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Showing items 1-24 of 24 (1 Page(s) Totally)
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| 國立交通大學 |
2019-04-02T06:01:07Z |
X-ray photoelectron spectroscopy energy band alignment of spin-on CoTiO3 high-k dielectric prepared by sol-gel spin coating method
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Kao, Kuo-Hsing; Chuang, Shiow-Huey; Wu, Woei-Cherng; Chao, Tien-Sheng; Chen, Jian-Hao; Ma, Ming-Wen; Gao, Reui-Hong; Chiang, Michael Y. |
| 國立交通大學 |
2019-04-02T06:00:59Z |
Positive Bias Temperature Instability (PBTI) Characteristics of Contact-Etch-Stop-Layer-Induced Local-Tensile-Strained HfO2 nMOSFET
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Wu, Woei-Cherng; Chao, Tien-Sheng; Chiu, Te-Hsin; Wang, Jer-Chyi; Lai, Chao-Sung; Ma, Ming-Wen; Lo, Wen-Cheng |
| 國立交通大學 |
2014-12-08T15:48:23Z |
High-Reliability Dynamic-Threshold Source-Side Injection for 2-Bit/Cell With MLC Operation of Wrapped Select-Gate SONOS in NOR-Type Flash Memory
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Wang, Kuan-Ti; Chao, Tien-Sheng; Wu, Woei-Cherng; Yang, Wen-Luh; Lee, Chien-Hsing; Hsieh, Tsung-Min; Liou, Jhyy-Cheng; Wang, Shen-De; Chen, Tzu-Ping; Chen, Chien-Hung; Lin, Chih-Hung; Chen, Hwi-Huang |
| 國立交通大學 |
2014-12-08T15:44:27Z |
Improvement on performance and reliability of TaN/HfO2 LTPS-TFTs with fluorine implantation
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Ma, Ming-Wen; Chen, Chih-Yang; Su, Chun-Jung; Wu, Woei-Cherng; Yang, Tsung-Yu; Kao, Kuo-Hsing; Chao, Tien-Sheng; Lei, Tan-Fu |
| 國立交通大學 |
2014-12-08T15:16:43Z |
A highly reliable multi-level and 2-bit/cell operation of wrapped-select-gate (WSG) SONOS memory with optimized ONO thickness
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Wu, Woei-Cherng; Chao, Tien-Sheng; Peng, Wu-Chin; Yang, Wen-Luh; Wang, Jer-Chyi; Chen, Jian-Hao; Ma, Ming-Wen; Lai, Chao-Sung; Yang, Tsung-Yu; Chen, Tzu-Ping; Chen, Chien-Hung; Lin, Chih-Hung; Chen, Hwi-Huang; Ko, Joe |
| 國立交通大學 |
2014-12-08T15:15:05Z |
High-performance HfO2 gate dielectrics fluorinated by postdeposition CF4 plasma treatment
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Wu, Woei Cherng; Lai, Chao Sung; Wang, Jer Chyi; Chen, Jian Hao; Ma, Ming Wen; Chao, Tien Sheng |
| 國立交通大學 |
2014-12-08T15:14:34Z |
Highly reliable multilevel and 2-bit/cell operation of wrapped select gate (WSG) SONOS memory
|
Wu, Woei-Cherng; Chao, Tien-Sheng; Peng, Wu-Chin; Yang, Wen-Luh; Wang, Jer-Chyi; Chen, Jian-Hao; Lai, Chao-Sung; Yang, Tsung-Yu; Lee, Chien-Hsing; Hsieh, Tsung-Min; Liou, Jhyy Cheng |
| 國立交通大學 |
2014-12-08T15:14:34Z |
Impact of high-k offset spacer in 65-nm node SOI devices
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Ma, Ming-Wen; Wu, Chien-Hung; Yang, Tsung-Yu; Kao, Kuo-Hsing; Wu, Woei-Cherng; Wang, Shui-Jinn; Chao, Tien-Sheng; Lei, Tan-Fu |
| 國立交通大學 |
2014-12-08T15:12:56Z |
Performance and interface characterization for contact etch stop layer-strained nMOSFET with HfO2 gate dielectrics under pulsed-IV measurement
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Wu, Woei-Cherng; Chao, Tien-Sheng; Chiu, Te-Hsin; Wang, Jer-Chyi; Lai, Chao-Sung; Ma, Ming-Wen; Lo, Wen-Cheng |
| 國立交通大學 |
2014-12-08T15:12:55Z |
Optimized ONO thickness for multi-level and 2-bit/cell operation for wrapped-select-gate (WSG) SONOS memory
|
Wu, Woei-Cherng; Chao, Tien-Sheng; Peng, Wu-Chin; Yang, Wen-Luh; Chen, Jian-Hao; Ma, Ming Wen; Lai, Chao-Sung; Yang, Tsung-Yu; Lee, Chien-Hsing; Hsieh, Tsung-Min; Liou, Jhyy Cheng; Chen, Tzu Ping; Chen, Chien Hung; Lin, Chih Hung; Chen, Hwi Huang; Ko, Joe |
| 國立交通大學 |
2014-12-08T15:12:52Z |
Current transport mechanism for HfO2 gate dielectrics with fluorine incorporation
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Wu, Woei Cherng; Lai, Chao Sung; Wang, Tzu Ming; Wang, Jer Chyi; Hsu, Chih Wei; Ma, Ming Wen; Chao, Tien Sheng |
| 國立交通大學 |
2014-12-08T15:12:40Z |
Characteristics of PBTI and hot carrier stress for LTPS-TFT with high-kappa gate dielectric
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Ma, Ming-Wen; Chen, Chih-Yang; Su, Chun-Jung; Wu, Woei-Cherng; Wu, Yi-Hong; Kao, Kuo-Hsing; Chao, Tien-Sheng; Lei, Tan-Fu |
