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國立交通大學 |
2014-12-08T15:46:06Z |
Improvement of junction leakage of nickel silicided junction by a Ti-capping layer
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Hou, TH; Lei, TF; Chao, TS |
國立交通大學 |
2014-12-08T15:25:43Z |
Effects of base oxide in HfSiO/SiO2 high-k gate stacks
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Wu, WH; Chen, MC; Wang, MF; Hou, TH; Yao, LG; Jin, Y; Chen, SC; Liang, MS |
Showing items 1-2 of 2 (1 Page(s) Totally) 1 View [10|25|50] records per page
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