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Institution Date Title Author
國立成功大學 2012-10 Comparison of Equivalent Oxide Thickness and Electrical Properties of Atomic Layer Deposited Hafnium Zirconate Dielectrics with Thermal or Decoupled Plasma Nitridation Process Chiang, Chen-Kuo; Wu, Chien-Hung; Liu, Chin-Chien; Lin, Jin-Fu; Yang, Chien-Lun; Wu, Jiun-Yuan; Wang, Shui-Jinn
國立成功大學 2012-01 Characterization of Hf1-xZrxO2 Gate Dielectrics with 0 <= x <= 1 Prepared by Atomic Layer Deposition for Metal Oxide Semiconductor Field Effect Transistor Applications Chiang, Chen-Kuo; Wu, Chien-Hung; Liu, Chin-Chien; Lin, Jin-Fu; Yang, Chien-Lun; Wu, Jiun-Yuan; Wang, Shui-Jinn

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