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Showing items 11-35 of 38 (2 Page(s) Totally)
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| 國立交通大學 |
2014-12-08T15:42:00Z |
Improved TaN barrier layer against Cu diffusion by formation of an amorphous layer using plasma treatment
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Ou, KL; Wu, WF; Chou, CP; Chiou, SY; Wu, CC |
| 國立交通大學 |
2014-12-08T15:41:47Z |
Improving the electrical integrity of Cu-CoSi2 contacted n(+)p junction diodes using nitrogen-incorporated Ta films as a diffusion barrier
|
Yang, WL; Wu, WF; You, HC; Ou, KL; Lei, TF; Chou, CP |
| 國立交通大學 |
2014-12-08T15:41:21Z |
Effects of nitrogen plasma treatment on tantalum diffusion barriers in copper metallization
|
Wu, WF; Ou, KL; Chou, CP; Wu, CC |
| 國立交通大學 |
2014-12-08T15:41:19Z |
PECVD-Ti/TiNx barrier with multilayered amorphous structure and high thermal stability for copper metallization
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Wu, WF; Ou, KL; Chou, CP; Hsu, JL |
| 國立交通大學 |
2014-12-08T15:39:18Z |
Influence of N2O plasma treatment on microstructure and thermal stability of WNx barriers for Cu interconnection
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Tsai, KC; Wu, WF; Chen, JC; Pan, TJ; Chao, CG |
| 國立交通大學 |
2014-12-08T15:38:51Z |
Electromigration and integration aspects for the copper-SiLK system
|
Tseng, HS; Chiou, BS; Wu, WF; Ho, CC |
| 國立交通大學 |
2014-12-08T15:37:09Z |
Numerical and experimental analysis of Cu diffusion in plasma-treated tungsten barrier
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Tsai, KC; Wu, WF; Chen, JC; Pan, TJ; Chao, CG |
| 國立交通大學 |
2014-12-08T15:27:50Z |
FABRICATION AND CHARACTERISTICS OF RF MAGNETRON-SPUTTERED ITO THIN-FILMS
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WU, WF; CHIOU, BS |
| 國立交通大學 |
2014-12-08T15:27:02Z |
Plasma process induced damage in sputtered TiN metal gate capacitors with ultra-thin nitrided oxide
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Chen, CC; Lin, HC; Chang, CY; Chao, TS; Huang, SC; Wu, WF; Huang, TY; Liang, MS |
| 國立交通大學 |
2014-12-08T15:18:43Z |
Novel multilayered Ti/TiN diffusion barrier for Al metallization
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Wu, WF; Tsai, KC; Chao, CG; Chen, JC; Ou, KL |
| 國立交通大學 |
2014-12-08T15:17:54Z |
Carbon nanotubes grown using cobalt silicide as catalyst and hydrogen pretreatment
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Wen, HC; Yang, KH; Ou, KL; Wu, WF; Luo, RC; Chou, CP |
| 國立交通大學 |
2014-12-08T15:17:43Z |
High-reliability Ta2O5 metal-insulator-metal capacitors with Cu-based electrodes
|
Tsai, KC; Wu, WF; Chao, CG; Kuan, CP |
| 國立交通大學 |
2014-12-08T15:17:21Z |
Effects of ammonia plasma treatment on the surface characteristics of carbon fibers
|
Wen, HC; Yang, K; Ou, KL; Wu, WF; Chou, CP; Luo, RC; Chang, YM |
| 國立交通大學 |
2014-12-08T15:04:43Z |
SIZE EFFECT ON THE ELECTRICAL-CONDUCTION AND NOISE OF RUO2-BASED THICK-FILM RESISTORS
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CHIOU, BS; SHEU, JY; WU, WF |
| 國立交通大學 |
2014-12-08T15:04:24Z |
EFFECT OF ANNEALING ON ELECTRICAL AND OPTICAL-PROPERTIES OF RF MAGNETRON-SPUTTERED INDIUM TIN OXIDE-FILMS
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WU, WF; CHIOU, BS |
| 國立交通大學 |
2014-12-08T15:04:02Z |
ELECTRICAL BEHAVIOR OF LOW-POWER RF MAGNETRON-SPUTTERED INDIUM TIN OXIDE-FILMS ON SILICON SUBSTRATE
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CHIOU, BS; HSIEH, ST; WU, WF |
| 國立交通大學 |
2014-12-08T15:03:56Z |
EFFECT OF SPUTTERING POWER ON THE STRUCTURAL AND OPTICAL-PROPERTIES OF RF MAGNETRON-SPUTTERED ITO FILMS
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WU, WF; CHIOU, BS; HSIEH, ST |
| 國立交通大學 |
2014-12-08T15:03:53Z |
PROPERTIES OF RADIOFREQUENCY MAGNETRON-SPUTTERED ITO FILMS WITHOUT IN-SITU SUBSTRATE HEATING AND POSTDEPOSITION ANNEALING
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WU, WF; CHIOU, BS |
| 國立交通大學 |
2014-12-08T15:03:53Z |
DEPOSITION OF INDIUM TIN OXIDE-FILMS ON ACRYLIC SUBSTRATES BY RADIOFREQUENCY MAGNETRON SPUTTERING
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CHIOU, BS; HSIEH, ST; WU, WF |
| 國立交通大學 |
2014-12-08T15:02:52Z |
Effect of oxygen concentration in the sputtering ambient on the microstructure, electrical and optical properties of radio-frequency magnetron-sputtered indium tin oxide films
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Wu, WF; Chiou, BS |
| 國立交通大學 |
2014-12-08T15:02:30Z |
Properties of radio frequency magnetron sputtered silicon dioxide films
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Wu, WF; Chiou, BS |
| 國立交通大學 |
2014-12-08T15:02:24Z |
Optical and mechanical properties of reactively sputtered silicon dioxide films
|
Wu, WF; Chiou, BS |
| 國立交通大學 |
2014-12-08T15:01:50Z |
Deposition of indium tin oxide films on polycarbonate substrates by radio-frequency magnetron sputtering
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Wu, WF; Chiou, BS |
| 國立交通大學 |
2014-12-08T15:01:49Z |
Mechanical and optical properties of ITO films with anti-reflective and anti-wear coatings
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Wu, WF; Chiou, BS |
| 國立交通大學 |
2014-12-08T15:01:23Z |
Characterization of TiN film grown by low-pressure-chemical-vapor-deposition
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Mei, YJ; Chang, TC; Hu, JC; Chen, LJ; Yang, YL; Pan, FM; Wu, WF; Ting, A; Chang, CY |
Showing items 11-35 of 38 (2 Page(s) Totally)
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