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"yeh wen kuan"的相關文件
顯示項目 21-70 / 79 (共2頁)
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| 國立交通大學 |
2017-04-21T06:49:12Z |
Logic/Memory Hybrid 3D Sequentially Integrated Circuit Using Low Thermal Budget Laser Process
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Yang, Chih-Chao; Hsieh, Tung-Ying; Huang, Wen-Hsien; Wu, Tsung-Ta; Wang, Hsing-Hsiang; Shen, Chang-Hong; Kao, Ming-Hsuan; Yeh, Wen-Kuan; Chang, Meng-Fan; Wu, Meng-Chyi; Shieh, Jia-Min |
| 國立交通大學 |
2017-04-21T06:49:09Z |
a-SiGeC Thin Film Photovoltaic Enabled Self-Power Monolithic 3D IC Under Indoor Illumination
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Kao, Ming-Hsuan; Yang, Chih-Chao; Wu, Tsung-Ta; Hsieh, Tung-Ying; Huang, Wen-Hsieh; Wang, Hsing-Hsiang; Shen, Chang-Hong; Yeh, Wen-Kuan; Chang, Meng-Fan; Shieh, Jia-Min |
| 國立交通大學 |
2017-04-21T06:48:48Z |
3D-TCAD Simulation Study of the Contact All Around T-FinFET Structure for 10nm Metal-Oxide-Semiconductor Field-Effect Transistor
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Chou, Chen-Han; Hsu, Chung-Chun; Yeh, Wen-Kuan; Chung, Steve S.; Chien, Chao-Hsin |
| 國立交通大學 |
2017-04-21T06:48:46Z |
Suspended Ge Gate-All-Around Nanowire nFETs with Junction Isolation on Bulk Si
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Wan, Chia-Chen; Luo, Guang-Li; Hsu, Shu-Han; Hung, Kuo-Dong; Chu, Chun-Lin; Hou, Tuo-Hung; Su, Chun-Jun; Chen, Szu-Hung; Wu, Wen-Fa; Yeh, Wen-Kuan |
| 國立交通大學 |
2017-04-21T06:48:19Z |
Diamond-shaped Ge and Ge0.9Si0.1 Gate-All-Around Nanowire FETs with Four {111} Facets by Dry Etch Technology
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Lee, Yao-Jen; Hou, Fu-Ju; Chuang, Shang-Shiun; Hsueh, Fu-Kuo; Kao, Kuo-Hsing; Sung, Po-Jung; Yuan, Wei-You; Yao, Jay-Yi; Lu, Yu-Chi; Lin, Kun-Lin; Wu, Chien-Ting; Chen, Hisu-Chih; Chen, Bo-Yuan; Huang, Guo-Wei; Chen, Henry J. H.; Li, Jiun-Yun; Li, Yiming; Samukawa, Seiji; Chao, Tien-Sheng; Tseng, Tseung-Yuen; Wu, Wen-Fa; Hou, Tuo-Hung; Yeh, Wen-Kuan |
| 國立交通大學 |
2017-04-21T06:48:19Z |
High Performance Poly Si Junctionless Transistors with Sub-5nm Conformally Doped Layers by Molecular Monolayer Doping and Microwave Incorporating CO2 Laser Annealing for 3D Stacked ICs Applications
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Lee, Yao-Jen; Cho, Ta-Chun; Sung, Po-Jung; Kao, Kuo-Hsing; Hsueh, Fu-Kuo; Hou, Fu-Ju; Chen, Po-Cheng; Chen, Hsiu-Chih; Wu, Chien-Ting; Hsu, Shu-Han; Chen, Yi-Ju; Huang, Yao-Ming; Hou, Yun-Fang; Huang, Wen-Hsien; Yang, Chih-Chao; Chen, Bo-Yuan; Lin, Kun-Lin; Chen, Min-Cheng; Shen, Chang-Hong; Huang, Guo-Wei; Huang, Kun-Ping; Current, Michael I.; Li, Yiming; Samukawa, Seiji; Wu, Wen-Fa; Shieh, Jia-Min; Chao, Tien-Sheng; Yeh, Wen-Kuan |
| 國立交通大學 |
2017-04-21T06:48:18Z |
TMD FinFET with 4 nm Thin Body and Back Gate Control for Future Low Power Technology
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Chen, Min-Cheng; Li, Kai-Shin; Li, Lain-Jong; Lu, Ang-Yu; Li, Ming-Yang; Chang, Yung-Huang; Lin, Chang-Hsien; Chen, Yi-Ju; Hou, Yun-Fang; Chen, Chun-Chi; Wu, Bo-Wei; Wu, Cheng-San; Yang, Ivy; Lee, Yao-Jen; Shieh, Jia-Min; Yeh, Wen-Kuan; Shih, Jyun-Hong; Su, Po-Cheng; Sachid, Angada B.; Wang, Tahui; Yang, Fu-Liang; Hu, Chenming |
