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Showing items 86-95 of 119  (12 Page(s) Totally)
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Institution Date Title Author
國立交通大學 2014-12-08T15:03:11Z CHARACTERIZATION OF THE CHEMICAL-MECHANICAL POLISHING PROCESS-BASED ON NANOINDENTATION MEASUREMENT OF DIELECTRIC FILMS LIU, CW; DAI, BT; YEH, CF
國立交通大學 2014-12-08T15:03:10Z CONTROLLING FLUORINE CONCENTRATION AND THERMAL ANNEALING EFFECT ON LIQUID-PHASE DEPOSITED SIO2-XFX FILMS YEH, CF; CHEN, CL
國立交通大學 2014-12-08T15:03:07Z THINNER LIQUID-PHASE DEPOSITED OXIDE FOR POLYSILICON THIN-FILM TRANSISTORS YEH, CF; LIN, SS; FAN, CL
國立交通大學 2014-12-08T15:03:02Z Chemical mechanical polishing of PSG and BPSG dielectric films: The effect of phosphorus and boron concentration Liu, CW; Dai, BT; Yeh, CF
國立交通大學 2014-12-08T15:02:52Z Modeling of the wear mechanism during chemical-mechanical polishing Liu, CW; Dai, BT; Tseng, WT; Yeh, CF
國立交通大學 2014-12-08T15:02:50Z Post cleaning of chemical mechanical polishing process Liu, CW; Dai, BT; Yeh, CF
國立交通大學 2014-12-08T15:02:29Z Stress in liquid-phase deposited oxide films Yeh, CF; Lin, SS; Lur, WT
國立交通大學 2014-12-08T15:02:11Z Effects of mechanical characteristics on the chemical-mechanical polishing of dielectric thin films Tseng, WT; Liu, CW; Dai, BT; Yeh, CF
國立交通大學 2014-12-08T15:01:54Z Physical characteristics of N-2 annealing on room-temperature-deposited ion plating oxide Yeh, CF; Chen, TJ; Kao, JS
國立交通大學 2014-12-08T15:01:26Z Effects of process temperature on polysilicon thin film transistors with liquid-phase deposited oxides as gate insulators Yeh, CF; Chen, TJ; Jeng, JN

Showing items 86-95 of 119  (12 Page(s) Totally)
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