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機構	日期	題名	作者
臺大學術典藏	2018-09-10T07:29:07Z	Effect of tensile stress on mos capacitors with ultra-thin gate oxide	Chen, H.-L.;Lee, C.-J.;Hwu, J.-G.; Chen, H.-L.; Lee, C.-J.; Hwu, J.-G.; JENN-GWO HWU
臺大學術典藏	2018-09-10T07:29:07Z	Comprehensive study on the deep depletion capacitance-voltage behavior for metal-oxide-semiconductor capacitor with ultrathin oxides	Cheng, J.-Y.;Huang, C.-T.;Hwu, J.-G.; Cheng, J.-Y.; Huang, C.-T.; Hwu, J.-G.; JENN-GWO HWU
臺大學術典藏	2018-09-10T07:29:07Z	Comparison of lateral non-uniformity phenomena between HfO2 and SiO2 from magnified C-V curves in inversion region	Cheng, J.Y.;Huang, C.T.;Lu, H.T.;Hwu, J.G.; Cheng, J.Y.; Huang, C.T.; Lu, H.T.; Hwu, J.G.; JENN-GWO HWU
臺大學術典藏	2018-09-10T07:29:07Z	Characterization of the electrostatic discharge induced interface traps in metal-oxide-semiconductor field-effect transistors	Tseng, J.-C.;Hwu, J.-G.; Tseng, J.-C.; Hwu, J.-G.; JENN-GWO HWU
臺大學術典藏	2018-09-10T07:29:07Z	Low temperature tandem aluminum oxides prepared by DAC-ANO compensation in nitric acid	Yang, C.-Y.;Hwu, J.-G.; Yang, C.-Y.; Hwu, J.-G.; JENN-GWO HWU
臺大學術典藏	2018-09-10T07:29:06Z	Trapping characteristics of Al2O3/HfO 2/SiO1-2 stack structure prepared by low temperature in situ oxidation in dc sputtering	Chang, C.-H.; Hwu, J.-G.; JENN-GWO HWU; Chang, C.-H.;Hwu, J.-G.
臺大學術典藏	2018-09-10T07:29:06Z	Thin silicon oxide films on N-type 4H-SiC prepared by scanning frequency anodization method	Chuang, K.-C.;Hwu, J.-G.; Chuang, K.-C.; Hwu, J.-G.; JENN-GWO HWU
臺大學術典藏	2018-09-10T06:57:01Z	Edge-illuminated metal-oxide-semiconductor (MOS) solar cells with oxides prepared by liquid phase deposition method	Lee, Kuo-Chung; Lin, Jin-Sheng; Hwu, Jenn-Gwo; JENN-GWO HWU
臺大學術典藏	2018-09-10T06:57:01Z	Application of anodization followed by rapid thermal treatment to thin gate oxide growth	Jeng, Ming-Jer; Hwu, Jenn-Gwo; JENN-GWO HWU
臺大學術典藏	2018-09-10T06:57:01Z	The radiation hardness property of dry oxide grown by postoxidation cooling in oxygen ambient	Hwu, J.-G.;Fu, S.-L.; Hwu, J.-G.; Fu, S.-L.; JENN-GWO HWU
臺大學術典藏	2018-09-10T06:57:01Z	C-V hysteresis instability in aluminum/tantalum oxide/silicon oxide/silicon capacitors due to postmetallization annealing and Co-60 irradiation	Hwu, Jenn-Gwo;Jeng, Ming-Jer; Hwu, Jenn-Gwo; Jeng, Ming-Jer; JENN-GWO HWU
臺大學術典藏	2018-09-10T06:57:00Z	Shallow level trap formation in SiO2 induced by high field and thermal stresses	Lin, H.-P.; Hwu, J.-G.; JENN-GWO HWU
臺大學術典藏	2018-09-10T06:57:00Z	Lateral nonuniformity effects of border traps on the characteristics of metal-oxide-semiconductor field-effect transistors subjected to high-field stresses	Tseng, J.-C.; Hwu, J.-G.; JENN-GWO HWU
臺大學術典藏	2018-09-10T06:57:00Z	Rapid thermal postoxidation anneal engineering in thin gate oxides with al gates	Chen, C.-Y.; Jeng, M.-J.; Hwu, J.-G.; JENN-GWO HWU
臺大學術典藏	2018-09-10T06:57:00Z	Effect of oxidation pressure on the characteristics of fluorinated thin gate oxides prepared by room temperature deposition followed by rapid thermal oxidation	Yeh, Kuo-Lang; Jeng, Ming-Jer; Hwu, Jenn-Gwo; JENN-GWO HWU
臺大學術典藏	2018-09-10T06:56:59Z	Ultrathin gate oxides prepared by tensile-stress oxidation in tilted cathode anodization system	Wang, C.-C.; Li, T.-H.; Chuang, K.-C.; Hwu, J.-G.; JENN-GWO HWU
臺大學術典藏	2018-09-10T06:56:59Z	Silicon oxide gate dielectric on n-type 4H-SiC prepared by low thermal budget anodization method	Chuang, K.-C.; Hwu, J.-G.; JENN-GWO HWU
