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Showing items 186-187 of 187 (19 Page(s) Totally)
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| 國立虎尾科技大學 |
2006 |
Effect of tin-doped indium oxide film thickness on the diffusion barrier between silicon and copper
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Liu, W. L.;Chen, W. J.;Tsai, T. K.;Hsieh, S. H.;Liu, C. M. |
| 國立臺灣大學 |
1985 |
Temperature Dependent Study of Oxalic Acid
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王瑜; Tsai, C. J.; Liu, W. L.; Calvert, L. D.; Wang, Yu; Tsai, C. J.; Liu, W. L.; Calvert, L. D. |
Showing items 186-187 of 187 (19 Page(s) Totally)
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