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機構	日期	題名	作者
臺大學術典藏	2022-01-03T08:01:17Z	Fabrication of metrology test structures with programmed line edge roughness using electron beam direct write	Fu-Min Wang; Kuen-Yu Tsai; Jia-Han Li; Alek C. Chen; Yen-Min Lee; Yu-Tian Shen; Hsin-Hung Cheng; Chieh-Hsiang Kuan; JIA-HAN LI
臺大學術典藏	2022-01-03T08:01:15Z	Optical metrology of shape-varying nano-patterned gratings by analyzing the scattering signals in their pupil images	Yen-Min Lee; Jia-Han Li*; Fu-Min Wang; Hsin-Hung Cheng; Yu-Tian Shen; Kuen-Yu Tsai; Alek C. Chen; JIA-HAN LI
臺大學術典藏	2018-09-10T15:26:03Z	Design of an electron-optical system with a ball-tip emission source through a numerical optimization method for high-throughput electron-beam–direct-write lithography	Yu-Tian Shen; Kuen-Yu Tsai; KUEN-YU TSAI; Hsuan-Ping Lee;Sheng-Yung Chen;Chun-Hung Liu;Ding-Qi;Yu-Tian Shen;Kuen-Yu Tsai; Hsuan-Ping Lee; Sheng-Yung Chen; Chun-Hung Liu; Ding-Qi
臺大學術典藏	2018-09-10T15:26:03Z	Design of an electron-optical system with a ball-tip emission source through a numerical optimization method for high-throughput electron-beam–direct-write lithography	Yu-Tian Shen; Kuen-Yu Tsai; KUEN-YU TSAI; Hsuan-Ping Lee;Sheng-Yung Chen;Chun-Hung Liu;Ding-Qi;Yu-Tian Shen;Kuen-Yu Tsai; Hsuan-Ping Lee; Sheng-Yung Chen; Chun-Hung Liu; Ding-Qi
臺大學術典藏	2018-09-10T15:00:24Z	Optical scatterometry system for detecting specific line edge roughness of resist gratings subjected to detector noises	Yen-Min Lee;Jia-Han Li;Fu-Min Wang;Hsin-Hung Cheng;Yu-Tian Shen;Kuen-Yu Tsai;Jason Shieh;Alek Chen; Yen-Min Lee; Jia-Han Li; Fu-Min Wang; Hsin-Hung Cheng; Yu-Tian Shen; Kuen-Yu Tsai; Jason Shieh; Alek Chen; KUEN-YU TSAI
臺大學術典藏	2018-09-10T15:00:24Z	Optical scatterometry system for detecting specific line edge roughness of resist gratings subjected to detector noises	Yen-Min Lee;Jia-Han Li;Fu-Min Wang;Hsin-Hung Cheng;Yu-Tian Shen;Kuen-Yu Tsai;Jason Shieh;Alek Chen; Yen-Min Lee; Jia-Han Li; Fu-Min Wang; Hsin-Hung Cheng; Yu-Tian Shen; Kuen-Yu Tsai; Jason Shieh; Alek Chen; KUEN-YU TSAI
臺大學術典藏	2018-09-10T15:00:24Z	Improvement in electron-beam lithography throughput by exploiting relaxed patterning fidelity requirements with directed self-assembly	Hao-Yun Yu;Chun-Hung Liu;Yu-Tian Shen;Hsuan-Ping Lee;Kuen-Yu Tsai; Hao-Yun Yu; Chun-Hung Liu; Yu-Tian Shen; Hsuan-Ping Lee; Kuen-Yu Tsai; KUEN-YU TSAI
臺大學術典藏	2018-09-10T15:00:24Z	Improvement in electron-beam lithography throughput by exploiting relaxed patterning fidelity requirements with directed self-assembly	Hao-Yun Yu;Chun-Hung Liu;Yu-Tian Shen;Hsuan-Ping Lee;Kuen-Yu Tsai; Hao-Yun Yu; Chun-Hung Liu; Yu-Tian Shen; Hsuan-Ping Lee; Kuen-Yu Tsai; KUEN-YU TSAI
