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| 臺大學術典藏 |
2018-09-10T06:28:13Z |
Effect of Al incorporation in the thermal stability of atomic-layer-deposited HfO2 for gate dielectric applications
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MINGHWEI HONG; Hong, Minghwei; Kwo, Raynien; Wu, Tai-Bor; Chiou, Yan-Kai; Chang, Che-Hao; Wang, Chen-Chan; Lee, Kun-Yu |
| 臺大學術典藏 |
2018-09-10T06:28:12Z |
Advance in next Century nanoCMOSFET research
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Chiou, Yan-Kai; Chang, Che-Hao; Wang, Chen-Chan; Lee, Kun-Yu; Wu, Tai-Bor; Kwo, Raynien; Hong, Minghwei; Chang-Liao, Kuei-Shu; Lu, Chun-Yuan; others; MINGHWEI HONG; Hwang, Huey-Liang |
| 國立交通大學 |
2017-04-21T06:48:56Z |
An oxide-buffered BE-MANOS charge-trapping device and the role of Al2O3
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Lai, Sheng-Chih; Lue, Hang-Ting; Liao, Chien-Wei; Huang, Yu-Fong; Yang, Ming-Jui; Lue, Yi-Hsien; Wu, Tai-Bor; Hsieh, Jung-Yu; Wang, Szu-Yu; Hong, Shih-Ping; Hsu, Fang-Hao; Shen, Chih-Yen; Luo, Guang-Li; Chien, Chao-Hsin; Hsieh, Kuan-Yeu; Liu, Rich; Lu, Chih-Yuan |
| 國立交通大學 |
2017-04-21T06:48:54Z |
Highly reliable MA BE-SONOS (Metal-Al2O3 bandgap engineered SONOS) using a SiO2 buffer layer
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Lai, Sheng-Chih; Lue, Hang-Ting; Liao, Chien-Wei; Wu, Tai-Bor; Yang, Ming-Jui; Lue, Yi-Hsien; Hsieh, Jung-Yu; Wang, Szu-Yu; Luo, Guang-Li; Chien, Chao-Hsin; Hsieh, Kuang-Yeu; Liu, Rich; Lu, Chih-Yuan |
| 國立交通大學 |
2014-12-08T15:10:49Z |
Interface effects on the magnetoelectric properties of (00l)-oriented Pb(Zr0.5Ti0.5)O-3/CoFe2O4 multilayer thin films
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Lin, Rueijer; Wu, Tai-bor; Chu, Ying-Hao |
| 國立交通大學 |
2014-12-08T15:09:06Z |
Effect of bias stress on mechanically strained low temperature polycrystalline silicon thin film transistor on stainless steel substrate
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Peng, I-Hsuan; Liu, Po-Tsun; Wu, Tai-Bor |
| 國立交通大學 |
2014-12-08T15:05:21Z |
Advance in next Century nanoCMOSFET research
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Hwang, Huey-Liang; Chiou, Yan-Kai; Chang, Che-Hao; Wang, Chen-Chan; Lee, Kun-Yu; Wu, Tai-Bor; Kwo, Raynien; Hong, Minghwei; Chang-Liao, Kuei-Shu; Lu, Chun-Yuan; Lu, Chun-Chang; Chiu, Fu-Chien; Chen, Chun-Heng; Lee, Joseph Ya-Min; Chin, Albert |
| 國立成功大學 |
2011-03-21 |
Influences of surface reconstruction on the atomic-layer-deposited HfO(2)/Al(2)O(3)/n-InAs metal-oxide-semiconductor capacitors
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Lin, Hau-Yu; Wu, San-Lein; Cheng, Chao-Ching; Ko, Chih-Hsin; Wann, Clement H.; Lin, You-Ru; Chang, Shoou-Jinn; Wu, Tai-Bor |
| 國立成功大學 |
2011 |
Influence of surface reconstruction on the atomic-layer-deposited HfO2/Al2O3/n-InAs metal-oxide-semiconductor capacitors
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Lin, Hau-Yu;Wu, San-Lein;Cheng, Chao-Ching;Ko, Chih-Hsin;Wann, Clement H.;Lin, You-Ru;Chang, Shoou-Jinn;Wu, Tai-Bor |
| 國立臺灣大學 |
2010 |
Resistive switching behaviors of ZnO nanorod layers
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Chang, Wen-Yuan; Lin, Chin-An; He, Jr-Hau; Wu, Tai-Bor |
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