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Showing items 1-10 of 10 (1 Page(s) Totally)
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| 國立交通大學 |
2018-08-21T05:53:24Z |
Analysis of In-Line Process Parameters of the Unity Gain Frequency of HKMG Bulk FinFET Devices
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Su, Ping-Hsun; Li, Yiming |
| 國立交通大學 |
2018-08-21T05:53:17Z |
Impacts of plasma-induced damage due to UV light irradiation during etching on Ge fin fabrication and device performance of Ge fin field-effect transistors
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Mizubayashi, Wataru; Noda, Shuichi; Ishikawa, Yuki; Nishi, Takashi; Kikuchi, Akio; Ota, Hiroyuki; Su, Ping-Hsun; Li, Yiming; Samukawa, Seiji; Endo, Kazuhiko |
| 國立交通大學 |
2018-01-24T07:38:29Z |
高介電材料金屬閘極塊材鰭式場效應電晶體製程參數分析與電特性建模之研究
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蘇炳熏; 李義明; Su,Ping-Hsun; Li, Yiming |
| 國立交通大學 |
2017-04-21T06:56:23Z |
Exploration of Inter-Die Bulk Fin-Typed Field Effect Transistor Process Variation for Reduction of Device Variability
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Su, Ping-Hsun; Li, Yiming |
| 國立交通大學 |
2017-04-21T06:56:23Z |
A Systematic Approach to Correlation Analysis of In-Line Process Parameters for Process Variation Effect on Electrical Characteristic of 16-nm HKMG Bulk FinFET Devices
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Su, Ping-Hsun; Li, Yiming |
| 國立交通大學 |
2017-04-21T06:55:39Z |
Process-Dependence Analysis for Characteristic Improvement of Ring Oscillator Using 16-nm Bulk FinFET Devices
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Su, Ping-Hsun; Li, Yiming |
| 國立交通大學 |
2017-04-21T06:48:52Z |
Process Technological Analysis for Dynamic Characteristic Improvement of 16-nm HKMG Bulk FinFET CMOS Circuits
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Su, Ping-Hsun; Li, Yiming |
| 國立交通大學 |
2015-07-21T08:31:14Z |
Design Optimization of 16-nm Bulk FinFET Technology via Geometric Programming
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Su, Ping-Hsun; Li, Yiming |
| 國立交通大學 |
2015-07-21T08:29:54Z |
Source/Drain Series Resistance Extraction in HKMG Multifin Bulk FinFET Devices
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Su, Ping-Hsun; Li, Yiming |
| 國立交通大學 |
2015-07-21T08:29:33Z |
Determination of Source-and-Drain Series Resistance in 16-nm-Gate FinFET Devices
|
Su, Ping-Hsun; Li, Yiming |
Showing items 1-10 of 10 (1 Page(s) Totally)
1
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