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机构 日期 题名 作者
國立交通大學 2014-12-08T15:04:02Z ELECTRICAL BEHAVIOR OF LOW-POWER RF MAGNETRON-SPUTTERED INDIUM TIN OXIDE-FILMS ON SILICON SUBSTRATE CHIOU, BS; HSIEH, ST; WU, WF
國立交通大學 2014-12-08T15:03:56Z EFFECT OF SPUTTERING POWER ON THE STRUCTURAL AND OPTICAL-PROPERTIES OF RF MAGNETRON-SPUTTERED ITO FILMS WU, WF; CHIOU, BS; HSIEH, ST
國立交通大學 2014-12-08T15:03:53Z PROPERTIES OF RADIOFREQUENCY MAGNETRON-SPUTTERED ITO FILMS WITHOUT IN-SITU SUBSTRATE HEATING AND POSTDEPOSITION ANNEALING WU, WF; CHIOU, BS
國立交通大學 2014-12-08T15:03:53Z DEPOSITION OF INDIUM TIN OXIDE-FILMS ON ACRYLIC SUBSTRATES BY RADIOFREQUENCY MAGNETRON SPUTTERING CHIOU, BS; HSIEH, ST; WU, WF
國立交通大學 2014-12-08T15:02:52Z Effect of oxygen concentration in the sputtering ambient on the microstructure, electrical and optical properties of radio-frequency magnetron-sputtered indium tin oxide films Wu, WF; Chiou, BS
國立交通大學 2014-12-08T15:02:30Z Properties of radio frequency magnetron sputtered silicon dioxide films Wu, WF; Chiou, BS
國立交通大學 2014-12-08T15:02:24Z Optical and mechanical properties of reactively sputtered silicon dioxide films Wu, WF; Chiou, BS
國立交通大學 2014-12-08T15:01:50Z Deposition of indium tin oxide films on polycarbonate substrates by radio-frequency magnetron sputtering Wu, WF; Chiou, BS
國立交通大學 2014-12-08T15:01:49Z Mechanical and optical properties of ITO films with anti-reflective and anti-wear coatings Wu, WF; Chiou, BS
國立交通大學 2014-12-08T15:01:23Z Characterization of TiN film grown by low-pressure-chemical-vapor-deposition Mei, YJ; Chang, TC; Hu, JC; Chen, LJ; Yang, YL; Pan, FM; Wu, WF; Ting, A; Chang, CY
國家衛生研究院 2012-10-05 Genome-wide PhoB binding and gene expression profiles reveal the hierarchical gene regulatory network of phosphate starvation in escherichia coli Yang, C;Huang, TW;Wen, SY;Chang, CY;Tsai, SF;Wu, WF;Chang, CH
國立臺灣大學 2007-04 Current Enhanced Magnetic Proximity in Nd0.7Ca0.3MnO3/YBa2Cu3O7 Bilayer Hsu, D; Lin, JG; Chang, CP; Chen, CH; Wu, WF; Chiang, CH; Chan, WC
國立臺灣大學 2006-05 Low-current-induced electrical hysteresis in Nd0.7Ca0.3MnO3 Hsu, D; Lin, JG; Wu, WF

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