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Taiwan Academic Institutional Repository >
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"wu wh"
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| 國家衛生研究院 |
2023-09-09 |
Lower HbA1C of glycemic control is associated with higher risk of depressive symptoms in elderly with type 2 diabetes mellitus–A nationwide community-based study
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Liu, YT;Wu, WH;Tseng, WT;Lin, HC;Wu, MS;Chen, PF;Wu, IC |
| 國立交通大學 |
2019-04-02T06:00:18Z |
Effects of base oxide thickness and silicon composition on charge trapping in HfSiO/SiO2 high-k gate stacks
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Wu, WH; Chen, MC; Tsui, BY; How, YT; Yao, LG; Jin, Y; Tao, HJ; Chen, SC; Liang, MS |
| 國立交通大學 |
2019-04-02T06:00:17Z |
Formation of NiSi-silicided p(+)n shallow junctions by BF2+ implantation into/through silicide and rapid thermal annealing
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Wang, CC; Wu, YK; Wu, WH; Chen, MC |
| 國家衛生研究院 |
2017-05-16 |
The generalized inference on the sign testing problem about the normal variances
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Wu, WY;Wu, WH;Hsieh, HN;Lee, MC |
| 高雄醫學大學 |
2015 |
B細胞淋巴癌病人使用莫須瘤結合化療產生次發性惡性腫瘤之風險研究
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卓士峰;吳宛璇;楊奕馨;張肇松; Cho, SF;Wu, WH;Yang, YH;Chang, CS |
| 國立交通大學 |
2014-12-08T15:43:49Z |
Dielectric and barrier properties of spin-on organic aromatic low dielectric constant polymers FLARE and SiLK
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Wu, ZC; Shiung, ZW; Wu, RG; Liu, YL; Wu, WH; Tsui, BY; Chen, MC; Chang, W; Chou, PF; Jang, SM; Hu, CH; Liang, MS |
| 國立交通大學 |
2014-12-08T15:43:49Z |
Physical and electrical characteristics of F- and C-doped low dielectric constant chemical vapor deposited oxides
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Wu, ZC; Shiung, ZW; Chiang, CC; Wu, WH; Chen, MC; Jeng, SM; Chang, W; Chou, PF; Jang, SM; Yu, CH; Liang, MS |
| 國立交通大學 |
2014-12-08T15:43:48Z |
Leakage mechanism in Cu damascene structure with methylsilane-doped low-K CVD oxide as intermetal dielectric
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Wu, ZC; Chiang, CC; Wu, WH; Chen, MC; Jeng, SM; Li, LJ; Jang, SM; Yu, CH; Liang, MS |
| 國立交通大學 |
2014-12-08T15:43:48Z |
Physical and electrical characteristics of methylsilane- and trimethylsilane-doped low dielectric constant chemical vapor deposited oxides
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Wu, ZC; Shiung, ZW; Chiang, CC; Wu, WH; Chen, MC; Jeng, SM; Chang, W; Chou, PF; Jang, SM; Yu, CH; Liang, MS |
| 國立交通大學 |
2014-12-08T15:40:39Z |
Physical and barrier properties of plasma enhanced chemical vapor deposition alpha-SiC : N : H films
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Chiang, CC; Wu, ZC; Wu, WH; Chen, MC; Ko, CC; Chen, HP; Jang, SM; Yu, CH; Liang, MS |
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