臺大學術典藏	2018-09-10T09:50:34Z	Direct-scatterometry-enabled optical-proximity-correction-model calibration	Chih-Yu Chen;Philip C. W. Ng;Chun-Hung Liu;Yu-Tian Shen;Kuen-Yu Tsai;Jia-Han Li;Jason J. Shieh;Alek C. Chen; Chih-Yu Chen; Philip C. W. Ng; Chun-Hung Liu; Yu-Tian Shen; Kuen-Yu Tsai; Jia-Han Li; Jason J. Shieh; Alek C. Chen; KUEN-YU TSAI
臺大學術典藏	2018-09-10T09:50:34Z	Direct-scatterometry-enabled optical-proximity-correction-model calibration	Chih-Yu Chen;Philip C. W. Ng;Chun-Hung Liu;Yu-Tian Shen;Kuen-Yu Tsai;Jia-Han Li;Jason J. Shieh;Alek C. Chen; Chih-Yu Chen; Philip C. W. Ng; Chun-Hung Liu; Yu-Tian Shen; Kuen-Yu Tsai; Jia-Han Li; Jason J. Shieh; Alek C. Chen; KUEN-YU TSAI
臺大學術典藏	2018-09-10T09:50:33Z	Impacts of point spread function accuracy on patterning prediction and proximity effect correction in low-voltage electron-beam-direct-write lithography	Chun-Hung Liu;Philip C. W. Ng;Yu-Tian Shen;Sheng-Wei Chien;Kuen-Yu Tsai; Chun-Hung Liu; Philip C. W. Ng; Yu-Tian Shen; Sheng-Wei Chien; Kuen-Yu Tsai; KUEN-YU TSAI
臺大學術典藏	2018-09-10T09:50:33Z	Impacts of point spread function accuracy on patterning prediction and proximity effect correction in low-voltage electron-beam-direct-write lithography	Chun-Hung Liu;Philip C. W. Ng;Yu-Tian Shen;Sheng-Wei Chien;Kuen-Yu Tsai; Chun-Hung Liu; Philip C. W. Ng; Yu-Tian Shen; Sheng-Wei Chien; Kuen-Yu Tsai; KUEN-YU TSAI
臺大學術典藏	2018-09-10T09:25:00Z	New method of optimizing writing parameters in electron beam lithography systems for throughput improvement considering patterning fidelity constraints	Hoi-Tou Ng;Yu-Tian Shen;Sheng-Yung Chen;Chun-Hung Liu;Philip C. W. Ng;Kuen-Yu Tsai; Hoi-Tou Ng; Yu-Tian Shen; Sheng-Yung Chen; Chun-Hung Liu; Philip C. W. Ng; Kuen-Yu Tsai; KUEN-YU TSAI
臺大學術典藏	2018-09-10T09:25:00Z	New method of optimizing writing parameters in electron beam lithography systems for throughput improvement considering patterning fidelity constraints	Hoi-Tou Ng;Yu-Tian Shen;Sheng-Yung Chen;Chun-Hung Liu;Philip C. W. Ng;Kuen-Yu Tsai; Hoi-Tou Ng; Yu-Tian Shen; Sheng-Yung Chen; Chun-Hung Liu; Philip C. W. Ng; Kuen-Yu Tsai; KUEN-YU TSAI
臺大學術典藏	2018-09-10T09:25:00Z	Direct-scatterometry-enabled lithography model calibration	Chih-Yu Chen;Kuen-Yu Tsai;Yu-Tian Shen;Yen-Min Lee;Jia-Han Li;Jason J. Shieh;Alek C. Chen; Chih-Yu Chen; Kuen-Yu Tsai; Yu-Tian Shen; Yen-Min Lee; Jia-Han Li; Jason J. Shieh; Alek C. Chen; KUEN-YU TSAI
臺大學術典藏	2018-09-10T09:25:00Z	Direct-scatterometry-enabled lithography model calibration	Chih-Yu Chen;Kuen-Yu Tsai;Yu-Tian Shen;Yen-Min Lee;Jia-Han Li;Jason J. Shieh;Alek C. Chen; Chih-Yu Chen; Kuen-Yu Tsai; Yu-Tian Shen; Yen-Min Lee; Jia-Han Li; Jason J. Shieh; Alek C. Chen; KUEN-YU TSAI
