臺灣學術機構典藏系統 (Taiwan Academic Institutional Repository, TAIR)

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Institution	Date	Title	Author
臺大學術典藏	2020-01-06T03:11:56Z	Intermittent pressurized operation of steam explosion pretreatment system	Liao, Y.-C.; Yen, F.-Y.; Hung, F.; Su, C.-H.; Chen, W.-H.; YING-CHIH LIAO
國立交通大學	2014-12-08T15:15:52Z	HfSiON n-MOSFETs using low-work function HfSi chi gate	Wu, C. H.; Hung, B. F.; Chin, Albert; Wang, S. J.; Yen, F. Y.; Hou, Y. T.; Jin, Y.; Tao, H. J.; Chen, S. C.; Liang, M. S.
國立交通大學	2014-12-08T15:14:46Z	High-temperature stable IrxSi gates with high work function on HfSiON p-MOSFETs	Hung, B. F.; Wu, C. H.; Chin, Albert; Wang, S. J.; Yen, F. Y.; Hou, Y. T.; Jin, Y.; Tao, H. J.; Chen, Shih C.; Liang, Mong-Song
國立交通大學	2014-12-08T15:14:22Z	High-temperature stable HfLaON p-MOSFETs with high-work-function Ir3Si gate	Wu, C. H.; Hung, B. F.; Chin, Albert; Wang, S. J.; Wang, X. P.; Li, M. -F.; Zhu, C.; Yen, F. Y.; Hou, Y. T.; Jin, Y.; Tao, H. J.; Chen, S. C.; Liang, M. S.
國立成功大學	2007-04	High-temperature stable HfLaON p-MOSFETs with high-work-function Ir3Si gate	Wu, C. H.; Hung, B. F.; Chin, Albert; Wang, S. J.; Wang, X. P.; Li, M. F.; Zhu, C.; Yen, F. Y.; Hou, Y. T.; Jin, Y.; Tao, H. J.; Chen, S. C.; Liang, M. S.
國立成功大學	2007-02	High-temperature stable IrxSi gates with high work function on HfSiON p-MOSFETs	Hung, B. F.; Wu, C. H.; Chin, Albert; Wang, S. J.; Yen, F. Y.; Hou, Y. T.; Jin, Y.; Tao, H. J.; Chen, Shih C.; Liang, Mong-Song
國立成功大學	2006-09	HfSiON n-MOSFETs using low-work function HfSi chi gate	Wu, C. H.; Hung, B. F.; Chin, Albert; Wang, Shui-Jinn; Yen, F. Y.; Hou, Y. T.; Jin, Y.; Tao, H. J.; Chen, S. C.; Liang, M. S.
國立成功大學	2006-06	HfAlON n-MOSFETs incorporating low-work function gate using ytterbium silicide	Wu, C. H.; Hung, B. F.; Chin, Albert; Wang, Shui-Jinn; Yen, F. Y.; Hou, Y. T.; Jin, Y.; Tao, H. J.; Chen, S. C.; Liang, M. S.

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