臺大學術典藏	2018-09-10T05:52:22Z	Relationship between mobile charges and interface trap states in silicon mos capacitors	Hwu, J.-G.;Wang, W.-S.;Chiou, Y.-L.; Hwu, J.-G.; Wang, W.-S.; Chiou, Y.-L.; JENN-GWO HWU
臺大學術典藏	2018-09-10T05:52:22Z	Effect of interface traps related to mobile charges on silicon n-channel metal/oxide/semiconductor field effect transistors determined by a charge-temperature technique	Hwu, J.G.;Lin, C.M.;Wang, W.S.; Hwu, J.G.; Lin, C.M.; Wang, W.S.; JENN-GWO HWU
臺大學術典藏	2018-09-10T05:52:22Z	Direct indication of lateral nonuniformities of MOS capacitors from the negative equivalent interface trap density based on charge-temperature technique	Hwu, J.G.;Wang, W.S.; Hwu, J.G.; Wang, W.S.; JENN-GWO HWU
臺大學術典藏	2018-09-10T05:52:21Z	Rapid thermal post-metallization annealing effect on thin gate oxides	Jeng, M.-J.;Lin, H.-S.;Hwu, J-G.; Jeng, M.-J.; Lin, H.-S.; Hwu, J-G.; JENN-GWO HWU
臺大學術典藏	2018-09-10T05:52:21Z	Metal-oxide-semiconductor solar cells with silicon dioxide prepared by liquid-phase deposition method	Shen, Y.-P.;Hwu, J.-G.; Shen, Y.-P.; Hwu, J.-G.; JENN-GWO HWU
臺大學術典藏	2018-09-10T05:52:21Z	Enhanced nitrogen incorporation and improved breakdown endurance in nitrided gate oxides prepared by anodic oxidation followed by rapid thermal nitridation in N2O	Jeng, M.-J.;Hwu, J.-G.; Jeng, M.-J.; Hwu, J.-G.; JENN-GWO HWU
臺大學術典藏	2018-09-10T05:52:21Z	Application of irradiation-then-nitridation to improve the radiation hardness in MOS gate dielectrics	Lee, K.-C.;Hwu, J.-G.; Lee, K.-C.; Hwu, J.-G.; JENN-GWO HWU
臺大學術典藏	2018-09-10T05:52:21Z	The effect of postoxidation cooling in oxygen on the interface property of MOS capacitors	Hwu, J.-G.;Chang, J.-J.;Wang, W.-S.; Hwu, J.-G.; Chang, J.-J.; Wang, W.-S.; JENN-GWO HWU
臺大學術典藏	2018-09-10T05:52:20Z	Improvement in electrical characteristics of high- k Al2O 3 gate dielectric by field-assisted nitric oxidation	Hwu, J.-G.; JENN-GWO HWU; Chuang, K.-C.
臺大學術典藏	2018-09-10T05:52:20Z	Impact of strain-temperature stress on ultrathin oxide	Tung, C.-W.; Yang, Y.-L.; Hwu, J.-G.; JENN-GWO HWU
臺大學術典藏	2018-09-10T05:52:20Z	Thin-gate oxides prepared by pure water anodization followed by rapid thermal densification	Jeog, M.-J.;Hwu, J.-G.; Jeog, M.-J.; Hwu, J.-G.; JENN-GWO HWU
臺大學術典藏	2018-09-10T05:52:19Z	Lateral nonuniformity of effective oxide charges in MOS capacitors with A12O3 gate dielectrics	Huang, S.-W.; Hwu, J.-G.; JENN-GWO HWU
臺大學術典藏	2018-09-10T04:08:55Z	Effect of starting oxide on electrical characteristics of metal-reoxidized nitrided oxide-semiconductor devices prepared by rapid thermal processes	JENN-GWO HWU; Hwu, Jenn-Gwo; Chang-Liao, Kuei-Shu
臺大學術典藏	2018-09-10T04:08:55Z	Dependence of hot-carrier and radiation hardnesses of metal-oxide-semiconductor capacitors on initial oxide resistance determined by charge-then-decay method	Lin, Jing-Jenn; Lin, Kuan-Chin; Hwu, Jenn-Gwo; JENN-GWO HWU
臺大學術典藏	2018-09-10T04:08:55Z	Application of irradiation-then-anneal treatment on the improvement of oxide properties in metal-oxide-semiconductor capacitors	Lin, Jin-Jenn; Hwu, Jenn-Gwo; JENN-GWO HWU
臺大學術典藏	2018-09-10T04:08:54Z	Improvement of oxide thickness uniformity by high then low O2 pressure oxidation in rapid thermal processing	Hong, C.-C.; Chen, J.-L.; Hwu, J.-G.; JENN-GWO HWU
臺大學術典藏	2018-09-10T04:08:54Z	Improvement in ultrathin rapid thermal oxide uniformity by the control of gas flow	Hong, C.-C.; Yen, Y.-R.; Su, J.-L.; Hwu, J.-G.; JENN-GWO HWU
臺大學術典藏	2018-09-10T04:08:54Z	Effect of mechanical stress on characteristics of silicon thermal oxides	JENN-GWO HWU; Yen, J.-Y.; Huang, C.-H.; Hwu, J.-G.
