chen K.-H.; Wen C.-Y.; Chen L.-C.; Wang J.-K.; Yu Y.-C.; Wang C.-W.; Lin E.-K.; LI-CHYONG CHEN |
