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Showing items 1-44 of 44 (1 Page(s) Totally) 1 View [10|25|50] records per page
臺大學術典藏 |
2020-01-17T03:09:31Z |
Expression of a bi-functional and thermostable amylopullulanase in transgenic rice seeds leads to autohydrolysis and altered composition of starch
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Chiang C.-M.; Yeh F.-S.; Huang L.-F.; Tseng T.-H.; Chung M.-C.; Wang C.-S.; Lur H.-S.; Shaw J.-F.; Yu S.-M.; HUU-SHENG LUR; HUU-SHENG LUR;Yu S.-M.;Shaw J.-F.;Lur H.-S.;Wang C.-S.;Chung M.-C.;Tseng T.-H.;Huang L.-F.;Yeh F.-S.;Chiang C.-M. |
國立交通大學 |
2019-04-02T06:00:59Z |
Low-V-t TaN/HfLaO n-MOSFETs Using Low-Temperature Formed Source-Drain Junctions
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Lin, S. H.; Liu, S. L.; Yeh, F. S.; Chin, Albert |
國立交通大學 |
2019-04-02T06:00:30Z |
A Study on Frequency-Dependent Voltage Nonlinearity of SrTiO3 rf Capacitor
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Cheng, C. H.; Huang, C. C.; Hsu, H. H.; Chen, P. C.; Chiang, K. C.; Chin, Albert; Yeh, F. S. |
國立交通大學 |
2019-04-02T06:00:13Z |
High-Density and Low-Leakage-Current MIM Capacitor Using Stacked TiO2/ZrO2 Insulators
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Lin, S. H.; Chiang, K. C.; Chin, Albert; Yeh, F. S. |
國立交通大學 |
2019-04-02T06:00:13Z |
Flat band voltage control on low V-t metal-gate/high-kappa CMOSFETs with small EOT
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Chin, Albert; Chang, M. F.; Lin, S. H.; Chen, W. B.; Lee, P. T.; Yeh, F. S.; Liao, C. C.; Li, M. -F.; Su, N. C.; Wang, S. J. |
國立交通大學 |
2019-04-02T05:59:55Z |
Stacked GeO/SrTiOx Resistive Memory with Ultralow Resistance Currents
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Cheng, C. H.; Chin, Albert; Yeh, F. S. |
國立交通大學 |
2019-04-02T05:59:52Z |
Ultralow Switching Energy Ni/GeOx/HfON/TaN RRAM
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Cheng, C. H.; Chin, Albert; Yeh, F. S. |
國立交通大學 |
2019-04-02T05:58:47Z |
Improved Stress Reliability of Analog Metal-Insulator-Metal Capacitors Using TiO2/ZrO2 Dielectrics
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Lin, S. H.; Chiang, K. C.; Yeh, F. S.; Chin, Albert |
國立交通大學 |
2019-04-02T05:58:25Z |
Higher-kappa titanium dioxide incorporating LaAlO3 as dielectrics for MIM capacitors
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Cheng, C. H.; Hsu, H. H.; Chen, P. C.; Liou, B. H.; Chin, Albert; Yeh, F. S. |
國立交通大學 |
2019-04-02T05:57:57Z |
Long-Endurance Nanocrystal TiO2 Resistive Memory Using a TaON Buffer Layer
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Cheng, C. H.; Chen, P. C.; Wu, Y. H.; Yeh, F. S.; Chin, Albert |
國立交通大學 |
2019-04-02T05:57:53Z |
Lanthanide-Oxides Mixed TiO2 Dielectrics for High-kappa MIM Capacitors
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Cheng, C. H.; Deng, C. K.; Hsu, H. H.; Chen, P. C.; Liou, B. H.; Chin, Albert; Yeh, F. S. |
臺大學術典藏 |
2018-09-10T08:14:17Z |
Metal-gate/high-κ CMOS scaling from Si to Ge at small EOT
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Chen, W.B.; Shie, B.S.; Hsu, K.C.; Chen, P.C.; Cheng, C.H.; Chi, C.C.; Wu, Y.H.; Chaing-Liaoc, K.S.; Wang, S.J.; Kuan, C.H.; Yeh, F.S.; Chin, A.; CHIEH-HSIUNG KUANet al. |
國立交通大學 |
2018-08-21T05:57:01Z |
The Mechanisms of on/off currents for the Dual-Gate a-Si : H thin film transistors with various length sizes of indium-tin-oxide top gate
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Liang, Chung-Yu; Chang, T. C.; Po-Tsun, Liu; Gan, Feng-Yuan; Yeh, F. S. |
國立交通大學 |
2017-04-21T06:49:54Z |
Very High Performance Non-Volatile Memory on Flexible Plastic Substrate
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Cheng, C. H.; Chou, K. Y.; Chin, Albert; Yeh, F. S. |
