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Institution Date Title Author
中國文化大學 2010-12 Control of Interface Traps in HfO(2) Gate Dielectric on Silicon Tan, SY (Tan, S. Y.)
中國文化大學 2010-11 Dopant enhanced in nickel silicide formation for high-k dielectric applications Tan, SY (Tan, S. Y.)
中國文化大學 2009 Investigation of the Interfaces in Ni-FUSI/Hf-Based/Si and Ni-FUSI/SiO(2)/Si Stacks by Physical and Electrical Characterization Techniques Tan, SY (Tan, S. Y.)

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