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Institution Date Title Author
國立成功大學 2005-06-17 氮砷化銦鎵高載子移動率電晶體線性度的改良 吳俊德; Wu, Jyun-De
國立成功大學 2005-06-17 氮砷化銦鎵高載子移動率電晶體線性度的改良 吳俊德; Wu, Jyun-De
國立成功大學 2004-09 Effect of occupational exposure to rayon manufacturing chemicals on skin barrier to evaporative water loss Chou, Tzu-Chieh; Shih, Tung-Sheng; Tsai, Jui-Chen; Wu, Jyun-De; Sheu, Hamm-Min; Chang, Ho-Yuan
國立成功大學 2004-05 Combined exposure to carbon disulfide and sulfuric acid simultaneously increases the risk of hand dermatitis in rayon industry Chou, Tzu-Chieh; Sheu, Hamm-Min; Chiu, Jing-Er; Wu, Jyun-De; Shih, Tung-Sheng; Chang, Ho-Yuan
國立臺灣大學 2003 COMMENT ON SETTING UP OCCUPATIONAL EXPOSURE LEVEL IN RELATION TO RISK ASSESSMENT LIN, JIA-MING; WU, JYUN-DE; 林嘉明; 吳俊德

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