國立交通大學 |
2017-04-21T06:49:53Z |
High Performance Ultra-Low Energy RRAM with Good Retention and Endurance
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Cheng, C. H.; Tsai, C. Y.; Chin, Albert; Yeh, F. S. |
國立交通大學 |
2017-04-21T06:49:53Z |
Novel Ultra-Low Power RRAM with Good Endurance and Retention
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Cheng, C. H.; Chin, Albert; Yeh, F. S. |
國立交通大學 |
2017-04-21T06:48:52Z |
Good 150 degrees C Retention and Fast Erase Characteristics in Charge-Trap-Engineered Memory having a Scaled Si3N4 Layer
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Lin, S. H.; Chin, Albert; Yeh, F. S.; McAlister, S. P. |
國立交通大學 |
2014-12-08T15:48:24Z |
Ultralow-Power Ni/GeO/STO/TaN Resistive Switching Memory
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Cheng, C. H.; Chin, Albert; Yeh, F. S. |
國立交通大學 |
2014-12-08T15:40:20Z |
Flat band voltage control on low V(t) metal-gate/high-kappa CMOSFETs with small EOT
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Chin, Albert; Chang, M. F.; Lin, S. H.; Chen, W. B.; Lee, P. T.; Yeh, F. S.; Liao, C. C.; Li, M. -F.; Su, N. C.; Wang, S. J. |
國立交通大學 |
2014-12-08T15:39:20Z |
Highly-Scaled 3.6-nm ENT Trapping Layer MONOS Device with Good Retention and Endurance
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Tsai, C. Y.; Lee, T. H.; Chin, Albert; Wang, Hong; Cheng, C. H.; Yeh, F. S. |
國立交通大學 |
2014-12-08T15:37:36Z |
Stacked GeO/SrTiO(x) Resistive Memory with Ultralow Resistance Currents
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Cheng, C. H.; Chin, Albert; Yeh, F. S. |
國立交通大學 |
2014-12-08T15:36:27Z |
Improved Device Characteristics in Charge-Trapping-Engineered Flash Memory Using High-kappa Dielectrics
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Chin, Albert; Lin, S. H.; Tsai, C. Y.; Yeh, F. S. |
國立交通大學 |
2014-12-08T15:29:30Z |
Bipolar switching characteristics of low-power Geo resistive memory
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Cheng, C. H.; Chen, P. C.; Liu, S. L.; Wu, T. L.; Hsu, H. H.; Chin, Albert; Yeh, F. S. |
國立交通大學 |
2014-12-08T15:23:32Z |
Highly uniform low-power resistive memory using nitrogen-doped tantalum pentoxide
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Cheng, C. H.; Chen, P. C.; Wu, Y. H.; Wu, M. J.; Yeh, F. S.; Chin, Albert |
國立交通大學 |
2014-12-08T15:23:05Z |
Size-Dependent Trapping Effect in Nano-Dot Non-Volatile Memory
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Tsai, C. Y.; Cheng, C. H.; Chang, T. Y.; Chou, K. Y.; Chin, Albert; Yeh, F. S. |
國立交通大學 |
2014-12-08T15:21:00Z |
Long-Endurance Nanocrystal TiO(2) Resistive Memory Using a TaON Buffer Layer
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Cheng, C. H.; Chen, P. C.; Wu, Y. H.; Yeh, F. S.; Chin, Albert |
國立交通大學 |
2014-12-08T15:15:18Z |
A novel self-aligned etch-stopper structure with lower photo leakage for AMLCD and sensor applications
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Liang, Chung-Yu; Gan, Feng-Yuan; Liu, Po-Tsun; Yeh, F. S.; Chen, Stephen Hsin-Li; Chang, Ting-Chang |
國立交通大學 |
2014-12-08T15:13:40Z |
n(+)-doped-layer-free microcrystalline silicon thin film transistors fabricated with the CuMg as source/drain metal
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Wang, M. C.; Chang, T. C.; Liu, Po-Tsun; Xiao, R. W.; Lin, L. F.; Li, Y. Y.; Yeh, F. S.; Chen, J. R. |
國立交通大學 |
2014-12-08T15:12:50Z |
High-Performance MIM Capacitors Using a High-kappa TiZrO Dielectric
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Cheng, C. H.; Pan, H. C.; Lin, S. H.; Hsu, H. H.; Hsiao, C. N.; Chou, C. P.; Yeh, F. S.; Chin, Albert |
國立交通大學 |
2014-12-08T15:12:03Z |
Ultralow Switching Energy Ni/GeO(x)/HfON/TaN RRAM
