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Institution Date Title Author
國立交通大學 2014-12-08T15:46:34Z A new quasi-2-D model for hot-carrier band-to-band tunneling current You, KF; Wu, CY
國立交通大學 2014-12-08T15:02:40Z A novel two-step etching process for reducing plasma-induced oxide damage You, KF; Wu, CY
國立交通大學 2014-12-08T15:01:09Z A new simulation model for plasma ashing process-induced oxide degradation in MOSFET You, KF; Chang, MC; Wu, CY

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