臺灣學術機構典藏系統 (Taiwan Academic Institutional Repository, TAIR)

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Institution	Date	Title	Author
國立高雄師範大學	2002	Effect of Mechanical Stress on the Characteristics of Silicon Thermal Oxides	Chia-Hong Huang;Jui-Yuan Yen;Jenn-Gwo Hwu; 黃嘉宏
國立高雄師範大學	2001	Breakdown Characteristics of Ultra-thin Gate Oxide ( < 4nm ) in MOS Structure Subjected Substrate Injection	Chia-Hong Huang;Jenn-Gwo Hwu; 黃嘉宏
國立高雄師範大學	2001	Anomalous Low-Voltage Tunneling Current ( LVTC ) Characteristics of Ultra-Thin Gate Oxide ( ~2nm ) after High Field Stress	Chia-Hong Huang;Jenn-Gwo Hwu; 黃嘉宏
臺大學術典藏	2001	Anomalous low-voltage tunneling current characteristics of ultrathin gate oxide (∼2 nm) after high-field stress	JENN-GWO HWU; Hwu, J.-G.; Huang, C.-H.
臺大學術典藏	2001	An on-chip temperature sensor by utilizing a MOS tunneling diode	Shih, Y.-H.; Hwu, J.-G.; JENN-GWO HWU
國立高雄師範大學	2000	Enhancement in Soft Breakdown Occurrence on Ultra-thin Gate Oxides Caused by Photon Effect in Rapid Thermal Post Oxidation Annealing	Chia-Hong Huang;Jenn-Gwo Hwu; 黃嘉宏
國立高雄師範大學	2000	Role of Interface Trap Generation in the Low-Voltage Tunneling Current ( LVTC ) Characteristics of Ultra-Thin Gate Oxide ( ~2nm ) under High Field Stress	Chia-Hong Huang;Jenn-Gwo Hwu; 黃嘉宏
國立高雄師範大學	1999	The Breakdown Properties of Front- and Back-side Post Oxidation Annealed( POA ) Ultrathin Gate Oxide ( <3nm ) under High Field Stress	Chia-Hong Huang;Jenn-Gwo Hwu; 黃嘉宏
臺大學術典藏	1996	Reliable fluorinated thin gate oxides prepared by liquid phase deposition following rapid thermal process	JENN-GWO HWU; Hwu, J.-G.; Lu, W.-S.; Lu, W.-S.;Hwu, J.-G.

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