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臺灣學術機構典藏系統 (Taiwan Academic Institutional Repository, TAIR)
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Institution Date Title Author
國立交通大學 2014-12-08T15:48:52Z The relaxation phenomena of positive charges in thin gate oxide during Fowler-Nordheim tunneling stress Chang, KM; Li, CH; Wang, SW; Yeh, TH; Yang, JY; Lee, TC
國立交通大學 2014-12-08T15:46:52Z Thermal stability of amorphous-like WNx/W bilayered diffusion barrier for chemical vapor deposited-tungsten/p(+)-Si contact system Chang, KM; Deng, IC; Yeh, TH; Lain, KD; Fu, CM
國立交通大學 2014-12-08T15:46:27Z Barrier characteristics of chemical vapor deposited amorphous-like tungsten silicide with in situ nitrogen plasma treatment Chang, KM; Deng, IC; Yeh, TH; Shih, CW
國立交通大學 2014-12-08T15:27:43Z Reactive ion etching of compound semiconductors grown by MOCVD technique with BCl3/SF6/Ar mixtures Chang, KM; Tsai, JY; Yeh, CB; Yeh, TH; Wang, SW; Jou, MJ
國立交通大學 2014-12-08T15:27:04Z Suppress copper diffusion through barrier metal-free hydrogen silisequioxane dielectrics by using NH3 plasma treatment Chang, KM; Deng, IC; Yeh, SJ; Yeh, TH
國立交通大學 2014-12-08T15:19:22Z Design of microstrip bandpass filters with a dual-passband response Kuo, JT; Yeh, TH; Yeh, CC
國立交通大學 2014-12-08T15:17:17Z Risk factors to driver fatalities in single-vehicle crashes: Comparisons between non-motorcycle drivers and motorcyclists Chang, HL; Yeh, TH
國立交通大學 2014-12-08T15:04:06Z ACTIVITY-COEFFICIENTS OF ELECTRONS AND HOLES IN DEGENERATE SEMICONDUCTORS WITH NONUNIFORM COMPOSITION CHANG, KM; YEH, TH; WANG, SW; LEE, CH
國立交通大學 2014-12-08T15:03:41Z A SIMPLE AND EFFICIENT PRETREATMENT TECHNOLOGY FOR SELECTIVE TUNGSTEN DEPOSITION IN LOW-PRESSURE CHEMICAL-VAPOR-DEPOSITION REACTOR CHANG, KM; YEH, TH; LI, CH; WANG, SW
國立交通大學 2014-12-08T15:02:36Z Effects of gas ratio on electrical properties of electron-cyclotron-resonance nitride films grown at room temperature Chang, KM; Tsai, JY; Li, CH; Yeh, TH; Wang, SW; Yang, JY

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