| 國立成功大學 |
2016-12 |
Microstructure and piezoelectric properties of reactively sputtered highly C-axis ScxAl1-xN thin films on diamond-like carbon/Si substrate
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Liauh, Woan Jwu; Wu, Sean; Huang, Jow-Lay; Lii, Ding-Fwu; Lin, Zhi-Xun; Yeh, Wen-Kuan |
| 國立成功大學 |
2016-04-29 |
Microstructure and Piezoelectric Properties of Reactively Sputtered Highly C-axis ScxAl1-xN Thin Films on Diamond-Like Carbon/Si Substrate
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Liauh, Woan-Jwu; Wu, Sean; Huang, Jow-Lay; Lii, Ding-Fwu; Lin, Zhi-Xun; Yeh, Wen-Kuan |
| 國立交通大學 |
2014-12-08T15:23:37Z |
Experimental Verification of RF Stress Effect on Cascode Class-E PA Performance and Reliability
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Yuan, Jiann-Shiun; Yen, Hsuan-Der; Chen, Shuyu; Wang, Ruey-Lue; Huang, Guo-Wei; Juang, Ying-Zong; Tu, Chih-Ho; Yeh, Wen-Kuan; Ma, Jun |
| 國立交通大學 |
2014-12-08T15:12:04Z |
Effect of NH(3) Plasma Nitridation on Hot-Carrier Instability and Low-Frequency Noise in Gd-Doped High-kappa Dielectric nMOSFETs
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Chen, Yu-Ting; Chen, Kun-Ming; Lin, Cheng-Li; Yeh, Wen-Kuan; Huang, Guo-Wei; Lai, Chien-Ming; Chen, Yi-Wen; Hsu, Che-Hua; Huang, Fon-Shan |
| 國立高雄大學 |
2011-03 |
The Improvement of High-k/Metal Gate pMOSFET Performance and Reliability Using Optimized Si Cap/SiGe Channel Structure
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Yeh, Wen-Kuan; Chen, Yu-Ting; Huang, Fon-Shan; Hsu, Chia-Wei; Chen, Chun-Yu; Fang, Yean-Kuen; Gan, Kwang-Jow; Chen, Po-Ying |
| 國立成功大學 |
2011-03 |
The Improvement of High-k/Metal Gate pMOSFET Performance and Reliability Using Optimized Si Cap/SiGe Channel Structure
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Yeh, Wen-Kuan; Chen, Yu-Ting; Huang, Fon-Shan; Hsu, Chia-Wei; Chen, Chun-Yu; Fang, Yean-Kuen; Gan, Kwang-Jow; Chen, Po-Ying |
| 國立高雄大學 |
2011 |
NBTI reliability on high-k metal-gate SiGe transistor and circuit performances
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Yuan, Jiann-Shiun; Yeh, Wen-Kuan; Chen, Shuyu; Hsu, Chia-Wei |
| 國立高雄大學 |
2011 |
Impact of SOI thickness on device performance and gate oxide reliability of Ni fully silicide metal-gate strained SOI MOSFET
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Lin, Cheng-Li; Yeh, Wen-Kuan |
| 國立高雄大學 |
2010-08 |
External Stresses on Tensile and Compressive Contact Etching Stop Layer SOI MOSFETs
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Chang, Wen-Teng; Wang, Chih-Chung; Lin, Jian-An; Yeh, Wen-Kuan |
| 國立高雄大學 |
2010-02 |
The Impact of Oxide Traps Induced by SOI Thickness on Reliability of Fully Silicide Metal-Gate Strained SOI MOSFET
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Lin, Cheng-Li; Chen, Yu-Ting; Huang, Fon-Shan; Yeh, Wen-Kuan; Lin, Chien-Ting |
| 國立高雄大學 |
2010 |
Improvement of TDDB reliability, characteristics of HfO2 high-k/metal gate MOSFET device with oxygen post deposition annealing
