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Showing items 16-25 of 66  (7 Page(s) Totally)
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Institution Date Title Author
國立交通大學 2014-12-08T15:19:22Z Design of microstrip bandpass filters with a dual-passband response Kuo, JT; Yeh, TH; Yeh, CC
國立交通大學 2014-12-08T15:17:17Z Risk factors to driver fatalities in single-vehicle crashes: Comparisons between non-motorcycle drivers and motorcyclists Chang, HL; Yeh, TH
國立交通大學 2014-12-08T15:04:06Z ACTIVITY-COEFFICIENTS OF ELECTRONS AND HOLES IN DEGENERATE SEMICONDUCTORS WITH NONUNIFORM COMPOSITION CHANG, KM; YEH, TH; WANG, SW; LEE, CH
國立交通大學 2014-12-08T15:03:41Z A SIMPLE AND EFFICIENT PRETREATMENT TECHNOLOGY FOR SELECTIVE TUNGSTEN DEPOSITION IN LOW-PRESSURE CHEMICAL-VAPOR-DEPOSITION REACTOR CHANG, KM; YEH, TH; LI, CH; WANG, SW
國立交通大學 2014-12-08T15:02:36Z Effects of gas ratio on electrical properties of electron-cyclotron-resonance nitride films grown at room temperature Chang, KM; Tsai, JY; Li, CH; Yeh, TH; Wang, SW; Yang, JY
國立交通大學 2014-12-08T15:02:31Z Dry etching of polysilicon with high selectivity using a chlorine-based plasma in an ECR reactor Chang, KM; Yeh, TH; Wang, SW; Li, CH; Yang, JY
國立交通大學 2014-12-08T15:02:25Z Influences of deposition temperature on thermal stability and moisture resistance of chemical vapor deposited fluorinated silicon oxide by using indirect fluorinating precursor Chang, KM; Wang, SW; Wu, CJ; Yeh, TH; Li, CH; Yang, JY
國立交通大學 2014-12-08T15:02:24Z Influences of damage and contamination from reactive ion etching on selective tungsten deposition in a low-pressure chemical-vapor-deposition reactor Chang, KM; Yeh, TH; Wang, SW; Li, CH
國立交通大學 2014-12-08T15:02:22Z Highly selective etching for polysilicon and etch-induced damage to gate oxide with halogen-bearing electron-cyclotron-resonance plasma Chang, KM; Yeh, TH; Deng, IC; Lin, HC
國立交通大學 2014-12-08T15:02:13Z Comprehensive study of plasma pretreatment process for thin gate oxide (<10 nm) fabricated by electron cyclotron resonance plasma oxidation Chang, KM; Li, CH; Fahn, FJ; Yeh, TH; Wang, SW

Showing items 16-25 of 66  (7 Page(s) Totally)
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