臺大學術典藏	2018-09-10T08:46:33Z	Optical metrology of shape-varying nano-patterned gratings by analyzing the scattering signals in their pupil images	Yen-Min Lee; Jia-Han Li; Fu-Min Wang; Hsin-Hung Cheng; Yu-Tian Shen; Kuen-Yu Tsai; Alek C. Chen; KUEN-YU TSAI
臺大學術典藏	2018-09-10T08:18:26Z	Fabrication of metrology test structures with programmed line edge roughness using electron beam direct write	Fu-Min Wang;Kuen-Yu Tsai;Jia-Han Li;Alek C. Chen;Yen-Min Lee;Yu-Tian Shen;Hsin-Hung Cheng;Chieh-Hsiang Kuan; Fu-Min Wang; Kuen-Yu Tsai; Jia-Han Li; Alek C. Chen; Yen-Min Lee; Yu-Tian Shen; Hsin-Hung Cheng; Chieh-Hsiang Kuan; KUEN-YU TSAI
臺大學術典藏	2018-09-10T08:18:26Z	Fabrication of metrology test structures with programmed line edge roughness using electron beam direct write	Fu-Min Wang;Kuen-Yu Tsai;Jia-Han Li;Alek C. Chen;Yen-Min Lee;Yu-Tian Shen;Hsin-Hung Cheng;Chieh-Hsiang Kuan; Fu-Min Wang; Kuen-Yu Tsai; Jia-Han Li; Alek C. Chen; Yen-Min Lee; Yu-Tian Shen; Hsin-Hung Cheng; Chieh-Hsiang Kuan; KUEN-YU TSAI
臺大學術典藏	2018-09-10T08:18:22Z	Impacts of point spread function calibration methods on model-based proximity effect correction for electron-beam-direct-write lithography	Chun-Hung Liu;Philip Ng;Yu-Tian Shen;Hoi-Tou Ng;Kuen-Yu Tsai; Chun-Hung Liu; Philip Ng; Yu-Tian Shen; Hoi-Tou Ng; Kuen-Yu Tsai; KUEN-YU TSAI
臺大學術典藏	2018-09-10T08:18:22Z	Impacts of point spread function calibration methods on model-based proximity effect correction for electron-beam-direct-write lithography	Chun-Hung Liu;Philip Ng;Yu-Tian Shen;Hoi-Tou Ng;Kuen-Yu Tsai; Chun-Hung Liu; Philip Ng; Yu-Tian Shen; Hoi-Tou Ng; Kuen-Yu Tsai; KUEN-YU TSAI
臺大學術典藏	2018-09-10T08:18:21Z	Model-based proximity effect correction for electron-beam direct-write lithography	Yu-Tian Shen; Kuen-Yu Tsai; KUEN-YU TSAI; Chun-Hung Liu;Pei-Lin Tien;Philip C. W. Ng;Yu-Tian Shen;Kuen-Yu Tsai; Chun-Hung Liu; Pei-Lin Tien; Philip C. W. Ng
臺大學術典藏	2018-09-10T08:18:21Z	Model-based proximity effect correction for electron-beam direct-write lithography	Yu-Tian Shen; Kuen-Yu Tsai; KUEN-YU TSAI; Chun-Hung Liu;Pei-Lin Tien;Philip C. W. Ng;Yu-Tian Shen;Kuen-Yu Tsai; Chun-Hung Liu; Pei-Lin Tien; Philip C. W. Ng
臺大學術典藏	2012-02	Electron-beam proximity effect model calibration for fabricating scatterometry calibration samples	Chun-Hung Liu; Chih-Yu Chen; Hoi-Tou Ng; Kuen-Yu Tsai; Fu-Ming Wang; Chieh-Hsiung Kuan; Yen-Min Lee; Hsin-Hung Cheng; Jia-Han Li; Alek C. Chen; Yu-Tian Shen; KUEN-YU TSAI; CHIEH-HSIUNG KUAN et al.

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