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Showing items 1-8 of 8 (1 Page(s) Totally)
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| 國立成功大學 |
2009-07 |
Patterning of alkanethiolate self-assembled monolayers by downstream microwave nitrogen plasma: Negative and positive resist behavior
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Weng, Chih-Chiang; Liao, Jiunn-Der; Wu, Yi-Te; Tsai, Shih-Chun; Chen, Chia-Hao; Zharnikov, Michael |
| 國立成功大學 |
2009-03-19 |
Alkanethiolate Self-Assembled Monolayers As a Negative or Positive Resist for Electron Lithography
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Wu, Yi-Te; Liao, Jiunn-Der; Weng, Chih-Chiang; Hesieh, Yi-Ta; Chen, Chia-Hao; Wang, Ming-Chen; Zharnikov, Michael |
| 國立成功大學 |
2007-09-24 |
Microcontact printing pattern as a mask for chemical etching: A scanning photoelectron microscopy study
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Wu, Yi-Te; Liao, Jiunn-Der; Weng, Chih-Chiang; Chen, Chia-Hao; Wang, Ming-Chen; Zharnikov, Michael |
| 國立成功大學 |
2007 |
Perspective on the development of microplasma technology: The role of oxygen in downstream microwave plasma
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Wu, Yi-Te; Liao, Jiunn-Der; Weng, Chih-Chiang; Wang, Ming-Chen; Chang, Juu-En; Chen, Chia-Hao; Zharnikov, Michael |
| 國立成功大學 |
2006-06-29 |
Modification of monomolecular self-assembled films by nitrogen-oxygen plasma
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Weng, Chih-Chiang; Liao, Jiunn-Der; Wu, Yi-Te; Wang, Ming-Chen; Klauser, Ruth; Zharnikov, Michael |
| 國立成功大學 |
2004-11-09 |
Modification of aliphatic self-assembled monolayers by free-radical-dominant plasma: The role of the plasma composition
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Weng, Chih-Chiang; Liao, Jiunn-Der; Wu, Yi-Te; Wang, Ming-Chen; Klauser, Ruth; Grunze, Michael; Zharnikov, Michael |
| 國立成功大學 |
2003-11-11 |
Modification of aliphatic monomolecular films by free radical dominant plasma: The effect of the alkyl chain length and the substrate
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Wang, Ming-Chen;Liao, Jiunn-Der.;Weng, Chih-Chiang;Klauser, Ruth;Shaporenko, A.;Grunze, Michael;Zharnikov, Michael |
| 國立成功大學 |
2002-06-20 |
The effect of the substrate on response of thioaromatic self-assembled monolayers to free radical-dominant plasma
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Wang, Ming-Chen; Liao, Jiunn-Der; Weng, Chih-Chiang; Klauser, Ruth; Frey, Stefan; Zharnikov, Michael; Grunze, Michael |
Showing items 1-8 of 8 (1 Page(s) Totally)
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