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Institution Date Title Author
臺大學術典藏 2018-09-10T06:57:00Z Effect of oxidation pressure on the characteristics of fluorinated thin gate oxides prepared by room temperature deposition followed by rapid thermal oxidation Yeh, Kuo-Lang; Jeng, Ming-Jer; Hwu, Jenn-Gwo; JENN-GWO HWU
國立臺灣大學 1999 Fluorinated thin gate oxides prepared by room temperature deposition followed by furnace oxidation Yeh, Kuo-Lang; Jeng, Ming-Jer; Hwu, Jenn-Gwo

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