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Showing items 1996451-1996460 of 2348859 (234886 Page(s) Totally)
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Institution	Date	Title	Author
臺大學術典藏	2018-09-10T08:18:20Z	Efficient scattering simulations for equivalent extreme ultraviolet mask multilayer structures by modified transmission line theory and finite-difference time-domain method	Yen-Min Lee;Jia-Han Li;Philip C. W. Ng;Ting-Hang Pei;Fu-Min Wang;Kuen-Yu Tsai;Alek C. Chen; Yen-Min Lee; Jia-Han Li; Philip C. W. Ng; Ting-Hang Pei; Fu-Min Wang; Kuen-Yu Tsai; Alek C. Chen; KUEN-YU TSAI
臺大學術典藏	2018-09-10T08:18:20Z	A new method to improve accuracy of parasitics extraction considering sub-wavelength lithography effects	Kuen-Yu Tsai;Wei-Jhih Hsieh;Yuan-Ching Lu;Bo-Sen Chang;Sheng-Wei Chien;Yi-Chang Lu; Kuen-Yu Tsai; Wei-Jhih Hsieh; Yuan-Ching Lu; Bo-Sen Chang; Sheng-Wei Chien; Yi-Chang Lu; YI-CHANG LU; KUEN-YU TSAI
臺大學術典藏	2018-09-10T08:18:21Z	Stochastic simulation of photon scattering for EUV mask defect inspection	Ting-Hang Pei;Kuen-Yu Tsai;Jia-Han Li; Ting-Hang Pei; Kuen-Yu Tsai; Jia-Han Li; KUEN-YU TSAI
臺大學術典藏	2018-09-10T08:18:21Z	Model-based proximity effect correction for electron-beam direct-write lithography	Yu-Tian Shen; Kuen-Yu Tsai; KUEN-YU TSAI; Chun-Hung Liu;Pei-Lin Tien;Philip C. W. Ng;Yu-Tian Shen;Kuen-Yu Tsai; Chun-Hung Liu; Pei-Lin Tien; Philip C. W. Ng
臺大學術典藏	2018-09-10T08:18:21Z	A non-delta-chrome OPC methodology for process models with three-dimensional mask effects	Philip C. W. Ng;Kuen-Yu Tsai;Chih-Hsien Tang;Lawrence S. Melvin III; Philip C. W. Ng; Kuen-Yu Tsai; Chih-Hsien Tang; Lawrence S. Melvin III; KUEN-YU TSAI
臺大學術典藏	2018-09-10T08:18:21Z	Analysis of fabrication misalignment effects in a MEMS-based electron-optical system design for direct-write lithography	Sheng-Yung Chen;Chieh-Chien Huang;Shin-Chuan Chen;Ting-Han Pei;Kuen-Yu Tsai; Sheng-Yung Chen; Chieh-Chien Huang; Shin-Chuan Chen; Ting-Han Pei; Kuen-Yu Tsai; KUEN-YU TSAI
臺大學術典藏	2018-09-10T08:18:22Z	Beam drift detection using a two-dimensional electron beam position monitor system for multiple-electron-beam–direct-write lithography	Sheng-Yung Chen;Kuen-Yu Tsai;Hoi-Tou Ng;Chi-Hsiung Fan;Ting-Han Pei;Chieh-Hsiung Kuan;Yung-Yaw Chen;Yi-Hung Kuo;Cheng-Ju Wu;Jia-Yush Yen; Sheng-Yung Chen; Kuen-Yu Tsai; Hoi-Tou Ng; Chi-Hsiung Fan; Ting-Han Pei; Chieh-Hsiung Kuan; Yung-Yaw Chen; Yi-Hung Kuo; Cheng-Ju Wu; Jia-Yush Yen; KUEN-YU TSAI
臺大學術典藏	2018-09-10T08:18:22Z	Impacts of point spread function calibration methods on model-based proximity effect correction for electron-beam-direct-write lithography	Chun-Hung Liu;Philip Ng;Yu-Tian Shen;Hoi-Tou Ng;Kuen-Yu Tsai; Chun-Hung Liu; Philip Ng; Yu-Tian Shen; Hoi-Tou Ng; Kuen-Yu Tsai; KUEN-YU TSAI
臺大學術典藏	2018-09-10T08:18:22Z	10 nm lines with 14 nm half pitch grating written in HSQ by electron beam direct write at 5 keV	Fu-Min Wang;Susumu Ono;Hsin-Hung Su;Kuen-Yu Tsai;Chieh-Hsiung Kuan; Fu-Min Wang; Susumu Ono; Hsin-Hung Su; Kuen-Yu Tsai; Chieh-Hsiung Kuan; KUEN-YU TSAI
臺大學術典藏	2018-09-10T08:18:22Z	A non-delta-chrome OPC methodology for nonlinear process models	Philip C. W. Ng;Kuen-Yu Tsai;Lawrence S. Melvin III; Philip C. W. Ng; Kuen-Yu Tsai; Lawrence S. Melvin III; KUEN-YU TSAI

Showing items 1996451-1996460 of 2348859 (234886 Page(s) Totally)
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