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Showing items 1-10 of 10 (1 Page(s) Totally)
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| 臺大學術典藏 |
2022-03-22T08:30:26Z |
The effect of N-doping on the electronic structure property and the li and Na storage capacity of graphene nanomaterials: A first-principles study
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Tsai Y.-J;Kuo C.-L.; Tsai Y.-J; Kuo C.-L.; CHIN-LUNG KUO |
| 臺大學術典藏 |
2022-03-22T08:30:25Z |
The effect of N-doping on the electronic structure property and the li and Na storage capacity of graphene nanomaterials: A first-principles study
|
Tsai Y.-J;Kuo C.-L.; Tsai Y.-J; Kuo C.-L.; CHIN-LUNG KUO |
| 臺大學術典藏 |
2022-03-22T08:27:28Z |
The effect of N-doping on the electronic structure property and the li and Na storage capacity of graphene nanomaterials: A first-principles study
|
Tsai Y.-J;Kuo C.-L.; Tsai Y.-J; Kuo C.-L.; CHIN-LUNG KUO |
| 臺大學術典藏 |
2022-02-21T23:30:42Z |
Hierarchical nanotwins in Fe27Co24Ni23Cr26 high-entropy alloy subjected to high strain-rate Hopkinson bar deformation
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Chung, Tsai Fu; Lu, Shih Yuan; Lin, Yo Shiuan; Li, You Lin; Chiu, Po Han; Hsiao, Chien Nan; Chen, Chih Yuan; CHIN-LUNG KUO; Yeh, Jien Wei; Wang, Shing Hoa; Lee, Woei Shyan; JER-REN YANG |
| 臺大學術典藏 |
2022-01-22T00:04:07Z |
The effect of N-doping on the electronic structure property and the li and Na storage capacity of graphene nanomaterials: A first-principles study
|
Tsai, Yu Jen; CHIN-LUNG KUO |
| 臺大學術典藏 |
2021-03-29T06:09:59Z |
第一原理密度泛函理論計算在材料科技發展上的應用
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郭錦龍;蔡秉均; 郭錦龍; 蔡秉均; CHIN-LUNG KUO |
| 臺大學術典藏 |
2019-09-09T00:54:20Z |
The effects of annealing and wake-up cycling on the ferroelectricity of zirconium hafnium oxide ultrathin films prepared by remote plasma atomic layer deposition
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Lin, Bo Ting; MIIN-JANG CHEN; Hsu, Tzu Yao; TZONG-LIN JAY SHIEH; CHIN-LUNG KUO; Lin, Bo Ting;CHIN-LUNG KUO;TZONG-LIN JAY SHIEH;Hsu, Tzu Yao;MIIN-JANG CHEN |
| 臺大學術典藏 |
2019-09-09T00:54:20Z |
The effects of annealing and wake-up cycling on the ferroelectricity of zirconium hafnium oxide ultrathin films prepared by remote plasma atomic layer deposition
|
Lin, Bo Ting; MIIN-JANG CHEN; Hsu, Tzu Yao; TZONG-LIN JAY SHIEH; CHIN-LUNG KUO; Lin, Bo Ting;CHIN-LUNG KUO;TZONG-LIN JAY SHIEH;Hsu, Tzu Yao;MIIN-JANG CHEN |
| 臺大學術典藏 |
2019-03-11T08:02:02Z |
Effect of hydrogen participation on the improvement in electrical characteristics of HfO2 gate dielectrics by post-deposition remote N2, N2/H2, and NH3 plasma treatments
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Miin-Jang Chen;Min-Hung Lee;Hsin-ChihLin;Chin-Lung Kuo;Jhih-Jie Huang;Ming-Lun Chang;Li-Tien Huang;M. H.Liao; M. H.Liao; Li-Tien Huang; Ming-Lun Chang; Jhih-Jie Huang; Chin-Lung Kuo; Hsin-ChihLin; Min-Hung Lee; Miin-Jang Chen |
| 臺大學術典藏 |
2019-03-11T08:02:02Z |
Effect of hydrogen participation on the improvement in electrical characteristics of HfO2 gate dielectrics by post-deposition remote N2, N2/H2, and NH3 plasma treatments
|
Miin-Jang Chen;Min-Hung Lee;Hsin-ChihLin;Chin-Lung Kuo;Jhih-Jie Huang;Ming-Lun Chang;Li-Tien Huang;M. H.Liao; M. H.Liao; Li-Tien Huang; Ming-Lun Chang; Jhih-Jie Huang; Chin-Lung Kuo; Hsin-ChihLin; Min-Hung Lee; Miin-Jang Chen |
Showing items 1-10 of 10 (1 Page(s) Totally)
1
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