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Hsu, Chia-Wei; Fang, Yean-Kuen; Yeh, Wen-Kuan; Chen, Chun-Yu; Chiang, Yen-Ting; Juang, Feng-Renn; Lin, Chien-Ting; Lai, Chien-Ming |
| 國立高雄大學 |
2009-07 |
Effect of Nitrogen Incorporation in a Gd Cap Layer on the Reliability of Deep-Submicrometer Hf-Based High-k/Metal-Gate nMOSFETs
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Hsu, Chia-Wei; Fang, Yean-Kuen; Yeh, Wen-Kuan; Chen, Chun-Yu; Lin, Chien-Ting; Hsu, Che-Hua; Cheng, Li-Wei; Lai, Chien-Ming |
| 國立成功大學 |
2009-07 |
Effect of Nitrogen Incorporation in a Gd Cap Layer on the Reliability of Deep-Submicrometer Hf-Based High-k/Metal-Gate nMOSFETs
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Hsu, Chia-Wei; Fang, Yean-Kuen; Yeh, Wen-Kuan; Chen, Chun-Yu; Lin, Chien-Ting; Hsu, Che-Hua; Cheng, Li-Wei; Lai, Chien-Ming |
| 國立高雄大學 |
2009-03 |
The Impact of Strain Technology on FUSI Gate SOI CMOSFET
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Yeh, Wen-Kuan; Wang, Jean-An; Tsai, Ming-Hsing; Lin, Chien-Ting; Chen, Po-Ying |
| 國立成功大學 |
2008-11 |
Significantly improving sub-90 nm CMOSFET performances with notch-gate enhanced high tensile-stress contact etch stop layer
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Hsu, Chia-Wei; Fang, Yean-Kuen; Yeh, Wen-Kuan; Lin, Chien-Ting |
| 國立高雄大學 |
2008-10 |
Significant improvement of 45 nm and beyond complementary metal oxide semiconductor field effect transistor performance with fully silicided and ultimate spacer process technology
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Hsu, Chia-Wei; Fang, Yean-Kuen; Lin, Chien-Ting; Yeh, Wen-Kuan; Hsu, Che-Hua; Lai, Chieh-Ming; Cheng, Li-Wei; Ma, Mike |
| 國立成功大學 |
2008-09-01 |
Significant improvement of 45 nm and beyond complementary metal oxide semiconductor field effect transistor performance with fully silicided and ultimate spacer process technology
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Hsu, Chia-Wei; Fang, Yean-Kuen; Lin, Chien-Ting; Yeh, Wen-Kuan; Hsu, Che-Hua; Lai, Chieh-Ming; Cheng, Li-Wei; Ma, Mike |
| 國立成功大學 |
2008-08 |
A high current gain gate-controlled lateral bipolar junction transistor with 90 nm CMOS technology for future RF SoC applications
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Chen, Shuo-Mao; Fang, Yean-Kuen; Yeh, Wen-Kuan; Lee, I. C.; Chiang, Yen-Ting |
| 國立高雄大學 |
2008-07 |
Significantly improving sub-90 nm CMOSFET performances with notch-gate enhanced high tensile-stress contact etch stop layer
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Hsu, Chia-Wei; Fang, Yean-Kuen; Yeh, Wen-Kuan; Lin, Chien-Ting |
| 國立高雄大學 |
2008 |
A high current gain gate-controlled lateral bipolar junction transistor with 90 nm CMOS technology for future RF SoC applications
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Chen, Shuo-Mao; Fang, Yean-Kuen; Yeh, Wen-Kuan; Lee, I.C.; Chiang, Yen-Ting |
| 國立高雄大學 |
2008 |
The impact of stain technology on FUSI gate SOI CMOSFET and device performance enhancement for 45nm node and beyond
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Yeh, Wen-Kuan; Wang, Jean-An; Lin, Chien-Ting; Cheng, Li-Wei; Ma, Mike |
| 國立高雄大學 |
2007-07 |