| 國立交通大學 |
2014-12-08T15:12:39Z |
Impacts of fluorine ion implantation with low-temperature solid-phase crystallized activation on high-kappa LTPS-TFT
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Ma, Ming-Wen; Chen, Chih-Yang; Su, Chun-Jung; Wu, Woei-Cherng; Wu, Yi-Hong; Yang, Tsung-Yu; Kao, Kuo-Hsing; Chao, Tien-Sheng; Lei, Tan-Fu |
| 國立交通大學 |
2014-12-08T15:11:26Z |
High-performance metal-induced laterally crystallized polycrystalline silicon p-channel thin-film transistor with TaN/HfO2 gate stack structure
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Ma, Ming-Wen; Chao, Tien-Sheng; Su, Chun-Jung; Wu, Woei-Cherng; Kao, Kuo-Hsing; Lei, Tan-Fu |
| 國立交通大學 |
2014-12-08T15:11:13Z |
Carrier transportation mechanism of the TaN/HfO(2)/IL/Si structure with silicon surface fluorine implantation
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Wu, Woei Cherng; Lai, Chao-Sung; Wang, Tzu-Ming; Wang, Jer-Chyi; Hsu, Chih Wei; Ma, Ming Wen; Lo, Wen-Cheng; Chao, Tien Sheng |
| 國立交通大學 |
2014-12-08T15:10:56Z |
X-ray photoelectron spectroscopy energy band alignment of spin-on CoTiO(3) high-k dielectric prepared by sol-gel spin coating method
|
Kao, Kuo-Hsing; Chuang, Shiow-Huey; Wu, Woei-Cherng; Chao, Tien-Sheng; Chen, Jian-Hao; Ma, Ming-Wen; Gao, Reui-Hong; Chiang, Michael Y. |
| 國立交通大學 |
2014-12-08T15:10:43Z |
Impacts of N-2 and NH3 Plasma Surface Treatments on High-Performance LTPS-TFT With High-kappa Gate Dielectric
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Ma, Ming-Wen; Chao, Tien-Sheng; Chiang, Tsung-Yu; Wu, Woei-Cherng; Lei, Tan-Fu |
| 國立交通大學 |
2014-12-08T15:10:35Z |
Positive Bias Temperature Instability (PBTI) Characteristics of Contact-Etch-Stop-Layer-Induced Local-Tensile-Strained HfO(2) nMOSFET
|
Wu, Woei-Cherng; Chao, Tien-Sheng; Chiu, Te-Hsin; Wang, Jer-Chyi; Lai, Chao-Sung; Ma, Ming-Wen; Lo, Wen-Cheng |
| 國立交通大學 |
2014-12-08T15:10:33Z |
Characteristics of HfO(2)/Poly-Si Interfacial Layer on CMOS LTPS-TFTs With HfO(2) Gate Dielectric and O(2) Plasma Surface Treatment
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Ma, Ming-Wen; Chiang, Tsung-Yu; Wu, Woei-Cherng; Chao, Tien-Sheng; Lei, Tan-Fu |
| 國立交通大學 |
2014-12-08T15:09:26Z |
High-Speed Multilevel Wrapped-Select-Gate SONOS Memory Using a Novel Dynamic Threshold Source-Side-Injection (DTSSI) Programming Method
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Wang, Kuan-Ti; Chao, Tien-Sheng; Wu, Woei-Cherng; Chiang, Tsung-Yu; Wu, Yi-Hong; Yang, Wen-Luh; Lee, Chien-Hsing; Hsieh, Tsung-Min; Liou, Jhyy-Cheng; Wang, Shen-De; Chen, Tzu-Ping; Chen, Chien-Hung; Lin, Chih-Hung; Chen, Hwi-Huang |
| 國立交通大學 |
2014-12-08T15:08:28Z |
Physical Mechanism of High-Programming-Efficiency Dynamic-Threshold Source-Side Injection in Wrapped-Select-Gate SONOS for NOR-Type Flash Memory
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Wang, Kuan-Ti; Chao, Tien-Sheng; Chiang, Tsung-Yu; Wu, Woei-Cherng; Kuo, Po-Yi; Wu, Yi-Hong; Lu, Yu-Lun; Liao, Chia-Chun; Yang, Wen-Luh; Lee, Chien-Hsing; Hsieh, Tsung-Min; Liou, Jhyy-Cheng; Wang, Shen-De; Chen, Tzu-Ping; Chen, Chien-Hung; Lin, Chih-Hung; Chen, Hwi-Huang |
| 國立交通大學 |
2014-12-08T15:07:34Z |
Performance enhancement for strained HfO(2) nMOSFET with contact etch stop layer (CESL) under pulsed-IV measurement
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Wu, Woei-Cherng; Chao, Tien-Sheng; Chiu, Te-Hsin; Wang, Jer-Chyi; Lai, Chao-Sung; Ma, Ming-Wen; Lo, Wen-Cheng; Ho, Yi-Hsun |
| 國立交通大學 |
2014-12-08T15:02:15Z |
The polarity dependence of ONO thickness for wrapped-select-gate (WSG) SONOS memory
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Wang, Kuan-Ti; Chao, Tien-Sheng; Wu, Woei-Cherng; Lai, Chao-Sung |
| 國立成功大學 |
2007-03 |
Impact of high-k offset spacer in 65-nm node SOI devices
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Ma, Ming-Wen; Wu, Chien-Hung; Yang, Tsung-Yu; Kao, Kuo-Hsing; Wu, Woei-Cherng; Wang, Shui-Jinn; Chao, Tien-Sheng; Lei, Tan-Fu |
Showing items 1-24 of 24 (1 Page(s) Totally)
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