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"yeh cf"的相關文件
顯示項目 61-85 / 119 (共5頁)
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| 國立交通大學 |
2014-12-08T15:27:14Z |
Newly developed low-K and low-stress fluorinated silicon oxide utilizing temperature-difference liquid-phase deposition technology
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Yeh, CF; Lee, YC; Lee, SC |
| 國立交通大學 |
2014-12-08T15:27:13Z |
Highly reliable liquid-phase deposited SiO2 with nitrous oxide plasma post-treatment for low temperature processed poly-Si TFT's
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Yeh, CF; Chen, DC; Lu, CY; Liu, C; Lee, ST; Liu, CH; Chen, TJ |
| 國立交通大學 |
2014-12-08T15:27:06Z |
O-2-plasma degradation of low-k organic dielectric and its effective solution for damascene trenches
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Yeh, CF; Lee, YC; Su, YC; Wu, KH; Lin, CH |
| 國立交通大學 |
2014-12-08T15:26:42Z |
Smart dielectrics of fluorinated silicon glass prepared by liquid phase deposition method
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Yeh, CF; Chen, TF; Lee, YC; Liu, CH; Lin, SS |
| 國立交通大學 |
2014-12-08T15:26:34Z |
Impact of airborne molecular contamination to nano-device performance
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Yeh, CF; Hsiao, CW; Lin, SJ; Xie, ZM; Kusumi, T; Aomi, H; Kaneko, H; Da, BT; Tsai, MS |
| 國立交通大學 |
2014-12-08T15:25:48Z |
Fabrication of thin-film transistors on plastic substrates by spin etching and device transfer process
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Wang, SC; Hsu, CT; Yeh, CF; Lou, JC |
| 國立交通大學 |
2014-12-08T15:25:27Z |
A new observation of the germanium outdiffusion effect on the hot carrier and NBTI reliabilities in sub-100nm technology strained-Si/SiGe CMOS devices
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Chung, SS; Liu, YR; Yeh, CF; Wu, SR; Lai, CS; Chang, TY; Ho, JH; Liu, CY; Huang, CT; Tsai, CT; Shiau, WT; Sun, SW |
| 國立交通大學 |
2014-12-08T15:18:03Z |
Pentacene-based thin film transistors used to drive a twist-nematic liquid crystal display
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Wang, YW; Cheng, HL; Wang, YK; Hu, TH; Ho, JC; Lee, CC; Lei, TF; Yeh, CF |
| 國立交通大學 |
2014-12-08T15:05:01Z |
INVESTIGATION OF THERMAL COEFFICIENT FOR POLYCRYSTALLINE SILICON THERMAL SENSOR DIODE
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YEH, CF; LIN, SS; YANG, GP |
| 國立交通大學 |
2014-12-08T15:04:55Z |
THE NOVEL PREPARATION OF P-N-JUNCTION MESA DIODES BY SILICON-WAFER DIRECT BONDING (SDB)
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YEH, CF; SHYANG, HL |
| 國立交通大學 |
2014-12-08T15:04:47Z |
THE EFFECT OF TEMPERATURE ON I-V-CHARACTERISTICS OF A-SI-H PHOTODIODE
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CHANG, KL; YEH, CF |
| 國立交通大學 |
2014-12-08T15:04:31Z |
THE CHARACTERIZATION OF AL2O3 PREPARED BY ANODIC-OXIDATION
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YEH, CF; CHENG, JY; LU, JH |
| 國立交通大學 |
2014-12-08T15:04:25Z |
