臺灣學術機構典藏系統 (Taiwan Academic Institutional Repository, TAIR)

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Showing items 36-45 of 86 (9 Page(s) Totally)
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Institution	Date	Title	Author
南台科技大學	2002-12	Heteroepitaxial silicon-carbide nitride films with different carbon sources on silicon substrates prepared by rapid-thermal chemical-vapor deposition	S. F. Ting; Y. K. Fang; W. T. Hsieh; Y. S. Tsair; C. N. Chang; C. S. Lin; M. C. Hsieh; H. C. Chiang; J. J. Ho;謝文哲
國立臺灣海洋大學	2002-12	Optimizing Indium Tin Oxide Thin Films with Bipolar dc-pulsed Magnetron Sputtering for electrochromic Device Applications	W. J. Lee; Y. K. Fang; J.-J. Ho; C.-Y. Chen; S.-F. Chen; R.-Y. Tsai; D. Huang; F. C. Ho
南台科技大學	2002-10	Improving High Temperature Characteristic of SiGeC/Si Heterojunction Diode with Propane Carbon Source	W. T. Hsieh; Y. K. Fang; S. F. Ting; Y. S. Tsair; W. J. Lee; H. P. Wang;謝文哲
國立臺灣海洋大學	2002-08-07	A High Breakdown-Voltage SiCNSi Heterojunction Diode for High-Temperature Applications	S.F. Ting; Y.K. Fang; W.T. Hsieh; Y.S. Tsair; C.N. Chang; C.S. Lin; M.C. Hsieh; H.C. Chiang; J.J. Ho
南台科技大學	2002-05	Downscaling limit of equivalent oxide thickness in formation ofultrathin gate dielectric by thermal-enhanced remote plasma nitridation	C. H. Chen; Y. K. Fang; S. F. Ting; W. T. Hsieh; C. W. Yang; T. H. Hsu; M. C. Yu; T. L. Lee; S. C. Chen; C. H. Yu; M. S. Liang;陳順智;謝文哲
南台科技大學	2002-03	A High Breakdown-Voltage SiCN/Si Heterojunction Diode for High-Temperature Applications	S. F. Ting; Y. K. Fang; W. T. Hsieh; Y. S. Tsair; C. N. Chang; C. S. Lin; M. C. Hsieh; H. C. Chiang; J. J. Ho;謝文哲
南台科技大學	2002	Highly sensitive porous-SiC thin-film photodetectors for high-temperature applications	吳坤憲; Kuen-Hsien Wu; Yao-Chin Wang; Y. K. Fang
南台科技大學	2001-10	Originals and effects of radical-induced re-oxidation in ultra-thin remote plasma nitrided oxides	C. H. Chen; Y. K. Fang; W. T. Hsieh; S. F. Ting; M. C. Yu; M. F. Wang; C. L. Chen; L. G. Yao; S. C. Chen; C. H. Yu; M. S. Liang;陳順智;謝文哲
南台科技大學	2001-09	The Cubic Single-Crystalline Si1-x-yCxNy Films With Mirror Face Prepared By RTCVD	S. F. Ting; Y. K. Fang; W. T. Hsieh; Y. S. Tsair; C. N. Chang; C. S. Lin; M. C. Hsieh; H. C. Chiang; J. J. Ho;謝文哲
南台科技大學	2001-07	The Effect of Remote Plasma Nitridation on the Integrity of the Ultrathin Gate Dielectric Films in 0. 13mm CMOS Technology and Beyond	S. F. Ting; Y. K. Fang; C. H. Chen; C. W. Yang; W. T. Hsieh; J. J. Ho; M. C. Yu; S. M. Jang; C. H. Yu; M. S. Liang; S. Chen; R. Shih;謝文哲

Showing items 36-45 of 86 (9 Page(s) Totally)
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