The impact of mobility enhanced technology on device performance and reliability for sub-90nm SOI nMOSFETs
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Yeh, Wen-Kuan |
| 國立高雄大學 |
2007-05 |
Impacts of notched-gate structure on contact etch stop layer (CESL) stressed 90-nm nMOSFET
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Lin, Chien-Ting; Fang, Yean-Kuen; Yeh, Wen-Kuan; Lai, Chieh-Ming; Hsu, Che-Hua; Cheng, Li-Wei; Ma, Guang-Hwa |
| 國立成功大學 |
2007-05 |
Impacts of notched-gate structure on contact etch stop layer (CESL) stressed 90-nm nMOSFET
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Lin, Chien-Ting; Fang, Yean-Kuen; Yeh, Wen-Kuan; Lai, Chieh-Ming; Hsu, Che-Hua; Cheng, Li-Wei; Ma, Guang-Hwa |
| 國立高雄大學 |
2007-04-30 |
Efficient mobility enhancement engineering on 65 nm fully silicide complementary metal-oxide-semiconductor field-effect-transistors using second contect etch stop layer process
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Lai, Chieh-Ming; Fang, Yean-Kuen; Lin, Chien-Ting; Yeh, Wen-Kuan |
| 國立成功大學 |
2007-04 |
Efficient mobility enhancement engineering on 65 nm fully silicide complementary metal-oxide-semiconductor field-effect-transistors using second contect etch stop layer process
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Lai, Chieh-Ming; Fang, Yean-Kuen; Lin, Chien-Ting; Yeh, Wen-Kuan |
| 國立成功大學 |
2007-04 |
Extra bonus on transistor optimization with stress enhanced notched-gate technology for sub-90 nm complementary metal oxide semiconductor field effect transistor
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Lin, Chien-Ting; Fang, Yean-Kuen; Lai, Chieh-Ming; Yeh, Wen-Kuan; Hsu, Che-Hua; Cheng, Li-Wei; Huang, Yao-Tsung; Ma, Guang Hwa |
| 國立高雄大學 |
2007-02 |
A novel strain method for enhancement of 90-nm node and beyond FUSI-gated CMOS performance
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Lin, Chien-Ting; Fang, Yean-Kuen; Yeh, Wen-Kuan; Lee, Tung-Hsing; Chen, Ming-Shing; Lai, Chieh-Ming; Hsu, Che-Hua; Chen, Liang-Wei; Cheng, Li-Wei; Ma, Mike |
| 國立高雄大學 |
2007-02 |
The investigation of post-annealing-induced defects behavior on 90-nm in halo nMOSFETs with low-frequency noise and charge-pumping measuring
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Lai, Chieh-Ming; Fang, Yean-Kuen; Yeh, Wen-Kuan; Lin, Chien-Ting; Chou, T.H. |
| 國立成功大學 |
2007-02 |
The investigation of post-annealing-induced defects behavior on 90-nm in halo nMOSFETs with low-frequency noise and charge-pumping measuring
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Lai, Chieh-Ming; Fang, Yean-Kuen; Yeh, Wen-Kuan; Lin, C. T.; Chou, T. H. |
| 國立成功大學 |
2007-02 |
A novel strain method for enhancement of 90-nm node and beyond FUSI-gated CMOS performance
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Lin, Chien-Ting; Fang, Yean-Kuen; Yeh, Wen-Kuan; Lee, Tung-Hsing; Chen, Ming-Shing; Lai, Chieh-Ming; Hsu, Che-Hua; Chen, Liang-Wei; Cheng, Li-Wei; Ma, Mike |
| 國立成功大學 |
2006-12 |
Effect of silicon thickness on contact-etch-stop-layer-induced silicon/buried-oxide interface stress for partially depleted SOI
