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Showing items 11-15 of 15 (1 Page(s) Totally)
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| 國立成功大學 |
2005-06-17 |
氮砷化銦鎵高載子移動率電晶體線性度的改良
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吳俊德; Wu, Jyun-De |
| 國立成功大學 |
2005-06-17 |
氮砷化銦鎵高載子移動率電晶體線性度的改良
|
吳俊德; Wu, Jyun-De |
| 國立成功大學 |
2004-09 |
Effect of occupational exposure to rayon manufacturing chemicals on skin barrier to evaporative water loss
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Chou, Tzu-Chieh; Shih, Tung-Sheng; Tsai, Jui-Chen; Wu, Jyun-De; Sheu, Hamm-Min; Chang, Ho-Yuan |
| 國立成功大學 |
2004-05 |
Combined exposure to carbon disulfide and sulfuric acid simultaneously increases the risk of hand dermatitis in rayon industry
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Chou, Tzu-Chieh; Sheu, Hamm-Min; Chiu, Jing-Er; Wu, Jyun-De; Shih, Tung-Sheng; Chang, Ho-Yuan |
| 國立臺灣大學 |
2003 |
COMMENT ON SETTING UP OCCUPATIONAL EXPOSURE LEVEL IN RELATION TO RISK ASSESSMENT
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LIN, JIA-MING; WU, JYUN-DE; 林嘉明; 吳俊德 |
Showing items 11-15 of 15 (1 Page(s) Totally)
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