NOVEL TECHNIQUE FOR SIO2 FORMED BY LIQUID-PHASE DEPOSITION FOR LOW-TEMPERATURE PROCESSED POLYSILICON TFT
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YEH, CF; LIN, SS; CHEN, CL; YANG, YC |
| 國立交通大學 |
2014-12-08T15:04:20Z |
EXPERIMENTAL COMPARISON OF OFF-STATE CURRENT BETWEEN HIGH-TEMPERATURE-PROCESSED AND LOW-TEMPERATURE-PROCESSED UNDOPED CHANNEL POLYSILICON THIN-FILM TRANSISTORS
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YEH, CF; YANG, TZ; CHEN, CL; CHEN, TJ; YANG, YC |
| 國立交通大學 |
2014-12-08T15:04:20Z |
INVESTIGATION OF SI-SIO2 INTERFACE PROPERTIES FOR BONDED SILICON-ON-INSULATOR
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YEH, CF; KAO, HW; CHANG, BS; CHANG, KL |
| 國立交通大學 |
2014-12-08T15:04:13Z |
IMPROVED IV-CHARACTERISTICS OF POLYSILICON THIN-FILM TRANSISTORS WITH NOVEL DUAL-BUFFER DRAIN STRUCTURE
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YEH, CF; CHERN, CH |
| 國立交通大學 |
2014-12-08T15:04:07Z |
PERFORMANCE AND OFF-STATE CURRENT MECHANISMS OF LOW-TEMPERATURE PROCESSED POLYSILICON THIN-FILM TRANSISTORS WITH LIQUID-PHASE DEPOSITED SIO2 GATE INSULATOR
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YEH, CF; LIN, SS; YANG, TZ; CHEN, CL; YANG, YC |
| 國立交通大學 |
2014-12-08T15:04:04Z |
LOW-TEMPERATURE-PROCESSED POLY-SI THIN-FILM TRANSISTORS USING SOLID-PHASE-CRYSTALLIZED AND LIQUID-PHASE-DEPOSITED GATE OXIDE
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YEH, CF; CHEN, CL; YANG, YC; LIN, SS; YANG, TZ; HONG, TY |
| 國立交通大學 |
2014-12-08T15:03:56Z |
ROOM-TEMPERATURE SELECTIVE GROWTH OF DIELECTRIC FILMS BY LIQUID-PHASE DEPOSITION
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YEH, CF; CHEN, CL |
| 國立交通大學 |
2014-12-08T15:03:43Z |
THE PHYSICOCHEMICAL PROPERTIES AND GROWTH-MECHANISM OF OXIDE (SIO2-XFX) BY LIQUID-PHASE DEPOSITION WITH H2O ADDITION ONLY
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YEH, CF; CHEN, CL; LIN, GH |
| 國立交通大學 |
2014-12-08T15:03:33Z |
CHARACTERISTICS OF SELF-INDUCED LIGHTLY-DOPED-DRAIN POLYCRYSTALLINE SILICON THIN-FILM TRANSISTORS WITH LIQUID-PHASE DEPOSITION SIO2 AS GATE-INSULATOR AND PASSIVATION-LAYER
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YEH, CF; YANG, TZ; CHEN, TJ |
| 國立交通大學 |
2014-12-08T15:03:31Z |
BOND-STRUCTURE CHANGES OF LIQUID-PHASE DEPOSITED OXIDE (SIO2-XFX) ON N2 ANNEALING
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YEH, CF; CHEN, CL; LUR, W; YEN, PW |
| 國立交通大學 |
2014-12-08T15:03:22Z |
FABRICATION OF MOSFETS USING LOW-TEMPERATURE LIQUID-PHASE DEPOSITED OXIDE
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YEH, CF; LIN, SS; HONG, TY |
| 國立交通大學 |
2014-12-08T15:03:17Z |
LOW-TEMPERATURE PROCESSED MOSFETS WITH LIQUID-PHASE DEPOSITED SIO2-XFX AS GATE INSULATOR
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YEH, CF; LIN, SS; HONG, TY |
| 國立交通大學 |
2014-12-08T15:03:16Z |
EFFECTS OF PLASMA TREATMENT ON THE PROPERTIES OF ROOM-TEMPERATURE LIQUID-PHASE DEPOSITED (LPD) OXIDE-FILMS
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YEH, CF; LIN, SS |
顯示項目 61-85 / 119 (共5頁)
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