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Lin, Chien-Ting; Fang, Yean-Kuen; Yeh, Wen-Kuan; Lee, Tung-Hsing; Chen, Ming-Shing; Hsu, Che-Hua; Chen, Liang-Wei; Cheng, Li-Wei; Ma, Mike |
| 國立成功大學 |
2006-11 |
The geometry effect of contact etch stop layer impact on device performance and reliability for 90-nm SOI nMOSFETs
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Lai, Chieh-Ming; Fang, Yean-Kuen; Lin, Chien-Ting; Yeh, Wen-Kuan |
| 東方設計學院 |
2006-07-05 |
The new concept for particle remove in wet bench cleaning
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Chen, Sheng-Hsiung; Chen, Shen-Li; Chung, Long-Yeu; 鍾隆宇; Yeh, Wen-Kuan; (東方技術學院電機工程系) |
| 東方設計學院 |
2006-07-05 |
Tiny pitts are the yield major killer caused by metal contamination in wet bench cleaning
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Chen, Sheng-Hsiung; Chen, Shen-Li; Chung, Long-Yeu; 鍾隆宇; Yeh, Wen-Kuan; (東方技術學院電機工程系) |
| 國立成功大學 |
2006-06 |
The impacts of high tensile stress CESL and geometry design on device performance and reliability for 90 nm SOI nMOSFETs
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Lai, Chieh-Ming; Fang, Yean-Kuen; Lin, Chien-Ting; Hsu, Chia-Wei; Yeh, Wen-Kuan |
| 國立成功大學 |
2006-04 |
Investigation and modeling of stress interactions on 90 nm silicon on insulator complementary metal oxide semiconductor by various mobility enhancement approaches
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Lin, Chien-Ting; Fang, Yean-Kuen; Yeh, Wen-Kuan; Lee, Tung-Hsing; Chen, Ming-Hing; Hsu, Che-Hua; Chen, Liang-Wei; Chang, Hui-Chen; Tsai, Cheng-Tzung; Ma, Mike |
| 國立成功大學 |
2006-04 |
Systematic analysis and modeling of on-chip spiral inductors for complementary metal oxide semiconductor radio frequency integrated circuits applications
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Tang, Mao-Chyuan; Fang, Yean-Kuen; Yeh, Wen-Kuan; Chen, S. H.; Yeh, Ta-Hsun |
| 國立成功大學 |
2006-04 |
Stress technology impact on device performances and reliability for (100) sub-90 nm silicon-on-insulator complementary metal-oxide-semiconductor field-effect-transistors
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Lai, Chieh-Ming; Fang, Yean-Kuen; Yeh, Wen-Kuan |
| 國立高雄大學 |
2006 |
The impact of stress enhanced technology for sub-90nm SOI MOSFETs
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Yeh, Wen-Kuan; Lai, Chieh-Ming; Lin, Chien-Ting; Fang, Yean-Kuen |
| 國立成功大學 |
2005-09 |
Effect of extrinsic impedance and parasitic capacitance on figure of merit of RF MOSFET
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Yeh, Wen-Kuan; Ku, Chao-Ching; Chen, Shuo-Mao; Fang, Yean-Kuen; Chao, C. P. |
| 國立成功大學 |
2005-04 |
Width effect on hot-carrier-induced degradation for 90nm partially depleted SOICMOSFETs
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Lai, Chieh-Ming; Fang, Yean-Kuen; Pan, Shing-Tai; Yeh, Wen-Kuan |
| 國立高雄大學 |
2005 |
Stress technology impact on device performance and reliability for <100> sub-90nm SOI CMOSFETs
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Yeh, Wen-Kuan; Lai, Chieh-Ming; Lin, Chien-Ting; Fang, Yean-Kuen; Shiau, W.T. |
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