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"yeh wen kuan"的相关文件
显示项目 46-70 / 79 (共4页)
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| 國立高雄大學 |
2008-07 |
Significantly improving sub-90 nm CMOSFET performances with notch-gate enhanced high tensile-stress contact etch stop layer
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Hsu, Chia-Wei; Fang, Yean-Kuen; Yeh, Wen-Kuan; Lin, Chien-Ting |
| 國立高雄大學 |
2008 |
A high current gain gate-controlled lateral bipolar junction transistor with 90 nm CMOS technology for future RF SoC applications
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Chen, Shuo-Mao; Fang, Yean-Kuen; Yeh, Wen-Kuan; Lee, I.C.; Chiang, Yen-Ting |
| 國立高雄大學 |
2008 |
The impact of stain technology on FUSI gate SOI CMOSFET and device performance enhancement for 45nm node and beyond
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Yeh, Wen-Kuan; Wang, Jean-An; Lin, Chien-Ting; Cheng, Li-Wei; Ma, Mike |
| 國立高雄大學 |
2007-07 |
The impact of mobility enhanced technology on device performance and reliability for sub-90nm SOI nMOSFETs
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Yeh, Wen-Kuan |
| 國立高雄大學 |
2007-05 |
Impacts of notched-gate structure on contact etch stop layer (CESL) stressed 90-nm nMOSFET
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Lin, Chien-Ting; Fang, Yean-Kuen; Yeh, Wen-Kuan; Lai, Chieh-Ming; Hsu, Che-Hua; Cheng, Li-Wei; Ma, Guang-Hwa |
| 國立成功大學 |
2007-05 |
Impacts of notched-gate structure on contact etch stop layer (CESL) stressed 90-nm nMOSFET
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Lin, Chien-Ting; Fang, Yean-Kuen; Yeh, Wen-Kuan; Lai, Chieh-Ming; Hsu, Che-Hua; Cheng, Li-Wei; Ma, Guang-Hwa |
| 國立高雄大學 |
2007-04-30 |
Efficient mobility enhancement engineering on 65 nm fully silicide complementary metal-oxide-semiconductor field-effect-transistors using second contect etch stop layer process
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Lai, Chieh-Ming; Fang, Yean-Kuen; Lin, Chien-Ting; Yeh, Wen-Kuan |
| 國立成功大學 |
2007-04 |
Efficient mobility enhancement engineering on 65 nm fully silicide complementary metal-oxide-semiconductor field-effect-transistors using second contect etch stop layer process
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Lai, Chieh-Ming; Fang, Yean-Kuen; Lin, Chien-Ting; Yeh, Wen-Kuan |
| 國立成功大學 |
2007-04 |
Extra bonus on transistor optimization with stress enhanced notched-gate technology for sub-90 nm complementary metal oxide semiconductor field effect transistor
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Lin, Chien-Ting; Fang, Yean-Kuen; Lai, Chieh-Ming; Yeh, Wen-Kuan; Hsu, Che-Hua; Cheng, Li-Wei; Huang, Yao-Tsung; Ma, Guang Hwa |
| 國立高雄大學 |
2007-02 |
A novel strain method for enhancement of 90-nm node and beyond FUSI-gated CMOS performance
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Lin, Chien-Ting; Fang, Yean-Kuen; Yeh, Wen-Kuan; Lee, Tung-Hsing; Chen, Ming-Shing; Lai, Chieh-Ming; Hsu, Che-Hua; Chen, Liang-Wei; Cheng, Li-Wei; Ma, Mike |
| 國立高雄大學 |
2007-02 |
The investigation of post-annealing-induced defects behavior on 90-nm in halo nMOSFETs with low-frequency noise and charge-pumping measuring
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Lai, Chieh-Ming; Fang, Yean-Kuen; Yeh, Wen-Kuan; Lin, Chien-Ting; Chou, T.H. |
| 國立成功大學 |
2007-02 |
The investigation of post-annealing-induced defects behavior on 90-nm in halo nMOSFETs with low-frequency noise and charge-pumping measuring
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Lai, Chieh-Ming; Fang, Yean-Kuen; Yeh, Wen-Kuan; Lin, C. T.; Chou, T. H. |
| 國立成功大學 |
2007-02 |
