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Showing items 1-11 of 11  (1 Page(s) Totally)
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Institution Date Title Author
國立中山大學 2007 Electrical Characteristics of Liquid-Phase-Deposited Titanium Oxide Films on (NH4)2Sx-Treated InP Substrate Ming-Kwei Lee; Jung-Jie Huang; Chih-Feng Yen
國立中山大學 2006 Electrical characteristics of postmetallization-annealed MOCVD-TiO2 films on ammonium sulfide-treated GaAs Ming-Kwei Lee; Chih-Feng Yen; Jung-Jie Huang; Shi-Hao Lin
國立中山大學 2006 Electrical Characteristics of Liquid Phase Deposited TiO2 Films on GaAs Substrate with (NH4)2Sx treatment Ming-Kwei Lee; Chih-Feng Yen; Jung-Jie Huang
國立中山大學 2005-11 Electrical Characteristics of LPD TiO2 Films on GaAs Substrate with (NH4)2Sx treatment Ming-Kwei Lee;Chih-Feng Yen;Jung-Jie Huang
國立中山大學 2005-11 Variation of electrical characteristics of LPD-SiO2/oxygen-annealed MOCVD- TiO2 films on Si substrate by nitrogen annealing Ming-Kwei Lee;Chih-Feng Yen;Jung-Jie Huang;Shi-Hao Lin
國立中山大學 2005 Variation of electrical characteristics of metallorganic chemical vapor deposited TiO2 films by postmetallization annealing Ming-Kwei Lee; Jung-Jie Huang; Yu-Hsiang Hung
國立中山大學 2005 Electrical characteristics improvement of oxygen annealed MOCVD-TiO2 films Ming-Kwei Lee; Jung-Jie Huang; Tsung-Shun Wu
國立中山大學 2005 Low Leakage Current Flrorinated LPD-SiO2/MOCVD-TiO2 Films Ming-Kwei Lee; Jung-Jie Huang; Tsung-Shun Wu
國立中山大學 2004-12 High dielectric constant and low leakage current LPD-SiO2/MOCVD-TiO2 films Ming-Kwei Lee;Jung-Jie Huang;Tsung-Shun Wu
國立中山大學 2003-11 O2 and N2O as the oxidizer of TiO2 thin films on Si prepared by metal organic chemical vapor deposition Ming-Kwei Lee;Jung-Jie Huang;Wei-Cheng Chen;Tsung-Shun Wu
國立中山大學 2003 Properties of TiO2 thin film on GaAs prepared by Metalorganic Chemical Vapor Deposition Ming-Kwei Lee; Jung-Jie Huang; Yi-Min Hung; Ming-Chi Fan

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