|
"yeh f s"的相關文件
顯示項目 26-44 / 44 (共2頁)
<< < 1 2
每頁顯示[10|25|50]項目
| 國立交通大學 |
2014-12-08T15:21:00Z |
Long-Endurance Nanocrystal TiO(2) Resistive Memory Using a TaON Buffer Layer
|
Cheng, C. H.; Chen, P. C.; Wu, Y. H.; Yeh, F. S.; Chin, Albert |
| 國立交通大學 |
2014-12-08T15:15:18Z |
A novel self-aligned etch-stopper structure with lower photo leakage for AMLCD and sensor applications
|
Liang, Chung-Yu; Gan, Feng-Yuan; Liu, Po-Tsun; Yeh, F. S.; Chen, Stephen Hsin-Li; Chang, Ting-Chang |
| 國立交通大學 |
2014-12-08T15:13:40Z |
n(+)-doped-layer-free microcrystalline silicon thin film transistors fabricated with the CuMg as source/drain metal
|
Wang, M. C.; Chang, T. C.; Liu, Po-Tsun; Xiao, R. W.; Lin, L. F.; Li, Y. Y.; Yeh, F. S.; Chen, J. R. |
| 國立交通大學 |
2014-12-08T15:12:50Z |
High-Performance MIM Capacitors Using a High-kappa TiZrO Dielectric
|
Cheng, C. H.; Pan, H. C.; Lin, S. H.; Hsu, H. H.; Hsiao, C. N.; Chou, C. P.; Yeh, F. S.; Chin, Albert |
| 國立交通大學 |
2014-12-08T15:12:03Z |
Ultralow Switching Energy Ni/GeO(x)/HfON/TaN RRAM
|
Cheng, C. H.; Chin, Albert; Yeh, F. S. |
| 國立交通大學 |
2014-12-08T15:11:24Z |
Comparison of MONOS memory device integrity when using Hf(1-x-y)N(x)O(y) trapping layers with different N compositions
|
Yang, H. J.; Cheng, C. F.; Chen, W. B.; Lin, S. H.; Yeh, F. S.; McAlister, Sean P.; Chin, Albert |
| 國立交通大學 |
2014-12-08T15:11:13Z |
Improving the retention and endurance characteristics of charge-trapping memory by using double quantum barriers
|
Lin, S. H.; Yang, H. J.; Chen, W. B.; Yeh, F. S.; McAlister, Sean P.; Chin, Albert |
| 國立交通大學 |
2014-12-08T15:11:06Z |
High density and low leakage current in TiO(2) MIM capacitors processed at 300 degrees C
|
Cheng, C. H.; Lin, S. H.; Jhou, K. Y.; Chen, W. J.; Chou, C. P.; Yeh, F. S.; Hu, J.; Hwang, M.; Arikado, T.; McAlister, S. P. |
| 國立交通大學 |
2014-12-08T15:10:16Z |
Low-V(t) TaN/HfLaO n-MOSFETs Using Low-Temperature Formed Source-Drain Junctions
|
Lin, S. H.; Liu, S. L.; Yeh, F. S.; Chin, Albert |
| 國立交通大學 |
2014-12-08T15:09:23Z |
Low-Threshold-Voltage TaN/Ir/LaTiO p-MOSFETs Incorporating Low-Temperature-Formed Shallow Junctions
|
Lin, S. H.; Cheng, C. H.; Chen, W. B.; Yeh, F. S.; Chin, Albert |
| 國立交通大學 |
2014-12-08T15:09:13Z |
High-Density and Low-Leakage-Current MIM Capacitor Using Stacked TiO(2)/ZrO(2) Insulators
|
Lin, S. H.; Chiang, K. C.; Chin, Albert; Yeh, F. S. |
| 國立交通大學 |
2014-12-08T15:08:49Z |
Low-Threshold-Voltage TaN/LaTiO n-MOSFETs With Small EOT
|
Lin, S. H.; Cheng, C. H.; Chen, W. B.; Yeh, F. S.; Chin, Albert |
| 國立交通大學 |
2014-12-08T15:08:08Z |
Improved Stress Reliability of Analog Metal-Insulator-Metal Capacitors Using TiO(2)/ZrO(2) Dielectrics
|
Lin, S. H.; Chiang, K. C.; Yeh, F. S.; Chin, Albert |
| 國立交通大學 |
2014-12-08T15:07:53Z |
High-kappa TiCeO MIM Capacitors with a Dual-Plasma Interface Treatment
|
Cheng, C. H.; Hsu, H. H.; Hsieh, I. J.; Deng, C. K.; Chin, Albert; Yeh, F. S. |
| 國立交通大學 |
2014-12-08T15:07:53Z |
A Study on Frequency-Dependent Voltage Nonlinearity of SrTiO(3) rf Capacitor
|
Cheng, C. H.; Huang, C. C.; Hsu, H. H.; Chen, P. C.; Chiang, K. C.; Chin, Albert; Yeh, F. S. |
| 國立交通大學 |
2014-12-08T15:07:53Z |
Characteristics of Cerium Oxide for Metal-Insulator-Metal Capacitors
|
Cheng, C. H.; Hsu, H. H.; Chen, W. B.; Chin, Albert; Yeh, F. S. |
| 國立交通大學 |
2014-12-08T15:07:52Z |
Lanthanide-Oxides Mixed TiO(2) Dielectrics for High-kappa MIM Capacitors
|
Cheng, C. H.; Deng, C. K.; Hsu, H. H.; Chen, P. C.; Liou, B. H.; Chin, Albert; Yeh, F. S. |
| 國立交通大學 |
2014-12-08T15:06:45Z |
Higher-kappa titanium dioxide incorporating LaAlO(3) as dielectrics for MIM capacitors
|
Cheng, C. H.; Hsu, H. H.; Chen, P. C.; Liou, B. H.; Chin, Albert; Yeh, F. S. |
| 國立成功大學 |
2009-07 |
Flat band voltage control on low V-t metal-gate/high-kappa CMOSFETs with small EOT
|
Chin, Albert; Chang, M. F.; Lin, S. H.; Chen, W. B.; Lee, P. T.; Yeh, F. S.; Liao, Chi-Chang; Li, M. F.; Su, N. C.; Wang, Shui-Jinn |
顯示項目 26-44 / 44 (共2頁)
<< < 1 2
每頁顯示[10|25|50]項目
|
