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Institution Date Title Author
臺大學術典藏 2022-01-03T08:01:17Z Fabrication of metrology test structures with programmed line edge roughness using electron beam direct write Fu-Min Wang; Kuen-Yu Tsai;  Jia-Han Li; Alek C. Chen; Yen-Min Lee; Yu-Tian Shen; Hsin-Hung Cheng; Chieh-Hsiang Kuan; JIA-HAN LI
臺大學術典藏 2022-01-03T08:01:15Z Optical metrology of shape-varying nano-patterned gratings by analyzing the scattering signals in their pupil images Yen-Min Lee;  Jia-Han Li*; Fu-Min Wang; Hsin-Hung Cheng; Yu-Tian Shen;   Kuen-Yu Tsai; Alek C. Chen; JIA-HAN LI
臺大學術典藏 2018-09-10T15:26:03Z Design of an electron-optical system with a ball-tip emission source through a numerical optimization method for high-throughput electron-beam–direct-write lithography Yu-Tian Shen; Kuen-Yu Tsai; KUEN-YU TSAI; Hsuan-Ping Lee;Sheng-Yung Chen;Chun-Hung Liu;Ding-Qi;Yu-Tian Shen;Kuen-Yu Tsai; Hsuan-Ping Lee; Sheng-Yung Chen; Chun-Hung Liu; Ding-Qi
臺大學術典藏 2018-09-10T15:26:03Z Design of an electron-optical system with a ball-tip emission source through a numerical optimization method for high-throughput electron-beam–direct-write lithography Yu-Tian Shen; Kuen-Yu Tsai; KUEN-YU TSAI; Hsuan-Ping Lee;Sheng-Yung Chen;Chun-Hung Liu;Ding-Qi;Yu-Tian Shen;Kuen-Yu Tsai; Hsuan-Ping Lee; Sheng-Yung Chen; Chun-Hung Liu; Ding-Qi
臺大學術典藏 2018-09-10T15:00:24Z Optical scatterometry system for detecting specific line edge roughness of resist gratings subjected to detector noises Yen-Min Lee;Jia-Han Li;Fu-Min Wang;Hsin-Hung Cheng;Yu-Tian Shen;Kuen-Yu Tsai;Jason Shieh;Alek Chen; Yen-Min Lee; Jia-Han Li; Fu-Min Wang; Hsin-Hung Cheng; Yu-Tian Shen; Kuen-Yu Tsai; Jason Shieh; Alek Chen; KUEN-YU TSAI
臺大學術典藏 2018-09-10T15:00:24Z Optical scatterometry system for detecting specific line edge roughness of resist gratings subjected to detector noises Yen-Min Lee;Jia-Han Li;Fu-Min Wang;Hsin-Hung Cheng;Yu-Tian Shen;Kuen-Yu Tsai;Jason Shieh;Alek Chen; Yen-Min Lee; Jia-Han Li; Fu-Min Wang; Hsin-Hung Cheng; Yu-Tian Shen; Kuen-Yu Tsai; Jason Shieh; Alek Chen; KUEN-YU TSAI
臺大學術典藏 2018-09-10T15:00:24Z Improvement in electron-beam lithography throughput by exploiting relaxed patterning fidelity requirements with directed self-assembly Hao-Yun Yu;Chun-Hung Liu;Yu-Tian Shen;Hsuan-Ping Lee;Kuen-Yu Tsai; Hao-Yun Yu; Chun-Hung Liu; Yu-Tian Shen; Hsuan-Ping Lee; Kuen-Yu Tsai; KUEN-YU TSAI
臺大學術典藏 2018-09-10T15:00:24Z Improvement in electron-beam lithography throughput by exploiting relaxed patterning fidelity requirements with directed self-assembly Hao-Yun Yu;Chun-Hung Liu;Yu-Tian Shen;Hsuan-Ping Lee;Kuen-Yu Tsai; Hao-Yun Yu; Chun-Hung Liu; Yu-Tian Shen; Hsuan-Ping Lee; Kuen-Yu Tsai; KUEN-YU TSAI
臺大學術典藏 2018-09-10T09:50:34Z Direct-scatterometry-enabled optical-proximity-correction-model calibration Chih-Yu Chen;Philip C. W. Ng;Chun-Hung Liu;Yu-Tian Shen;Kuen-Yu Tsai;Jia-Han Li;Jason J. Shieh;Alek C. Chen; Chih-Yu Chen; Philip C. W. Ng; Chun-Hung Liu; Yu-Tian Shen; Kuen-Yu Tsai; Jia-Han Li; Jason J. Shieh; Alek C. Chen; KUEN-YU TSAI
臺大學術典藏 2018-09-10T09:50:34Z Direct-scatterometry-enabled optical-proximity-correction-model calibration Chih-Yu Chen;Philip C. W. Ng;Chun-Hung Liu;Yu-Tian Shen;Kuen-Yu Tsai;Jia-Han Li;Jason J. Shieh;Alek C. Chen; Chih-Yu Chen; Philip C. W. Ng; Chun-Hung Liu; Yu-Tian Shen; Kuen-Yu Tsai; Jia-Han Li; Jason J. Shieh; Alek C. Chen; KUEN-YU TSAI

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