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Cheng, C. H.; Chin, Albert; Yeh, F. S. |
國立交通大學 |
2014-12-08T15:11:24Z |
Comparison of MONOS memory device integrity when using Hf(1-x-y)N(x)O(y) trapping layers with different N compositions
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Yang, H. J.; Cheng, C. F.; Chen, W. B.; Lin, S. H.; Yeh, F. S.; McAlister, Sean P.; Chin, Albert |
國立交通大學 |
2014-12-08T15:11:13Z |
Improving the retention and endurance characteristics of charge-trapping memory by using double quantum barriers
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Lin, S. H.; Yang, H. J.; Chen, W. B.; Yeh, F. S.; McAlister, Sean P.; Chin, Albert |
國立交通大學 |
2014-12-08T15:11:06Z |
High density and low leakage current in TiO(2) MIM capacitors processed at 300 degrees C
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Cheng, C. H.; Lin, S. H.; Jhou, K. Y.; Chen, W. J.; Chou, C. P.; Yeh, F. S.; Hu, J.; Hwang, M.; Arikado, T.; McAlister, S. P. |
國立交通大學 |
2014-12-08T15:10:16Z |
Low-V(t) TaN/HfLaO n-MOSFETs Using Low-Temperature Formed Source-Drain Junctions
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Lin, S. H.; Liu, S. L.; Yeh, F. S.; Chin, Albert |
國立交通大學 |
2014-12-08T15:09:23Z |
Low-Threshold-Voltage TaN/Ir/LaTiO p-MOSFETs Incorporating Low-Temperature-Formed Shallow Junctions
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Lin, S. H.; Cheng, C. H.; Chen, W. B.; Yeh, F. S.; Chin, Albert |
國立交通大學 |
2014-12-08T15:09:13Z |
High-Density and Low-Leakage-Current MIM Capacitor Using Stacked TiO(2)/ZrO(2) Insulators
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Lin, S. H.; Chiang, K. C.; Chin, Albert; Yeh, F. S. |
國立交通大學 |
2014-12-08T15:08:49Z |
Low-Threshold-Voltage TaN/LaTiO n-MOSFETs With Small EOT
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Lin, S. H.; Cheng, C. H.; Chen, W. B.; Yeh, F. S.; Chin, Albert |
國立交通大學 |
2014-12-08T15:08:08Z |
Improved Stress Reliability of Analog Metal-Insulator-Metal Capacitors Using TiO(2)/ZrO(2) Dielectrics
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Lin, S. H.; Chiang, K. C.; Yeh, F. S.; Chin, Albert |
國立交通大學 |
2014-12-08T15:07:53Z |
High-kappa TiCeO MIM Capacitors with a Dual-Plasma Interface Treatment
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Cheng, C. H.; Hsu, H. H.; Hsieh, I. J.; Deng, C. K.; Chin, Albert; Yeh, F. S. |
國立交通大學 |
2014-12-08T15:07:53Z |
A Study on Frequency-Dependent Voltage Nonlinearity of SrTiO(3) rf Capacitor
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Cheng, C. H.; Huang, C. C.; Hsu, H. H.; Chen, P. C.; Chiang, K. C.; Chin, Albert; Yeh, F. S. |
國立交通大學 |
2014-12-08T15:07:53Z |
Characteristics of Cerium Oxide for Metal-Insulator-Metal Capacitors
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Cheng, C. H.; Hsu, H. H.; Chen, W. B.; Chin, Albert; Yeh, F. S. |
國立交通大學 |
2014-12-08T15:07:52Z |
Lanthanide-Oxides Mixed TiO(2) Dielectrics for High-kappa MIM Capacitors
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Cheng, C. H.; Deng, C. K.; Hsu, H. H.; Chen, P. C.; Liou, B. H.; Chin, Albert; Yeh, F. S. |
國立交通大學 |
2014-12-08T15:06:45Z |
Higher-kappa titanium dioxide incorporating LaAlO(3) as dielectrics for MIM capacitors
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Cheng, C. H.; Hsu, H. H.; Chen, P. C.; Liou, B. H.; Chin, Albert; Yeh, F. S. |
國立成功大學 |
2009-07 |
Flat band voltage control on low V-t metal-gate/high-kappa CMOSFETs with small EOT
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Chin, Albert; Chang, M. F.; Lin, S. H.; Chen, W. B.; Lee, P. T.; Yeh, F. S.; Liao, Chi-Chang; Li, M. F.; Su, N. C.; Wang, Shui-Jinn |
Showing items 1-44 of 44 (1 Page(s) Totally) 1 View [10|25|50] records per page
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