|
English
|
正體中文
|
简体中文
|
0
|
|
???header.visitor??? :
52548054
???header.onlineuser??? :
887
???header.sponsordeclaration???
|
|
|
|
???tair.name??? >
???browser.page.title.author???
|
"yeh cf"???jsp.browse.items-by-author.description???
Showing items 86-95 of 119 (12 Page(s) Totally)
<< < 3 4 5 6 7 8 9 10 11 12 > >>
View [10|25|50] records per page
| 國立交通大學 |
2014-12-08T15:03:11Z |
CHARACTERIZATION OF THE CHEMICAL-MECHANICAL POLISHING PROCESS-BASED ON NANOINDENTATION MEASUREMENT OF DIELECTRIC FILMS
|
LIU, CW; DAI, BT; YEH, CF |
| 國立交通大學 |
2014-12-08T15:03:10Z |
CONTROLLING FLUORINE CONCENTRATION AND THERMAL ANNEALING EFFECT ON LIQUID-PHASE DEPOSITED SIO2-XFX FILMS
|
YEH, CF; CHEN, CL |
| 國立交通大學 |
2014-12-08T15:03:07Z |
THINNER LIQUID-PHASE DEPOSITED OXIDE FOR POLYSILICON THIN-FILM TRANSISTORS
|
YEH, CF; LIN, SS; FAN, CL |
| 國立交通大學 |
2014-12-08T15:03:02Z |
Chemical mechanical polishing of PSG and BPSG dielectric films: The effect of phosphorus and boron concentration
|
Liu, CW; Dai, BT; Yeh, CF |
| 國立交通大學 |
2014-12-08T15:02:52Z |
Modeling of the wear mechanism during chemical-mechanical polishing
|
Liu, CW; Dai, BT; Tseng, WT; Yeh, CF |
| 國立交通大學 |
2014-12-08T15:02:50Z |
Post cleaning of chemical mechanical polishing process
|
Liu, CW; Dai, BT; Yeh, CF |
| 國立交通大學 |
2014-12-08T15:02:29Z |
Stress in liquid-phase deposited oxide films
|
Yeh, CF; Lin, SS; Lur, WT |
| 國立交通大學 |
2014-12-08T15:02:11Z |
Effects of mechanical characteristics on the chemical-mechanical polishing of dielectric thin films
|
Tseng, WT; Liu, CW; Dai, BT; Yeh, CF |
| 國立交通大學 |
2014-12-08T15:01:54Z |
Physical characteristics of N-2 annealing on room-temperature-deposited ion plating oxide
|
Yeh, CF; Chen, TJ; Kao, JS |
| 國立交通大學 |
2014-12-08T15:01:26Z |
Effects of process temperature on polysilicon thin film transistors with liquid-phase deposited oxides as gate insulators
|
Yeh, CF; Chen, TJ; Jeng, JN |
Showing items 86-95 of 119 (12 Page(s) Totally)
<< < 3 4 5 6 7 8 9 10 11 12 > >>
View [10|25|50] records per page
|
