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教育部委託研究計畫 計畫執行:國立臺灣大學圖書館
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"yeh cf"的相關文件
顯示項目 81-90 / 119 (共12頁)
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| 國立交通大學 |
2014-12-08T15:03:33Z |
CHARACTERISTICS OF SELF-INDUCED LIGHTLY-DOPED-DRAIN POLYCRYSTALLINE SILICON THIN-FILM TRANSISTORS WITH LIQUID-PHASE DEPOSITION SIO2 AS GATE-INSULATOR AND PASSIVATION-LAYER
|
YEH, CF; YANG, TZ; CHEN, TJ |
| 國立交通大學 |
2014-12-08T15:03:31Z |
BOND-STRUCTURE CHANGES OF LIQUID-PHASE DEPOSITED OXIDE (SIO2-XFX) ON N2 ANNEALING
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YEH, CF; CHEN, CL; LUR, W; YEN, PW |
| 國立交通大學 |
2014-12-08T15:03:22Z |
FABRICATION OF MOSFETS USING LOW-TEMPERATURE LIQUID-PHASE DEPOSITED OXIDE
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YEH, CF; LIN, SS; HONG, TY |
| 國立交通大學 |
2014-12-08T15:03:17Z |
LOW-TEMPERATURE PROCESSED MOSFETS WITH LIQUID-PHASE DEPOSITED SIO2-XFX AS GATE INSULATOR
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YEH, CF; LIN, SS; HONG, TY |
| 國立交通大學 |
2014-12-08T15:03:16Z |
EFFECTS OF PLASMA TREATMENT ON THE PROPERTIES OF ROOM-TEMPERATURE LIQUID-PHASE DEPOSITED (LPD) OXIDE-FILMS
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YEH, CF; LIN, SS |
| 國立交通大學 |
2014-12-08T15:03:11Z |
CHARACTERIZATION OF THE CHEMICAL-MECHANICAL POLISHING PROCESS-BASED ON NANOINDENTATION MEASUREMENT OF DIELECTRIC FILMS
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LIU, CW; DAI, BT; YEH, CF |
| 國立交通大學 |
2014-12-08T15:03:10Z |
CONTROLLING FLUORINE CONCENTRATION AND THERMAL ANNEALING EFFECT ON LIQUID-PHASE DEPOSITED SIO2-XFX FILMS
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YEH, CF; CHEN, CL |
| 國立交通大學 |
2014-12-08T15:03:07Z |
THINNER LIQUID-PHASE DEPOSITED OXIDE FOR POLYSILICON THIN-FILM TRANSISTORS
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YEH, CF; LIN, SS; FAN, CL |
| 國立交通大學 |
2014-12-08T15:03:02Z |
Chemical mechanical polishing of PSG and BPSG dielectric films: The effect of phosphorus and boron concentration
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Liu, CW; Dai, BT; Yeh, CF |
| 國立交通大學 |
2014-12-08T15:02:52Z |
Modeling of the wear mechanism during chemical-mechanical polishing
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Liu, CW; Dai, BT; Tseng, WT; Yeh, CF |
顯示項目 81-90 / 119 (共12頁)
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