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Institution Date Title Author
國立中山大學 2003 Direct Patterning of Low-k Hydrogen Silsesquioxane Using X-ray Exposure Technology T.C. Chang;T.M. Tsai;P.T. Liu;Y.S. Mor;C.W. Chen;J.T. Sheu;T.Y. Tseng
國立中山大學 2003 Moisture-induced material instability of porous organosilicate glass T.C. Chang;C.W. Chen;P.T. Liu;Y.S. Mor;H.M. Tsai;T.M. Tsai;S.T. Yan;C.H. Tu;T.Y. Tsing;S.M. Sze
國立中山大學 2003 Direct Patterning of low-k hydrogen silsesquioxane using X-ray exposure technology T.C. Chang;H.M. Tsai;P.T. Liu;Y.S. Mor;C.W. Chen;T.Y. Tsing

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