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Institution Date Title Author
國立交通大學 2014-12-08T15:47:13Z HRTEM and EFTEM studies of the evolution of Cu/Ta/SiO2/Si interfaces in ULSI devices Yin, KM; Chang, L; Chen, FR; Kai, JJ; Chuang, CCCG; Shen, CF; Lo, SC; Ding, P; Chin, B; Zhang, H; Chen, F
國立交通大學 2014-12-08T15:43:47Z The effect of oxygen in the annealing ambient on interfacial reactions of Cu/Ta/Si multilayers Yin, KM; Chang, L; Chen, FR; Kai, JJ; Chiang, CC; Ding, PJ; Chin, B; Zhang, H; Chen, FS
國立交通大學 2014-12-08T15:43:47Z Oxidation of Ta diffusion barrier layer for Cu metallization in thermal annealing Yin, KM; Chang, L; Chen, FR; Kai, JJ; Chiang, CC; Chuang, G; Ding, PJ; Chin, B; Zhang, H; Chen, FS
國立交通大學 2014-12-08T15:43:34Z The effect of oxygen on the interfacial reactions of Cu/TaNx/Si multilayers Yin, KM; Chang, L; Chen, FR; Kai, JJ

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