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教育部委託研究計畫 計畫執行:國立臺灣大學圖書館
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"yeh cf"的相關文件
顯示項目 76-85 / 119 (共12頁)
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| 國立交通大學 |
2014-12-08T15:04:13Z |
IMPROVED IV-CHARACTERISTICS OF POLYSILICON THIN-FILM TRANSISTORS WITH NOVEL DUAL-BUFFER DRAIN STRUCTURE
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YEH, CF; CHERN, CH |
| 國立交通大學 |
2014-12-08T15:04:07Z |
PERFORMANCE AND OFF-STATE CURRENT MECHANISMS OF LOW-TEMPERATURE PROCESSED POLYSILICON THIN-FILM TRANSISTORS WITH LIQUID-PHASE DEPOSITED SIO2 GATE INSULATOR
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YEH, CF; LIN, SS; YANG, TZ; CHEN, CL; YANG, YC |
| 國立交通大學 |
2014-12-08T15:04:04Z |
LOW-TEMPERATURE-PROCESSED POLY-SI THIN-FILM TRANSISTORS USING SOLID-PHASE-CRYSTALLIZED AND LIQUID-PHASE-DEPOSITED GATE OXIDE
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YEH, CF; CHEN, CL; YANG, YC; LIN, SS; YANG, TZ; HONG, TY |
| 國立交通大學 |
2014-12-08T15:03:56Z |
ROOM-TEMPERATURE SELECTIVE GROWTH OF DIELECTRIC FILMS BY LIQUID-PHASE DEPOSITION
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YEH, CF; CHEN, CL |
| 國立交通大學 |
2014-12-08T15:03:43Z |
THE PHYSICOCHEMICAL PROPERTIES AND GROWTH-MECHANISM OF OXIDE (SIO2-XFX) BY LIQUID-PHASE DEPOSITION WITH H2O ADDITION ONLY
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YEH, CF; CHEN, CL; LIN, GH |
| 國立交通大學 |
2014-12-08T15:03:33Z |
CHARACTERISTICS OF SELF-INDUCED LIGHTLY-DOPED-DRAIN POLYCRYSTALLINE SILICON THIN-FILM TRANSISTORS WITH LIQUID-PHASE DEPOSITION SIO2 AS GATE-INSULATOR AND PASSIVATION-LAYER
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YEH, CF; YANG, TZ; CHEN, TJ |
| 國立交通大學 |
2014-12-08T15:03:31Z |
BOND-STRUCTURE CHANGES OF LIQUID-PHASE DEPOSITED OXIDE (SIO2-XFX) ON N2 ANNEALING
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YEH, CF; CHEN, CL; LUR, W; YEN, PW |
| 國立交通大學 |
2014-12-08T15:03:22Z |
FABRICATION OF MOSFETS USING LOW-TEMPERATURE LIQUID-PHASE DEPOSITED OXIDE
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YEH, CF; LIN, SS; HONG, TY |
| 國立交通大學 |
2014-12-08T15:03:17Z |
LOW-TEMPERATURE PROCESSED MOSFETS WITH LIQUID-PHASE DEPOSITED SIO2-XFX AS GATE INSULATOR
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YEH, CF; LIN, SS; HONG, TY |
| 國立交通大學 |
2014-12-08T15:03:16Z |
EFFECTS OF PLASMA TREATMENT ON THE PROPERTIES OF ROOM-TEMPERATURE LIQUID-PHASE DEPOSITED (LPD) OXIDE-FILMS
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YEH, CF; LIN, SS |
顯示項目 76-85 / 119 (共12頁)
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