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Institution	Date	Title	Author
國立交通大學	2014-12-08T15:37:36Z	Stacked GeO/SrTiO(x) Resistive Memory with Ultralow Resistance Currents	Cheng, C. H.; Chin, Albert; Yeh, F. S.
國立交通大學	2014-12-08T15:36:27Z	Improved Device Characteristics in Charge-Trapping-Engineered Flash Memory Using High-kappa Dielectrics	Chin, Albert; Lin, S. H.; Tsai, C. Y.; Yeh, F. S.
國立交通大學	2014-12-08T15:29:30Z	Bipolar switching characteristics of low-power Geo resistive memory	Cheng, C. H.; Chen, P. C.; Liu, S. L.; Wu, T. L.; Hsu, H. H.; Chin, Albert; Yeh, F. S.
國立交通大學	2014-12-08T15:23:32Z	Highly uniform low-power resistive memory using nitrogen-doped tantalum pentoxide	Cheng, C. H.; Chen, P. C.; Wu, Y. H.; Wu, M. J.; Yeh, F. S.; Chin, Albert
國立交通大學	2014-12-08T15:23:05Z	Size-Dependent Trapping Effect in Nano-Dot Non-Volatile Memory	Tsai, C. Y.; Cheng, C. H.; Chang, T. Y.; Chou, K. Y.; Chin, Albert; Yeh, F. S.
國立交通大學	2014-12-08T15:21:00Z	Long-Endurance Nanocrystal TiO(2) Resistive Memory Using a TaON Buffer Layer	Cheng, C. H.; Chen, P. C.; Wu, Y. H.; Yeh, F. S.; Chin, Albert
國立交通大學	2014-12-08T15:15:18Z	A novel self-aligned etch-stopper structure with lower photo leakage for AMLCD and sensor applications	Liang, Chung-Yu; Gan, Feng-Yuan; Liu, Po-Tsun; Yeh, F. S.; Chen, Stephen Hsin-Li; Chang, Ting-Chang
國立交通大學	2014-12-08T15:13:40Z	n(+)-doped-layer-free microcrystalline silicon thin film transistors fabricated with the CuMg as source/drain metal	Wang, M. C.; Chang, T. C.; Liu, Po-Tsun; Xiao, R. W.; Lin, L. F.; Li, Y. Y.; Yeh, F. S.; Chen, J. R.
國立交通大學	2014-12-08T15:12:50Z	High-Performance MIM Capacitors Using a High-kappa TiZrO Dielectric	Cheng, C. H.; Pan, H. C.; Lin, S. H.; Hsu, H. H.; Hsiao, C. N.; Chou, C. P.; Yeh, F. S.; Chin, Albert
國立交通大學	2014-12-08T15:12:03Z	Ultralow Switching Energy Ni/GeO(x)/HfON/TaN RRAM	Cheng, C. H.; Chin, Albert; Yeh, F. S.
國立交通大學	2014-12-08T15:11:24Z	Comparison of MONOS memory device integrity when using Hf(1-x-y)N(x)O(y) trapping layers with different N compositions	Yang, H. J.; Cheng, C. F.; Chen, W. B.; Lin, S. H.; Yeh, F. S.; McAlister, Sean P.; Chin, Albert
國立交通大學	2014-12-08T15:11:13Z	Improving the retention and endurance characteristics of charge-trapping memory by using double quantum barriers	Lin, S. H.; Yang, H. J.; Chen, W. B.; Yeh, F. S.; McAlister, Sean P.; Chin, Albert
國立交通大學	2014-12-08T15:11:06Z	High density and low leakage current in TiO(2) MIM capacitors processed at 300 degrees C	Cheng, C. H.; Lin, S. H.; Jhou, K. Y.; Chen, W. J.; Chou, C. P.; Yeh, F. S.; Hu, J.; Hwang, M.; Arikado, T.; McAlister, S. P.
國立交通大學	2014-12-08T15:10:16Z	Low-V(t) TaN/HfLaO n-MOSFETs Using Low-Temperature Formed Source-Drain Junctions	Lin, S. H.; Liu, S. L.; Yeh, F. S.; Chin, Albert
國立交通大學	2014-12-08T15:09:23Z	Low-Threshold-Voltage TaN/Ir/LaTiO p-MOSFETs Incorporating Low-Temperature-Formed Shallow Junctions	Lin, S. H.; Cheng, C. H.; Chen, W. B.; Yeh, F. S.; Chin, Albert
國立交通大學	2014-12-08T15:09:13Z	High-Density and Low-Leakage-Current MIM Capacitor Using Stacked TiO(2)/ZrO(2) Insulators	Lin, S. H.; Chiang, K. C.; Chin, Albert; Yeh, F. S.
國立交通大學	2014-12-08T15:08:49Z	Low-Threshold-Voltage TaN/LaTiO n-MOSFETs With Small EOT	Lin, S. H.; Cheng, C. H.; Chen, W. B.; Yeh, F. S.; Chin, Albert
國立交通大學	2014-12-08T15:08:08Z	Improved Stress Reliability of Analog Metal-Insulator-Metal Capacitors Using TiO(2)/ZrO(2) Dielectrics	Lin, S. H.; Chiang, K. C.; Yeh, F. S.; Chin, Albert
國立交通大學	2014-12-08T15:07:53Z	High-kappa TiCeO MIM Capacitors with a Dual-Plasma Interface Treatment	Cheng, C. H.; Hsu, H. H.; Hsieh, I. J.; Deng, C. K.; Chin, Albert; Yeh, F. S.
國立交通大學	2014-12-08T15:07:53Z	A Study on Frequency-Dependent Voltage Nonlinearity of SrTiO(3) rf Capacitor	Cheng, C. H.; Huang, C. C.; Hsu, H. H.; Chen, P. C.; Chiang, K. C.; Chin, Albert; Yeh, F. S.
國立交通大學	2014-12-08T15:07:53Z	Characteristics of Cerium Oxide for Metal-Insulator-Metal Capacitors	Cheng, C. H.; Hsu, H. H.; Chen, W. B.; Chin, Albert; Yeh, F. S.
國立交通大學	2014-12-08T15:07:52Z	Lanthanide-Oxides Mixed TiO(2) Dielectrics for High-kappa MIM Capacitors	Cheng, C. H.; Deng, C. K.; Hsu, H. H.; Chen, P. C.; Liou, B. H.; Chin, Albert; Yeh, F. S.
國立交通大學	2014-12-08T15:06:45Z	Higher-kappa titanium dioxide incorporating LaAlO(3) as dielectrics for MIM capacitors	Cheng, C. H.; Hsu, H. H.; Chen, P. C.; Liou, B. H.; Chin, Albert; Yeh, F. S.
國立成功大學	2009-07	Flat band voltage control on low V-t metal-gate/high-kappa CMOSFETs with small EOT	Chin, Albert; Chang, M. F.; Lin, S. H.; Chen, W. B.; Lee, P. T.; Yeh, F. S.; Liao, Chi-Chang; Li, M. F.; Su, N. C.; Wang, Shui-Jinn

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