A novel strain method for enhancement of 90-nm node and beyond FUSI-gated CMOS performance
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Lin, Chien-Ting; Fang, Yean-Kuen; Yeh, Wen-Kuan; Lee, Tung-Hsing; Chen, Ming-Shing; Lai, Chieh-Ming; Hsu, Che-Hua; Chen, Liang-Wei; Cheng, Li-Wei; Ma, Mike |
| 國立成功大學 |
2006-12 |
Effect of silicon thickness on contact-etch-stop-layer-induced silicon/buried-oxide interface stress for partially depleted SOI
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Lin, Chien-Ting; Fang, Yean-Kuen; Yeh, Wen-Kuan; Lee, Tung-Hsing; Chen, Ming-Shing; Hsu, Che-Hua; Chen, Liang-Wei; Cheng, Li-Wei; Ma, Mike |
| 國立成功大學 |
2006-11 |
The geometry effect of contact etch stop layer impact on device performance and reliability for 90-nm SOI nMOSFETs
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Lai, Chieh-Ming; Fang, Yean-Kuen; Lin, Chien-Ting; Yeh, Wen-Kuan |
| 東方設計學院 |
2006-07-05 |
The new concept for particle remove in wet bench cleaning
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Chen, Sheng-Hsiung; Chen, Shen-Li; Chung, Long-Yeu; 鍾隆宇; Yeh, Wen-Kuan; (東方技術學院電機工程系) |
| 東方設計學院 |
2006-07-05 |
Tiny pitts are the yield major killer caused by metal contamination in wet bench cleaning
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Chen, Sheng-Hsiung; Chen, Shen-Li; Chung, Long-Yeu; 鍾隆宇; Yeh, Wen-Kuan; (東方技術學院電機工程系) |
| 國立成功大學 |
2006-06 |
The impacts of high tensile stress CESL and geometry design on device performance and reliability for 90 nm SOI nMOSFETs
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Lai, Chieh-Ming; Fang, Yean-Kuen; Lin, Chien-Ting; Hsu, Chia-Wei; Yeh, Wen-Kuan |
| 國立成功大學 |
2006-04 |
Investigation and modeling of stress interactions on 90 nm silicon on insulator complementary metal oxide semiconductor by various mobility enhancement approaches
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Lin, Chien-Ting; Fang, Yean-Kuen; Yeh, Wen-Kuan; Lee, Tung-Hsing; Chen, Ming-Hing; Hsu, Che-Hua; Chen, Liang-Wei; Chang, Hui-Chen; Tsai, Cheng-Tzung; Ma, Mike |
| 國立成功大學 |
2006-04 |
Systematic analysis and modeling of on-chip spiral inductors for complementary metal oxide semiconductor radio frequency integrated circuits applications
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Tang, Mao-Chyuan; Fang, Yean-Kuen; Yeh, Wen-Kuan; Chen, S. H.; Yeh, Ta-Hsun |
| 國立成功大學 |
2006-04 |
Stress technology impact on device performances and reliability for (100) sub-90 nm silicon-on-insulator complementary metal-oxide-semiconductor field-effect-transistors
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Lai, Chieh-Ming; Fang, Yean-Kuen; Yeh, Wen-Kuan |
| 國立高雄大學 |
2006 |
The impact of stress enhanced technology for sub-90nm SOI MOSFETs
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Yeh, Wen-Kuan; Lai, Chieh-Ming; Lin, Chien-Ting; Fang, Yean-Kuen |
| 國立成功大學 |
2005-09 |
Effect of extrinsic impedance and parasitic capacitance on figure of merit of RF MOSFET
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Yeh, Wen-Kuan; Ku, Chao-Ching; Chen, Shuo-Mao; Fang, Yean-Kuen; Chao, C. P. |
| 國立成功大學 |
2005-04 |
Width effect on hot-carrier-induced degradation for 90nm partially depleted SOICMOSFETs
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Lai, Chieh-Ming; Fang, Yean-Kuen; Pan, Shing-Tai; Yeh, Wen-Kuan |
| 國立高雄大學 |
2005 |
Stress technology impact on device performance and reliability for <100> sub-90nm SOI CMOSFETs
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Yeh, Wen-Kuan; Lai, Chieh-Ming; Lin, Chien-Ting; Fang, Yean-Kuen; Shiau, W.T. |
显示项目 46-70 / 79 (共4页)
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