臺大學術典藏	2018-09-10T04:08:54Z	Role of stress in irradiation-then-anneal technique used for improving radiation hardness of metal-insulator-semiconductor devices	Shu, K.; Liao, C.; Hwu, J.-G.; JENN-GWO HWU
臺大學術典藏	2018-09-10T04:08:54Z	Performance prediction and function recovery of CMOS circuits damaged by Co-60 irradiation	Chang-Liao, K.-S.; Hwu, J.-G.; JENN-GWO HWU
臺大學術典藏	2018-09-10T04:08:53Z	Ultralow leakage characteristics of ultrathin gate oxides (∼3 nm) prepared by anodization followed by high-temperature annealing	Ting, C.-C.; Shih, Y.-H.; Hwu, J.-G.; JENN-GWO HWU
臺大學術典藏	2018-09-10T04:08:53Z	Silicon metal-oxide-semiconductor solar cells with oxide prepared by room temperature anodization in hydrofluosilicic acid solution	JENN-GWO HWU; Chen, C.-H.; Hong, C.-C.; Hwu, J.-G.
臺大學術典藏	2018-09-10T04:08:53Z	Reduction in leakage current of low-temperature thin-gate oxide by repeated spike oxidation technique	Hong, C.-C.; Chang, C.-Y.; Lee, C.-Y.; Hwu, J.-G.; JENN-GWO HWU
臺大學術典藏	2018-09-10T04:08:53Z	Local thinning-induced oxide nonuniformity effect on the tunneling current of ultrathin gate oxide	Hong, C.-C.; Chen, W.-R.; Hwu, J.-G.; JENN-GWO HWU
臺大學術典藏	2018-09-10T03:44:50Z	Effect of oxide resistance on the characterization of interface trap density in MOS structures	Lin, J.-J.; Hwu, J.-G.; JENN-GWO HWU
臺大學術典藏	2018-09-10T03:44:49Z	Improvement in oxide thickness uniformity by repeated spike oxidation	Hong, C.-C.; Lee, C.-Y.; Hsieh, Y.-L.; Liu, C.-C.; Fong, I.-K.; Hwu, J.-G.; JENN-GWO HWU
臺大學術典藏	2018-09-10T03:44:49Z	Degradation in metal-oxide-semiconductor structure with ultrathin gate oxide due to external compressive stress	Hong, C.-C.; Hwu, J.-G.; JENN-GWO HWU
臺大學術典藏	2018-09-10T03:44:49Z	Application of anodization to reoxidize silicon nitride film	Lin, Y.-P.; Hwu, J.-G.; JENN-GWO HWU
臺大學術典藏	2018-09-10T03:44:49Z	Improvement of hot-carrier resistance and radiation hardness of nMOSFETs by irradiation-then-anneal treatments	Chang-Liao, K.-S.;Hwu, J.-G.; Chang-Liao, K.-S.; Hwu, J.-G.; JENN-GWO HWU
臺大學術典藏	2018-09-10T03:44:48Z	Ultra-thin gate oxides prepared by alternating current anodization of silicon followed by rapid thermal anneal	Chen, Y.-C.; Lee, C.-Y.; Hwu, J.-G.; JENN-GWO HWU
臺大學術典藏	2018-09-10T03:44:48Z	Stress effect on the kinetics of silicon thermal oxidation	Yen, J.-Y.; Hwu, J.-G.; JENN-GWO HWU
臺大學術典藏	2011	Comprehensive study on negative capacitance effect observed in MOS(n) capacitors with ultrathin gate oxides	Chang, S.-J.;Hwu, J.-G.; Chang, S.-J.; Hwu, J.-G.; JENN-GWO HWU
國立高雄師範大學	2005	The Effect of Photon Illumination in Rapid Thermal Processing on the Characteristics of MOS Structures with Ultra-thin Oxides Examined by Substrate Injection	Chia-Hong Huang;Jenn-Gwo Hwu; 黃嘉宏

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